{"meta":{"query_hash":"156802a16001","filters":{"venue":"International Journal of Nanomanufacturing"},"cohort_total":3,"direct_labels_cover":0,"predictions_cover":3,"exported":3,"export_cap":100000,"truncated":false,"label_status":"direct model label, unvalidated","prediction_status":"machine_predicted_unvalidated (Codex and Gemma teacher distillation)","score_status":"score_only:v0-immature-baseline","snapshot":{"source":"OpenAlex, pinned release, all 482 partitions","release":"2026-06-24","frame_built":"2026-07-12"},"permalink":"https://metacan.xera.ac/q/156802a16001","api":"https://metacan.xera.ac/api/v1/cohort?venue=International+Journal+of+Nanomanufacturing"},"results":[{"id":"W1928345216","doi":"","title":"Modelling and verification of XeF2 silicon micromachining","year":2009,"lang":"en","type":"article","venue":"International Journal of Nanomanufacturing","topic":"Advanced MEMS and NEMS Technologies","field":"Engineering","cited_by":0,"is_retracted":false,"has_abstract":true,"route_ca_aff":true,"route_ca_fund":false,"route_ca_venue":false,"route_about_ca":false,"ca_institutions":"Concordia University","funders":"","keywords":"Xenon difluoride; Etching (microfabrication); Materials science; Silicon; Surface micromachining; Bulk micromachining; Microelectromechanical systems; Chamber pressure; Isotropy; Composite material; Optoelectronics; Optics; Fabrication; Metallurgy; Chemistry","score_opus":0.009975036321014732,"score_gpt":0.23025477579629292,"score_spread":0.22027973947527818,"validation_status":"score_only:v0-immature-baseline","prediction":{"id":"W1928345216","genre_codex":"methods","genre_gemma":"empirical","domain_codex":null,"domain_gemma":null,"model_version":"metacan-v3-hybrid-931329e0061c","genre_candidate":"empirical","genre_consensus":null,"domain_candidate":null,"domain_consensus":null,"prediction_status":"machine_predicted_unvalidated","genre_scores_codex":[0.40458018,0.00054648705,0.56870914,0.00017364863,0.00010952592,0.00019765795,0.0009589189,0.0017796047,0.022944879],"genre_scores_gemma":[0.934131,0.00031184946,0.0588578,0.000017639206,0.000008099835,0.000135491,0.00029177353,0.000076218996,0.0061700693],"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","domain_scores_codex":[0.9997154,0.000023944063,0.000011584734,0.00005157029,0.00015792958,0.000039567094],"domain_scores_gemma":[0.99983776,0.00005327465,0.000022356802,0.00003764597,0.000041759162,0.000007187305],"candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00026780434,0.00042515664,0.0004000083,0.00015261692,0.00023721241,0.00046096958,0.00089033105,0.0007214287,0.0023899178],"category_scores_gemma":[0.0005727322,0.00024824287,0.00038847604,0.00016015563,0.00029510845,0.00039595814,0.00033291327,0.00027145262,0.0004346674],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_system_candidate":false,"about_ca_system_consensus":false,"study_design_scores_codex":[0.000065775086,0.00002368289,0.00087079214,0.00014944783,0.00001297844,0.00025253295,0.00009247429,0.9185299,0.06559604,0.0046833986,0.000283491,0.009439428],"study_design_scores_gemma":[0.000012571751,0.000045819244,0.00056018535,0.000005736488,0.0000040404525,0.00006278411,0.000013116659,0.9710497,0.025897725,0.00030126053,0.0020381946,0.000008868094],"about_ca_topic_score_codex":0.006539879,"about_ca_topic_score_gemma":0.0031948632,"teacher_disagreement_score":0.006539879,"about_ca_system_score_codex":0.0005143564,"about_ca_system_score_gemma":0.00090836117,"threshold_uncertainty_score":0.013003647},"labels":[],"label_agreement":null},{"id":"W2046460067","doi":"10.1504/ijnm.2008.017844","title":"A non-probe/lithography approach to nanotrench/nanochannel fabrication","year":2008,"lang":"en","type":"article","venue":"International Journal of Nanomanufacturing","topic":"Nanopore and Nanochannel Transport Studies","field":"Engineering","cited_by":0,"is_retracted":false,"has_abstract":true,"route_ca_aff":true,"route_ca_fund":false,"route_ca_venue":false,"route_about_ca":false,"ca_institutions":"University of Windsor","funders":"Georgia Institute of Technology; National Science Foundation","keywords":"Materials science; Fabrication; Lithography; Nanotechnology; Trench; Etching (microfabrication); Bilayer; Bridging (networking); Physical vapor deposition; Atomic layer deposition; Dry etching; Layer (electronics); Optoelectronics; Thin film; Computer science; Membrane","score_opus":0.014533012086715175,"score_gpt":0.21343731058060103,"score_spread":0.19890429849388586,"validation_status":"score_only:v0-immature-baseline","prediction":{"id":"W2046460067","genre_codex":"methods","genre_gemma":"empirical","domain_codex":null,"domain_gemma":null,"model_version":"metacan-v3-hybrid-931329e0061c","genre_candidate":"empirical","genre_consensus":null,"domain_candidate":null,"domain_consensus":null,"prediction_status":"machine_predicted_unvalidated","genre_scores_codex":[0.35590628,0.0054228273,0.62303376,0.0005211634,0.0004950323,0.00054088177,0.00067400536,0.0015961111,0.011809939],"genre_scores_gemma":[0.44335398,0.0021038726,0.54810697,0.00021279881,0.000073005926,0.0002571961,0.0003294073,0.00010541556,0.0054574017],"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","domain_scores_codex":[0.9996427,0.000033594886,0.00002874323,0.000069015245,0.00018869237,0.00003727534],"domain_scores_gemma":[0.9996271,0.00013259688,0.00005630575,0.00008843595,0.00006753147,0.000027923601],"candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002595205,0.00038046244,0.00036910723,0.0003657821,0.00039701269,0.00045252373,0.00085504964,0.00039424005,0.0014727518],"category_scores_gemma":[0.00039202813,0.00028593582,0.0003281779,0.000233484,0.0004439405,0.00039022294,0.000652457,0.00073451054,0.00054094556],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_system_candidate":false,"about_ca_system_consensus":false,"study_design_scores_codex":[0.000015276211,0.000020418021,0.00010254981,0.00010448689,0.0000063747198,0.00008467451,0.000019447072,0.0002204217,0.991443,0.0013198628,0.000116892275,0.0065466156],"study_design_scores_gemma":[0.000010015532,0.00007703362,0.00053183903,0.0000040846107,0.000008424743,0.0004901624,0.000007822229,0.0023942755,0.990589,0.00022368463,0.005646881,0.000016715372],"about_ca_topic_score_codex":0.0006942804,"about_ca_topic_score_gemma":0.0016093204,"teacher_disagreement_score":0.0014727518,"about_ca_system_score_codex":0.00036817542,"about_ca_system_score_gemma":0.0005448657,"threshold_uncertainty_score":0.0049268007},"labels":[],"label_agreement":null},{"id":"W2573784202","doi":"10.1504/ijnm.2009.027051","title":"Modelling and verification of XeF<SUB align=right>2 silicon micromachining","year":2009,"lang":"en","type":"article","venue":"International Journal of Nanomanufacturing","topic":"Advanced MEMS and NEMS Technologies","field":"Engineering","cited_by":2,"is_retracted":false,"has_abstract":true,"route_ca_aff":true,"route_ca_fund":false,"route_ca_venue":false,"route_about_ca":false,"ca_institutions":"Concordia University","funders":"","keywords":"Xenon difluoride; Etching (microfabrication); Silicon; Materials science; Bulk micromachining; Surface micromachining; Microelectromechanical systems; Chamber pressure; Isotropy; Reactive-ion etching; Optoelectronics; Dry etching; Composite material; Optics; Fabrication; Layer (electronics); Metallurgy; Chemistry","score_opus":0.008255364653507099,"score_gpt":0.22140704585740306,"score_spread":0.21315168120389597,"validation_status":"score_only:v0-immature-baseline","prediction":{"id":"W2573784202","genre_codex":"methods","genre_gemma":"empirical","domain_codex":null,"domain_gemma":null,"model_version":"metacan-v3-hybrid-931329e0061c","genre_candidate":"empirical","genre_consensus":null,"domain_candidate":null,"domain_consensus":null,"prediction_status":"machine_predicted_unvalidated","genre_scores_codex":[0.36395675,0.00046433104,0.61524934,0.00016476733,0.00010243631,0.0001761773,0.00077404774,0.0019275926,0.017184505],"genre_scores_gemma":[0.9160471,0.00027151513,0.07814467,0.000017202823,0.0000074147342,0.00011939462,0.00026308396,0.000087713765,0.005041979],"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","domain_scores_codex":[0.9997012,0.000023118098,0.000012354252,0.000055043758,0.00016867871,0.000039616825],"domain_scores_gemma":[0.99979264,0.000075308104,0.000031492767,0.00004791588,0.000044456156,0.000008241369],"candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00030305458,0.00039833132,0.00039461342,0.00016674958,0.00023210562,0.00045612172,0.00094852457,0.000734161,0.0021662381],"category_scores_gemma":[0.00060925557,0.00029813265,0.00041267084,0.000156431,0.00036231658,0.00043684195,0.00028415525,0.00031208785,0.00044398024],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_system_candidate":false,"about_ca_system_consensus":false,"study_design_scores_codex":[0.00004664685,0.000023896764,0.00091434625,0.00012621812,0.000012133814,0.00017824765,0.00009653448,0.9206012,0.06356081,0.004245851,0.00024633482,0.009947783],"study_design_scores_gemma":[0.000009111738,0.000039786555,0.0005899574,0.000005534502,0.0000046135456,0.000048738304,0.000010474692,0.97176784,0.02543547,0.00028562083,0.0017932276,0.000009633454],"about_ca_topic_score_codex":0.007095289,"about_ca_topic_score_gemma":0.004663241,"teacher_disagreement_score":0.007095289,"about_ca_system_score_codex":0.0006526635,"about_ca_system_score_gemma":0.0010897534,"threshold_uncertainty_score":0.014107943},"labels":[],"label_agreement":null}]}