{"meta":{"page":1,"per_page":50,"max_per_page":100,"total":180,"total_is_capped":false,"direct_labels_cover":0,"predictions_cover":180,"direct_label_status":"direct model label, unvalidated","prediction_status":"machine_predicted_unvalidated (Codex and Gemma teacher distillation)","score_status":"score_only:v0-immature-baseline (scores rank; they never assert a category)","snapshot":{"source":"OpenAlex, pinned release, all 482 partitions","release":"2026-06-24","frame_built":"2026-07-12","author_layer_release":"2026-06-26"},"query_hash":"55c0eb161f07","filters":{"topic":"Advancements in Photolithography Techniques"}},"results":[{"id":"W2007226482","doi":"10.1016/j.colsurfa.2011.05.002","title":"Design and accuracy of pendant drop methods for surface tension measurement","year":2011,"lang":"en","type":"article","venue":"Colloids and Surfaces A Physicochemical and Engineering Aspects","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":122,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Toronto; University of New Brunswick","funders":"Natural Sciences and Engineering Research Council of Canada; University of Toronto","keywords":"Dimensionless quantity; Drop (telecommunication); Surface tension; Spinning drop method; Shape parameter; Mechanics; Mathematics; Thermodynamics; Physics; Mechanical engineering; Engineering; Statistics","authors":[{"name":"Sameh M.I. Saad","is_ca":true},{"name":"Zdenka Policova","is_ca":true},{"name":"A. W. Neumann","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.03484486038817321,"gpt":0.267337582004786,"spread":0.2324927216166128,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00434377,0.001179947,0.0009658258,0.001162164,0.0008463927,0.001438613,0.002630229,0.001543931,0.001029692],"category_scores_gemma":[0.006163779,0.001241592,0.0003979207,0.0004954195,0.0006399662,0.001121475,0.0008539085,0.001077349,0.0009289237],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00155162,"about_ca_system_score_gemma":0.001197476,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001747695,"about_ca_topic_score_gemma":0.003516539,"domain_scores_codex":[0.9958509,0.0004908492,0.0002259703,0.0006744252,0.00262955,0.0001283915],"domain_scores_gemma":[0.9937761,0.002384555,0.0005042533,0.0005969559,0.002616482,0.0001217001],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0002077965,0.00009700912,0.000943846,0.0001944325,0.00002088682,0.0000576315,0.0001138706,0.001179941,0.9601822,0.001535422,0.0004364181,0.03503066],"study_design_scores_gemma":[0.00002963725,0.0002757921,0.001294438,0.000009375658,0.00003000302,0.0001355089,0.0000163042,0.04417857,0.9493477,0.0001760052,0.004476225,0.00003041331],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"methods","genre_scores_codex":[0.08586299,0.001557323,0.9085544,0.0002864172,0.0002726584,0.0004955507,0.0002803951,0.0009963419,0.001693927],"genre_scores_gemma":[0.265819,0.001173253,0.7279528,0.0001755277,0.0001346501,0.0007672463,0.0003987547,0.0001944809,0.003384273],"genre_candidate":"methods","genre_consensus":"methods","teacher_disagreement_score":0.00434377,"threshold_uncertainty_score":0.02297229,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2044164983","doi":"10.1063/1.2778613","title":"Commissioning and performance of the variable line spacing plane grating monochromator beamline at the Canadian Light Source","year":2007,"lang":"en","type":"article","venue":"Review of Scientific Instruments","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":83,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":true},"ca_institutions":"Western University; Canadian Light Source (Canada); University of Saskatchewan","funders":"","keywords":"Monochromator; Beamline; Optics; Grating; Light source; Line (geometry); Plane (geometry); Materials science; Physics; Beam (structure); Geometry","authors":[{"name":"Yongfeng Hu","is_ca":true},{"name":"Lucia Zuin","is_ca":true},{"name":"G.M. Wright","is_ca":true},{"name":"R. Igarashi","is_ca":true},{"name":"M. McKibben","is_ca":true},{"name":"Tracy Wilson","is_ca":true},{"name":"S. Y. Chen","is_ca":true},{"name":"Timothy P. Johnson","is_ca":true},{"name":"Dylan Maxwell","is_ca":true},{"name":"B. Yates","is_ca":true},{"name":"T. K. Sham","is_ca":true},{"name":"R. Reininger","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.00782300039813556,"gpt":0.229822953153781,"spread":0.2219999527556455,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.002771403,0.0005203159,0.0008693554,0.001678448,0.001540054,0.0008655476,0.001218062,0.0005441097,0.002817743],"category_scores_gemma":[0.001669659,0.0005580423,0.0003082899,0.002245679,0.0006269864,0.0004328006,0.0004296567,0.0009815561,0.001210756],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.008641849,"about_ca_system_score_gemma":0.01111931,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.2204136,"about_ca_topic_score_gemma":0.2621685,"domain_scores_codex":[0.9970073,0.000131406,0.0000684615,0.0002012773,0.002299438,0.0002920959],"domain_scores_gemma":[0.9965652,0.0002242553,0.0001837661,0.0003345456,0.002503094,0.0001891202],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0003496766,0.00007787887,0.004753427,0.0003196531,0.00003124433,0.0001769643,0.000419808,0.00245898,0.907968,0.002482808,0.009497973,0.07146352],"study_design_scores_gemma":[0.00006789778,0.0002276236,0.01918038,0.00002619446,0.00003414486,0.0001705277,0.00008647365,0.004616631,0.9251455,0.0001351661,0.05023535,0.00007400188],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.7554727,0.005759574,0.1686611,0.001937225,0.0003942883,0.00256175,0.01016684,0.01115651,0.04389002],"genre_scores_gemma":[0.4906463,0.003757702,0.4692613,0.0002319164,0.00005944321,0.001041598,0.007615616,0.001320259,0.02606582],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.2204136,"threshold_uncertainty_score":0.4382613,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2082197682","doi":"10.1177/0962280213491641","title":"Expectation maximization-based likelihood inference for flexible cure rate models with Weibull lifetimes","year":2013,"lang":"en","type":"article","venue":"Statistical Methods in Medical Research","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":75,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"McMaster University","funders":"Natural Sciences and Engineering Research Council of Canada","keywords":"Inference; Weibull distribution; Maximization; Expectation–maximization algorithm; Computer science; Maximum likelihood; Econometrics; Statistics; Artificial intelligence; Mathematics; Mathematical optimization","authors":[{"name":"N. Balakrishnan","is_ca":true},{"name":"Suvra Pal","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.06775448943020891,"gpt":0.4855262341241343,"spread":0.4177717446939254,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.01552268,0.001004497,0.001754088,0.001431234,0.00061942,0.001284602,0.002480433,0.001177215,0.001600562],"category_scores_gemma":[0.03802015,0.001040656,0.001556562,0.001624144,0.001884123,0.002156215,0.001871366,0.002699381,0.0004316455],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.001298476,"about_ca_system_score_gemma":0.001360837,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00337531,"about_ca_topic_score_gemma":0.003113498,"domain_scores_codex":[0.996064,0.002899653,0.0001697127,0.0004026475,0.0003162455,0.0001478126],"domain_scores_gemma":[0.9688575,0.02803173,0.001288484,0.001125913,0.0005246666,0.0001717851],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"theoretical_or_conceptual","study_design_scores_codex":[0.00009367044,0.00005363868,0.001985281,0.0001150227,0.0001129595,0.0001684453,0.0001660644,0.8550961,0.0007769801,0.1026497,0.0005933279,0.03818879],"study_design_scores_gemma":[0.0000123871,0.00001411373,0.0002769597,0.0000140467,0.00001068867,0.00004141783,0.00001281374,0.952152,0.0002740813,0.04679703,0.0003746541,0.00001985082],"study_design_candidate":"theoretical_or_conceptual","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"methods","genre_scores_codex":[0.004361744,0.000150935,0.9951127,0.00008765371,0.000006290018,0.00001816266,0.00003760904,0.00007495081,0.0001500067],"genre_scores_gemma":[0.3705288,0.001021477,0.624353,0.0002106543,0.0000922871,0.0004348992,0.0005796757,0.0002303423,0.002549004],"genre_candidate":"methods","genre_consensus":"methods","teacher_disagreement_score":0.01552268,"threshold_uncertainty_score":0.08209282,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2085237633","doi":"10.1116/1.1596216","title":"High-resolution pattern generation using the epoxy novolak SU-8 2000 resist by electron beam lithography","year":2003,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":70,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Alberta","funders":"University of Alberta","keywords":"Resist; Electron-beam lithography; Laser linewidth; Lithography; Materials science; Epoxy; Cathode ray; Photolithography; Resolution (logic); Optics; Fabrication; Grating; X-ray lithography; Beam (structure); Extreme ultraviolet lithography; Optoelectronics; Electron; Nanotechnology; Physics; Composite material; Laser; Computer science","authors":[{"name":"Mirwais Aktary","is_ca":true},{"name":"Martin O. Jensen","is_ca":true},{"name":"K. L. Westra","is_ca":true},{"name":"Michael J. Brett","is_ca":true},{"name":"M. R. Freeman","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01182365651801957,"gpt":0.2257115865356931,"spread":0.2138879300176735,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001779588,0.0002353328,0.0001708203,0.0001609408,0.0001101934,0.000302879,0.0002839318,0.0002098783,0.0009844064],"category_scores_gemma":[0.0002111762,0.0002281623,0.0001151396,0.00008823861,0.0001785205,0.0002717636,0.0001914974,0.0003253282,0.0005804315],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001801501,"about_ca_system_score_gemma":0.0001300868,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002495592,"about_ca_topic_score_gemma":0.0007340896,"domain_scores_codex":[0.9998664,0.00001111615,0.00000980535,0.00002817279,0.00006462396,0.00001996563],"domain_scores_gemma":[0.9998636,0.00003896081,0.00003764267,0.00002909275,0.00001861566,0.00001198854],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000006417887,0.000005200407,0.00006353072,0.00001715293,0.000001034315,0.00004211557,0.00001217057,0.0001009576,0.9971786,0.0001542124,0.00005603327,0.002362616],"study_design_scores_gemma":[0.000005506362,0.00005418067,0.0007121995,0.000002543023,0.000002573613,0.0002448547,0.00000787639,0.001311145,0.9951324,0.00005613202,0.002466435,0.00000416563],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8669745,0.00100532,0.1218544,0.0002059307,0.00005987199,0.00009763452,0.0002845336,0.0007346614,0.008783082],"genre_scores_gemma":[0.8087775,0.000831605,0.1827035,0.00004416419,0.00001087384,0.00006263165,0.0002882631,0.00009694542,0.007184461],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0009844064,"threshold_uncertainty_score":0.003293157,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2078226783","doi":"10.1021/cm990440t","title":"Laser Flash Photolysis Study of Two Aromatic <i>N</i>-Oxyimidosulfonate Photoacid Generators","year":2000,"lang":"en","type":"article","venue":"Chemistry of Materials","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":64,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Ottawa","funders":"","keywords":"Flash photolysis; Photochemistry; Chemistry; Acetonitrile; Benzene; Phthalimide; Organic chemistry; Reaction rate constant; Kinetics","authors":[{"name":"F. Ortica","is_ca":true},{"name":"J. C. Scaiano","is_ca":true},{"name":"Gerd Pohlers","is_ca":true},{"name":"J. Cameron","is_ca":true},{"name":"Anthony Zampini","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.00661152832057122,"gpt":0.230436400402532,"spread":0.2238248720819608,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0000871776,0.0001925276,0.0001210003,0.0000750321,0.00008920341,0.0001124132,0.0001650524,0.0002059817,0.000948338],"category_scores_gemma":[0.0001527019,0.00005951128,0.0001082835,0.00006827022,0.0001245861,0.0001663864,0.00009801627,0.0001736368,0.0001867996],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002000184,"about_ca_system_score_gemma":0.0001205464,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003753506,"about_ca_topic_score_gemma":0.0003868898,"domain_scores_codex":[0.9999292,0.000008563534,0.000002703903,0.00001486979,0.00002653085,0.00001802229],"domain_scores_gemma":[0.9999069,0.0000243311,0.00003218985,0.000006477884,0.00001738316,0.00001273039],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00004483932,0.000009797803,0.0001016172,0.00001982017,0.000001500789,0.00003213054,0.0000138288,0.00007800535,0.9985662,0.00004099588,0.00001316849,0.001078103],"study_design_scores_gemma":[0.000002945437,0.0001180508,0.000588334,9.039089e-7,0.000001900715,0.00003647629,0.000007427977,0.0005030265,0.9983811,0.000005477355,0.0003529171,0.000001338833],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9972608,0.0003047633,0.00163618,0.00001653762,0.000003955132,0.000009986991,0.00003417488,0.00001951293,0.0007141862],"genre_scores_gemma":[0.9971557,0.0002190597,0.001440274,0.00001184839,0.000003369054,0.000007981539,0.00006980034,0.000008689547,0.001083209],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.000948338,"threshold_uncertainty_score":0.003172517,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2067399754","doi":"10.1007/s00339-008-4551-x","title":"High-resolution X-ray imaging—a powerful nondestructive technique for applications in semiconductor industry","year":2008,"lang":"en","type":"article","venue":"Applied Physics A","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":57,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Synchrotron radiation; Synchrotron; Optics; Zone plate; Materials science; Fresnel zone; Image resolution; Microscope; Electromigration; Chip; Optoelectronics; Diffraction; Physics; Electrical engineering; Composite material","authors":[{"name":"Ehrenfried Zschech","is_ca":true},{"name":"Wenbing Yun","is_ca":false},{"name":"Gerd Schneider","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009597774548924305,"gpt":0.2407613828193403,"spread":0.231163608270416,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004378878,0.0003411856,0.0004003545,0.0004257139,0.000242795,0.0006603024,0.0007005942,0.0005030041,0.002360739],"category_scores_gemma":[0.0004223837,0.0004092757,0.0001884189,0.0004649737,0.0005993325,0.001466523,0.0005479303,0.0008962456,0.0008841702],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000233057,"about_ca_system_score_gemma":0.0002764276,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002721593,"about_ca_topic_score_gemma":0.0003951894,"domain_scores_codex":[0.9997402,0.00002595873,0.00001125419,0.0000477182,0.0001562669,0.00001873675],"domain_scores_gemma":[0.9997897,0.00007093552,0.00003877967,0.00004678114,0.00003360985,0.00002031277],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00009675909,0.00001928433,0.0003740533,0.0003445733,0.00001451249,0.000115388,0.00007427725,0.0003529354,0.9244916,0.006725646,0.002337392,0.0650535],"study_design_scores_gemma":[0.00003044106,0.0001677954,0.001949388,0.00004297441,0.00003221797,0.001152569,0.00005804448,0.005803759,0.9282465,0.001851617,0.06063339,0.00003134303],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.1832267,0.1138179,0.6432835,0.004106736,0.001002028,0.0003229992,0.0009152401,0.002598488,0.05072632],"genre_scores_gemma":[0.5381263,0.02954225,0.4060644,0.00100698,0.0004736209,0.00009323169,0.0004968069,0.0002337075,0.02396272],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.002360739,"threshold_uncertainty_score":0.007897437,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2108388356","doi":"10.1186/1556-276x-6-446","title":"Polystyrene negative resist for high-resolution electron beam lithography","year":2011,"lang":"en","type":"article","venue":"Nanoscale Research Letters","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":57,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Resist; Nanochemistry; Materials science; Polystyrene; Electron-beam lithography; Lithography; Nanotechnology; Cathode ray; Resolution (logic); Extreme ultraviolet lithography; Stencil lithography; Electron beam processing; Electron; Optoelectronics; Polymer; Physics; Composite material; Nuclear physics; Computer science","authors":[{"name":"Siqi Ma","is_ca":true},{"name":"Celal Con","is_ca":true},{"name":"Mustafa Yavuz","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.03662300647749282,"gpt":0.3050715307578091,"spread":0.2684485242803163,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001845645,0.0002739305,0.0001085357,0.0001052276,0.0001250849,0.0001922698,0.0001355862,0.0001584423,0.001341978],"category_scores_gemma":[0.000285378,0.0001055652,0.00005990118,0.0001041535,0.0001303429,0.0001809863,0.0001392288,0.0002095983,0.0004527727],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001577183,"about_ca_system_score_gemma":0.00009678923,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0004584213,"about_ca_topic_score_gemma":0.001115939,"domain_scores_codex":[0.9998299,0.00002707449,0.000008038743,0.00002636124,0.00008388794,0.00002474927],"domain_scores_gemma":[0.9998358,0.00007888439,0.00002473085,0.00001798353,0.00003168047,0.00001082534],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001044071,0.000003641562,0.00009081255,0.00002690427,8.740865e-7,0.00003211668,0.00001591244,0.0000976645,0.9984421,0.0001021684,0.00004926307,0.001128016],"study_design_scores_gemma":[0.000002231023,0.00007158297,0.001331464,0.000003914644,0.000003049359,0.0001056969,0.00001318979,0.001260409,0.9951439,0.00004116085,0.002019903,0.000003461564],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9600747,0.00287771,0.02948081,0.000225561,0.00007766383,0.00004469481,0.0002277722,0.0001870962,0.006804015],"genre_scores_gemma":[0.9796584,0.0011232,0.01496587,0.00004577007,0.00001274191,0.00001764052,0.0001569268,0.00003328195,0.003986185],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001341978,"threshold_uncertainty_score":0.004489362,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2029532081","doi":"10.1116/1.3497019","title":"Simulation of electron beam lithography of nanostructures","year":2010,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":39,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Applied Nanotools (Canada); University of Alberta; National Institute for Nanotechnology","funders":"","keywords":"Resist; Lithography; Electron-beam lithography; Materials science; Cathode ray; Secondary electrons; Computation; Electron; Nanolithography; Fabrication; Nanotechnology; Optoelectronics; Computer science; Physics","authors":[{"name":"Maria Stepanova","is_ca":true},{"name":"Taras Fito","is_ca":true},{"name":"Z. Szabó","is_ca":true},{"name":"Kamlesh Alti","is_ca":true},{"name":"Adegboyega P. Adeyenuwo","is_ca":true},{"name":"K. Koshelev","is_ca":true},{"name":"Mirwais Aktary","is_ca":true},{"name":"S. K. Dew","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.005731141126274175,"gpt":0.2330509371751379,"spread":0.2273197960488638,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004314229,0.0003504378,0.00058307,0.0003223449,0.0004709943,0.0004791533,0.000695479,0.001064359,0.00203025],"category_scores_gemma":[0.001754808,0.0003781279,0.0005773366,0.0003189554,0.0004559722,0.0004637506,0.0004509973,0.0004101514,0.000206895],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.001096052,"about_ca_system_score_gemma":0.001014161,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.006583641,"about_ca_topic_score_gemma":0.003445927,"domain_scores_codex":[0.9998226,0.00004111488,0.000009889372,0.00002215546,0.00007540615,0.00002891806],"domain_scores_gemma":[0.9994853,0.0003061637,0.00004016955,0.00005292792,0.00008468076,0.00003080931],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.00001314834,0.00001149746,0.0004572095,0.00002124125,0.000008574519,0.00004345842,0.00003460834,0.9921252,0.002089728,0.003701118,0.0001523733,0.001341962],"study_design_scores_gemma":[0.000006782333,0.000005768087,0.0001147861,0.000002415211,0.000001370347,0.000009166158,0.000004828752,0.9981682,0.0006559347,0.0005746079,0.0004532971,0.000002671121],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4412979,0.0003172768,0.5199829,0.0005527678,0.0001209512,0.0003516425,0.001495488,0.001148081,0.03473296],"genre_scores_gemma":[0.8636832,0.0002224298,0.128294,0.0001086182,0.00001462098,0.0005492499,0.0006632216,0.0001550024,0.006309778],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.006583641,"threshold_uncertainty_score":0.01309061,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2050140399","doi":"10.1143/jjap.51.06fc05","title":"Study of Development Processes for ZEP-520 as a High-Resolution Positive and Negative Tone Electron Beam Lithography Resist","year":2012,"lang":"en","type":"article","venue":"Japanese Journal of Applied Physics","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":30,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"National Institute for Nanotechnology; University of Alberta","funders":"","keywords":"Resist; Materials science; Electron-beam lithography; Methyl isobutyl ketone; Grating; Lithography; Dissolution; Scanning electron microscope; Cathode ray; Nanotechnology; Optoelectronics; Electron; Chemistry; Composite material; Ketone; Organic chemistry","authors":[{"name":"Mohammad Mohammad","is_ca":true},{"name":"K. Koshelev","is_ca":true},{"name":"Taras Fito","is_ca":true},{"name":"David Ai Zhi Zheng","is_ca":true},{"name":"Maria Stepanova","is_ca":true},{"name":"S. K. Dew","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009002557507120302,"gpt":0.2662587828649617,"spread":0.2572562253578414,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001837525,0.0002183103,0.0001823301,0.0001208695,0.0001178737,0.0002326363,0.0002277089,0.0001881604,0.0003205873],"category_scores_gemma":[0.0004022626,0.0001874209,0.0001548025,0.0001412449,0.0001865439,0.0003852305,0.0001425907,0.0003042595,0.000126589],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003152995,"about_ca_system_score_gemma":0.0001828653,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0008569121,"about_ca_topic_score_gemma":0.0008971448,"domain_scores_codex":[0.9998136,0.00001861885,0.000007299679,0.00005208993,0.00008594601,0.00002248408],"domain_scores_gemma":[0.9998336,0.00006047484,0.00004725708,0.00001476137,0.00003173513,0.00001222586],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002684002,0.0000107216,0.0003045394,0.00004456927,0.000002668585,0.00003304175,0.00003073475,0.0002690877,0.9976816,0.0001541098,0.00001488708,0.001427141],"study_design_scores_gemma":[0.000006186856,0.0001273711,0.001888177,0.000002557836,0.000006388431,0.00007721416,0.00001713952,0.004159798,0.9930829,0.00002770227,0.0006000395,0.000004486728],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9911781,0.0008406889,0.006741446,0.00003294005,0.000006213665,0.00002375757,0.0000591214,0.00002094742,0.001096788],"genre_scores_gemma":[0.9905326,0.0007748944,0.007568654,0.00001101725,0.000003630491,0.00002058764,0.00006242105,0.00001291834,0.001013309],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0008569121,"threshold_uncertainty_score":0.002287626,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2206362548","doi":"","title":"Structure-preserving stippling by priority-based error diffusion","year":2011,"lang":"en","type":"article","venue":"Graphics Interface","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":29,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Carleton University","funders":"","keywords":"Contrast (vision); Computer science; Variety (cybernetics); Algorithm; Core (optical fiber); Diffusion; Nonlinear system; Theoretical computer science; Artificial intelligence; Telecommunications; Physics","authors":[{"name":"Hua Li","is_ca":true},{"name":"David Mould","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02030976473850915,"gpt":0.2606919141526365,"spread":0.2403821494141273,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.001137056,0.0009237952,0.0008773123,0.0009463428,0.0006649884,0.001094444,0.002498303,0.0009594712,0.004328447],"category_scores_gemma":[0.004286018,0.0006646696,0.0005979668,0.0007736222,0.0008615236,0.00175925,0.001873189,0.001872348,0.001757527],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0006426258,"about_ca_system_score_gemma":0.0007935861,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001273471,"about_ca_topic_score_gemma":0.00189334,"domain_scores_codex":[0.9987029,0.0001787464,0.00008056087,0.0002683734,0.0006924442,0.00007693149],"domain_scores_gemma":[0.9980034,0.0006695886,0.0001956983,0.0006256581,0.0003859245,0.0001196528],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"design_other","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.0003144951,0.0001023012,0.000432312,0.0003039024,0.00004597048,0.0001424528,0.0003458351,0.1200761,0.2737134,0.0274927,0.003785228,0.5732453],"study_design_scores_gemma":[0.00004838999,0.00008573606,0.000246099,0.00001813066,0.00001492786,0.000210129,0.00003072032,0.8680885,0.1112867,0.01085912,0.009059316,0.00005213119],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.005509856,0.00006779381,0.9925061,0.00003124777,0.00003291279,0.00003316312,0.0000194019,0.001054462,0.000745051],"genre_scores_gemma":[0.1063743,0.0001286174,0.8897082,0.00006066251,0.0000392866,0.00005862507,0.00008781484,0.0006083696,0.002934054],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.004328447,"threshold_uncertainty_score":0.01448011,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2979321866","doi":"10.1088/2632-2153/ab6d5e","title":"Deep learning-guided surface characterization for autonomous hydrogen lithography","year":2020,"lang":"en","type":"article","venue":"Machine Learning Science and Technology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":29,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"National Research Council Canada; National Institute for Nanotechnology; University of Alberta","funders":"Canadian Network for Research and Innovation in Machining Technology, Natural Sciences and Engineering Research Council of Canada; Alberta Innovates - Technology Futures; Compute Canada","keywords":"Characterization (materials science); Lithography; Nanotechnology; Materials science; Surface (topology); Deep learning; Artificial intelligence; Computer science; Optoelectronics; Geometry; Mathematics","authors":[{"name":"Mohammad Rashidi","is_ca":true},{"name":"Jeremiah Croshaw","is_ca":true},{"name":"Kieran Mastel","is_ca":true},{"name":"Marcus Tamura","is_ca":true},{"name":"Hedieh Hosseinzadeh","is_ca":false},{"name":"Robert A. Wolkow","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.008238386016122916,"gpt":0.2386350040282926,"spread":0.2303966180121697,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002801754,0.0003443389,0.00022181,0.0003047562,0.0001280242,0.0003500934,0.0005086777,0.0003723321,0.001038785],"category_scores_gemma":[0.0006876657,0.000192156,0.000153644,0.0001677372,0.000319322,0.0003881705,0.000479075,0.0004032566,0.0003106229],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000539023,"about_ca_system_score_gemma":0.0005042857,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001268058,"about_ca_topic_score_gemma":0.002448521,"domain_scores_codex":[0.99986,0.00001588112,0.00000557265,0.00003028476,0.00006617544,0.00002195414],"domain_scores_gemma":[0.999638,0.0001040592,0.00006917227,0.00007156663,0.00009746019,0.00001986394],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0002582325,0.0001440984,0.006393318,0.0001443241,0.00004199767,0.0001471669,0.0001112012,0.1506232,0.6939908,0.003386451,0.002018542,0.1427407],"study_design_scores_gemma":[0.000005184277,0.0000373306,0.001163889,0.000003502719,0.000003081529,0.00002475711,0.00001202921,0.9042658,0.09308834,0.0007791441,0.000610692,0.000006207691],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.3807474,0.0002459558,0.6123155,0.0002625825,0.00003864481,0.00005469531,0.0003749956,0.002778439,0.003181921],"genre_scores_gemma":[0.9121533,0.00005265109,0.08627731,0.00006257722,0.000005582826,0.00002706976,0.0001996411,0.00006184817,0.001160099],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.001268058,"threshold_uncertainty_score":0.003910899,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1966720683","doi":"10.1016/j.mee.2011.02.032","title":"SiO2 shallow nanostructures ICP etching using ZEP electroresist","year":2011,"lang":"en","type":"article","venue":"Microelectronic Engineering","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":28,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"Université de Sherbrooke","funders":"Natural Sciences and Engineering Research Council of Canada","keywords":"Resist; Electron-beam lithography; Etching (microfabrication); Materials science; Lithography; Nanoscopic scale; Inductively coupled plasma; Nanostructure; Nanometre; Optoelectronics; Surface finish; Plasma etching; Surface roughness; Scanning electron microscope; Reactive-ion etching; Enhanced Data Rates for GSM Evolution; Nanotechnology; Plasma; Composite material; Layer (electronics)","authors":[{"name":"Marc Guilmain","is_ca":true},{"name":"Abdelatif Jaouad","is_ca":true},{"name":"Serge Ecoffey","is_ca":true},{"name":"Dominique Drouin","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01111062860632325,"gpt":0.1953019477746077,"spread":0.1841913191682845,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001238318,0.0004556772,0.0003067556,0.0001791757,0.000268964,0.0003921855,0.0003587286,0.000290279,0.00140843],"category_scores_gemma":[0.0001794067,0.0004247724,0.0001602729,0.0001980174,0.0002471492,0.000457665,0.0004388288,0.0004711501,0.000905032],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003882441,"about_ca_system_score_gemma":0.0003215423,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0009243275,"about_ca_topic_score_gemma":0.0022012,"domain_scores_codex":[0.9998367,0.000005789886,0.00001085552,0.0000533122,0.00006296665,0.00003038605],"domain_scores_gemma":[0.9999239,0.00001489884,0.00001837191,0.00002093275,0.00001602128,0.000005911487],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002135577,0.000004240102,0.00009646508,0.00004261464,0.000002956271,0.00004603485,0.00004474221,0.00006151109,0.997475,0.0002819627,0.0001539671,0.001769158],"study_design_scores_gemma":[0.000009407388,0.0000238027,0.0006274159,0.000002501385,0.000002982703,0.00006062775,0.00002055531,0.0006684883,0.9960335,0.00006648846,0.002480437,0.00000395507],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9446806,0.0008826918,0.03412137,0.0003297628,0.0001679645,0.0001749058,0.0008720692,0.001434311,0.01733635],"genre_scores_gemma":[0.959147,0.0005717938,0.02925427,0.00007547753,0.00002370711,0.00007960195,0.0004178514,0.0001869841,0.01024319],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.00140843,"threshold_uncertainty_score":0.004711688,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1577782092","doi":"10.1002/9780470594179.ch12","title":"Photoimaging and Lithographic Processes in Polymers","year":2010,"lang":"en","type":"other","venue":"","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":27,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Ottawa","funders":"Natural Sciences and Engineering Research Council of Canada","keywords":"Photolithography; Photoresist; Polymer; Lithography; Resist; Extreme ultraviolet lithography; Materials science; Photochemistry; Ionic bonding; Nanotechnology; Polymer chemistry; Chemistry; Optoelectronics; Organic chemistry; Composite material","authors":[{"name":"Marius G. Ivan","is_ca":true},{"name":"J. C. Scaiano","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.003890293314945632,"gpt":0.22276305539356,"spread":0.2188727620786144,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001233362,0.0004923778,0.0002300729,0.0006246304,0.0003255848,0.0008169736,0.0004934183,0.0003526522,0.01525498],"category_scores_gemma":[0.0002039278,0.0002804189,0.0002320366,0.0005382515,0.0004198924,0.001077482,0.0004634033,0.000733265,0.00780901],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0005873924,"about_ca_system_score_gemma":0.0002631445,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003521051,"about_ca_topic_score_gemma":0.0006891954,"domain_scores_codex":[0.9997421,0.00001517418,0.00001020195,0.00005670833,0.0001482719,0.00002749715],"domain_scores_gemma":[0.9999303,0.00002026388,0.00001161807,0.00001698292,0.00001558472,0.000005261365],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00005533075,0.00007253668,0.0002226356,0.0007402503,0.00001032721,0.0002700856,0.0001558567,0.0006430131,0.5763221,0.05551985,0.01060539,0.3553827],"study_design_scores_gemma":[0.000007033068,0.00005489547,0.0007935761,0.00007601541,0.00000903866,0.0007280043,0.00003578373,0.0008851175,0.7022417,0.003253898,0.2918989,0.0000160037],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"other","genre_gemma":"empirical","genre_scores_codex":[0.06241618,0.07228535,0.206456,0.001539716,0.001708924,0.0002854552,0.0009801808,0.003182109,0.6511461],"genre_scores_gemma":[0.2177901,0.05045568,0.1617081,0.0008024963,0.000339772,0.0002037908,0.0009910617,0.0007483588,0.5669607],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.01525498,"threshold_uncertainty_score":0.05103296,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2176356482","doi":"10.1109/tia.2013.2244544","title":"Model-Based Virtual Sensors and Core-Temperature Observers in Thermoforming Applications","year":2013,"lang":"en","type":"article","venue":"IEEE Transactions on Industry Applications","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":25,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"McGill University","funders":"","keywords":"Thermoforming; Temperature measurement; Temperature control; Controllability; Core (optical fiber); Observer (physics); Mechanical engineering; Process (computing); Robustness (evolution); Computer science; Infrared heater; Engineering; Control theory (sociology); Infrared; Artificial intelligence; Control (management); Chemistry; Optics","authors":[{"name":"Rahi Modirnia","is_ca":true},{"name":"Benoît Boulet","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01719172690198114,"gpt":0.2489703172380287,"spread":0.2317785903360475,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000498683,0.0003355802,0.000370592,0.0001383343,0.0001196948,0.0006908894,0.0005583783,0.0006607597,0.0006933286],"category_scores_gemma":[0.001266132,0.0002667049,0.0002874402,0.0001660185,0.0006080278,0.0007880628,0.0004720746,0.0007109938,0.0001545108],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003159428,"about_ca_system_score_gemma":0.0003858662,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0007127373,"about_ca_topic_score_gemma":0.0005974287,"domain_scores_codex":[0.9995672,0.0001372945,0.00002018556,0.00006070537,0.0001858685,0.00002878432],"domain_scores_gemma":[0.9995922,0.0001713561,0.00006247435,0.00008827294,0.00006977858,0.00001592138],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.0002706031,0.00008852997,0.0009790075,0.0003199767,0.00005399778,0.0002038232,0.0002990337,0.6624736,0.09593619,0.1269633,0.001080575,0.1113314],"study_design_scores_gemma":[0.00001131305,0.0001069516,0.0001922527,0.00001543362,0.00001347098,0.00005009566,0.00001610093,0.9714504,0.01603777,0.008837001,0.003257664,0.00001160105],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.01439821,0.0005204643,0.9827166,0.00008386993,0.00006531784,0.00001559543,0.000009190352,0.0003099489,0.001880896],"genre_scores_gemma":[0.9182675,0.0004809083,0.07927001,0.00005359364,0.00002880092,0.00004502187,0.0000245707,0.00003033396,0.001799309],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.0007127373,"threshold_uncertainty_score":0.002637327,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2003288341","doi":"10.1088/0957-4484/25/17/175301","title":"Nanofabrication of high aspect ratio structures using an evaporated resist containing metal","year":2014,"lang":"en","type":"article","venue":"Nanotechnology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":25,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"Oxford Cancer Imaging Centre; Engineering and Physical Sciences Research Council","keywords":"Resist; Materials science; Nanolithography; Polystyrene; Etching (microfabrication); Silicon; Substrate (aquarium); Raman spectroscopy; Evaporation; Nanotechnology; Dry etching; Reactive-ion etching; Layer (electronics); Optoelectronics; Composite material; Fabrication; Optics; Polymer","authors":[{"name":"Celal Con","is_ca":true},{"name":"Jian Zhang","is_ca":false},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01434628773991742,"gpt":0.261462390121964,"spread":0.2471161023820466,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001084595,0.000378159,0.0001512446,0.000161065,0.0002105642,0.0002288793,0.0002971876,0.0003362943,0.0009330955],"category_scores_gemma":[0.0002021792,0.0002436151,0.0002113346,0.00009766314,0.0001680011,0.0002487406,0.000196663,0.0003877693,0.00038109],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002005329,"about_ca_system_score_gemma":0.0001111589,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002516379,"about_ca_topic_score_gemma":0.0009159938,"domain_scores_codex":[0.9998876,0.00000685107,0.00000829337,0.00003624448,0.00004127097,0.00001975469],"domain_scores_gemma":[0.9998443,0.00004285366,0.00004838302,0.00003017997,0.00002397734,0.00001025364],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000003088741,0.000002625413,0.0000197444,0.00001560361,0.000001496689,0.00002204115,0.000008702947,0.00001078833,0.9993507,0.0000446852,0.00001242518,0.0005080021],"study_design_scores_gemma":[0.00000434721,0.00004367208,0.0008475736,0.000002653357,0.000004191378,0.0001674986,0.0000099699,0.0003033731,0.9975556,0.00003926469,0.001018531,0.000003335987],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9610621,0.000875751,0.03301799,0.0001211603,0.00009179337,0.00006961328,0.0002213382,0.000373868,0.004166318],"genre_scores_gemma":[0.9483906,0.0005083352,0.04725697,0.00006684109,0.00002029222,0.00005508716,0.0002699081,0.00007964206,0.003352418],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0009330955,"threshold_uncertainty_score":0.003121495,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2002725389","doi":"10.1088/0957-4484/24/24/245302","title":"Effect of molecular weight distribution on e-beam exposure properties of polystyrene","year":2013,"lang":"en","type":"article","venue":"Nanotechnology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":25,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Polystyrene; Dispersity; Materials science; Molar mass distribution; Resist; Electron-beam lithography; Polymer chemistry; Analytical Chemistry (journal); Polymer; Chemical engineering; Nanotechnology; Composite material; Chromatography; Chemistry","authors":[{"name":"Ripon Kumar Dey","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.002738733081543514,"gpt":0.1945127417571093,"spread":0.1917740086755658,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000181618,0.0003936703,0.0001750048,0.000286079,0.0001497955,0.0003459929,0.0002201,0.0003038647,0.001176877],"category_scores_gemma":[0.0006574509,0.0001812632,0.0001728126,0.0002433152,0.0002509254,0.0003904384,0.0002321404,0.000252073,0.0001525695],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002586036,"about_ca_system_score_gemma":0.0001417632,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0008348969,"about_ca_topic_score_gemma":0.0005773965,"domain_scores_codex":[0.9998354,0.00002414737,0.000009681695,0.00003590455,0.00005125814,0.00004365062],"domain_scores_gemma":[0.9997118,0.0001675656,0.00004508469,0.00001826016,0.00003803378,0.0000192895],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0003465787,0.0001233136,0.002913691,0.00009438301,0.00003878306,0.0002166277,0.00008684453,0.03151935,0.9596631,0.0005057587,0.00006962633,0.004421897],"study_design_scores_gemma":[0.00003410617,0.0005553886,0.006207258,0.00001095948,0.0000524766,0.00009705932,0.00006672431,0.04178309,0.9503502,0.0001330755,0.0006862471,0.00002341192],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9963278,0.0001958908,0.002154271,0.00003013411,0.000006720252,0.00001272172,0.00007459012,0.00004073503,0.001157059],"genre_scores_gemma":[0.9984427,0.0002536494,0.0008458464,0.00001408408,0.000001677236,0.000009989353,0.00004850943,0.00001636985,0.0003672341],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001176877,"threshold_uncertainty_score":0.003937006,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2159167934","doi":"10.1117/12.518213","title":"Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists","year":2003,"lang":"en","type":"article","venue":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":22,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Simon Fraser University","funders":"","keywords":"Resist; Materials science; Photomask; Laser; Optics; Thin film; Optoelectronics; Photoresist; Nanotechnology; Layer (electronics)","authors":[{"name":"Glenn H. Chapman","is_ca":true},{"name":"Yuqiang Tu","is_ca":true},{"name":"James M. Dykes","is_ca":true},{"name":"Masahiko Mio","is_ca":false},{"name":"Jun Peng","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.00732374977744131,"gpt":0.2208215958482433,"spread":0.213497846070802,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001062954,0.000277912,0.0001703577,0.0003027788,0.0001050086,0.0003490106,0.0005549536,0.0002652159,0.002705134],"category_scores_gemma":[0.0004211885,0.0002676999,0.0001815867,0.0001877944,0.0002150511,0.0004480511,0.0003169568,0.0003143031,0.000766038],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000210241,"about_ca_system_score_gemma":0.00009061184,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0001965406,"about_ca_topic_score_gemma":0.0004703821,"domain_scores_codex":[0.9998442,0.00001076861,0.00001182306,0.00004203601,0.00006637063,0.00002477272],"domain_scores_gemma":[0.9997111,0.00006154625,0.00007717244,0.00007425183,0.00004509975,0.00003075028],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003524221,0.00001521703,0.0002167142,0.00007137158,0.000008063058,0.00008845472,0.00002990429,0.0002774707,0.988913,0.0003837493,0.0001975594,0.009763193],"study_design_scores_gemma":[0.000005474068,0.0000653477,0.00106642,0.000002295761,0.000006186579,0.0001797717,0.00001128833,0.001621335,0.9942997,0.00006703576,0.002668523,0.000006635978],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9248181,0.0007603519,0.06301107,0.0001035445,0.0002198613,0.0001364526,0.000518184,0.002050028,0.008382441],"genre_scores_gemma":[0.8981906,0.0003791656,0.09168012,0.00005908238,0.00002622642,0.0001106538,0.0002798224,0.0001954746,0.009078889],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.002705134,"threshold_uncertainty_score":0.009049535,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2145380776","doi":"10.1017/s1431927604040711","title":"The Impact of Charging on Low-Energy Electron Beam Lithography","year":2004,"lang":"en","type":"article","venue":"Microscopy and Microanalysis","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":21,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Université de Sherbrooke","funders":"","keywords":"Electron-beam lithography; Lithography; Extreme ultraviolet lithography; Materials science; X-ray lithography; Next-generation lithography; Voltage; Resist; Maskless lithography; Acceleration voltage; Optoelectronics; Cathode ray; Distortion (music); Optics; Electron; Nanotechnology; CMOS; Physics; Electrical engineering; Engineering","authors":[{"name":"Lau Kien Mun","is_ca":true},{"name":"Dominique Drouin","is_ca":true},{"name":"Éric Lavallée","is_ca":true},{"name":"Jacques Beauvais","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.003332271820185367,"gpt":0.2524192883439059,"spread":0.2490870165237205,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0003594497,0.0001800508,0.0002713659,0.0001717321,0.0003042096,0.0005574381,0.0003466995,0.0003576154,0.001133462],"category_scores_gemma":[0.002284381,0.0002141924,0.0001570998,0.0001960566,0.0004460312,0.0005877404,0.0004670515,0.0003791914,0.0002123141],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003573721,"about_ca_system_score_gemma":0.0001760826,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0004097653,"about_ca_topic_score_gemma":0.000479721,"domain_scores_codex":[0.9995502,0.00006992766,0.00002779767,0.0000460889,0.0002295332,0.00007658364],"domain_scores_gemma":[0.9985501,0.0009037788,0.0001638055,0.0001556118,0.0001740972,0.00005257995],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0002224471,0.00002151261,0.002303093,0.0001892701,0.00001171974,0.0004060224,0.0001415798,0.001560731,0.9790332,0.0005885769,0.00005123583,0.01547064],"study_design_scores_gemma":[0.00001175118,0.0002100505,0.005840563,0.000006770465,0.0000117773,0.0004129438,0.00007405708,0.003014413,0.9894305,0.0001522221,0.0008258321,0.000009031089],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9857078,0.0009329445,0.01163793,0.00008184298,0.000030599,0.00002340011,0.00002488364,0.00007683957,0.001483838],"genre_scores_gemma":[0.995966,0.0002831137,0.003078178,0.00003271761,0.000005881252,0.000008519812,0.0000229488,0.00001850469,0.000584025],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001133462,"threshold_uncertainty_score":0.003791869,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2012451070","doi":"10.1049/mnl.2011.0548","title":"Very high sensitivity ZEP resist using MEK:MIBK developer","year":2011,"lang":"en","type":"article","venue":"Micro & Nano Letters","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":21,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Resist; Methyl isobutyl ketone; Electron-beam lithography; Lithography; Materials science; Xylene; Coating; Layer (electronics); Ketone; Optoelectronics; Analytical Chemistry (journal); Nanotechnology; Chemistry; Organic chemistry; Toluene","authors":[{"name":"Babak Shokouhi","is_ca":true},{"name":"Jian Zhang","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01825656516973821,"gpt":0.2076555983885225,"spread":0.1893990332187843,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002962928,0.000566143,0.0003660509,0.0002936356,0.0002395068,0.0004693985,0.0004888962,0.0004514154,0.002662523],"category_scores_gemma":[0.000407781,0.0004342752,0.0001618992,0.0002055867,0.0002312721,0.0005132058,0.0004649282,0.0005936688,0.002467575],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002959546,"about_ca_system_score_gemma":0.0001924208,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003878043,"about_ca_topic_score_gemma":0.001210195,"domain_scores_codex":[0.9994088,0.00006071139,0.00004507515,0.0001793521,0.0002387472,0.00006728282],"domain_scores_gemma":[0.999662,0.0001383015,0.0000693126,0.00005323542,0.00006042889,0.00001662598],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0000107377,0.000002728506,0.00006994144,0.00004944049,0.00000191342,0.00004590136,0.00001483924,0.00001134686,0.9982999,0.00006507742,0.0000624711,0.001365749],"study_design_scores_gemma":[0.000002077213,0.00001783186,0.0003578211,0.000003384407,0.000003196058,0.0002015127,0.000007772701,0.0001582959,0.9966742,0.00001903694,0.002550749,0.000004176838],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.834416,0.009510381,0.1325506,0.0009093534,0.0003577884,0.0003155188,0.0007086386,0.002540259,0.01869143],"genre_scores_gemma":[0.8933226,0.00348008,0.08689967,0.0001871375,0.00005039812,0.0001439559,0.0004689958,0.0002945695,0.01515261],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.002662523,"threshold_uncertainty_score":0.00890696,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2013595123","doi":"10.1116/1.4831769","title":"Stitching error reduction in electron beam lithography with <i>in-situ</i> feedback using self-developing resist","year":2013,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":20,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"University of Waterloo; Industry Canada","keywords":"Image stitching; Resist; Lithography; Optics; Electron-beam lithography; Computer science; Depth of field; Photomask; Photolithography; Materials science; Nanotechnology; Physics","authors":[{"name":"Ripon Kumar Dey","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009103309741748512,"gpt":0.2272106383982981,"spread":0.2181073286565496,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0003983623,0.0004799419,0.0002726507,0.0002339296,0.0002315228,0.0003221038,0.0007273448,0.0004638086,0.0006785835],"category_scores_gemma":[0.00124843,0.0004187488,0.0001702293,0.0002232548,0.0002906423,0.0005524965,0.0003652737,0.0004391659,0.0002142913],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003542333,"about_ca_system_score_gemma":0.0001567973,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0004409191,"about_ca_topic_score_gemma":0.0009363225,"domain_scores_codex":[0.999531,0.00005068245,0.00004556319,0.0001119472,0.0002183915,0.00004238035],"domain_scores_gemma":[0.9989994,0.0003115183,0.0002846237,0.0002008133,0.0001746613,0.00002888698],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002502728,0.00001748201,0.000179593,0.00003991099,0.000004142074,0.00004817298,0.00006016623,0.0001926467,0.9939149,0.00009199101,0.00006701571,0.005359015],"study_design_scores_gemma":[0.000006308725,0.00006983378,0.0007188172,0.000002306273,0.000005264927,0.00009589993,0.000009112643,0.002194829,0.9963243,0.00001959769,0.0005458716,0.000007962376],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9539868,0.0009207422,0.04228557,0.0001584133,0.0001560992,0.00004061141,0.00005637433,0.0006539334,0.001741301],"genre_scores_gemma":[0.9518015,0.0003966247,0.04564461,0.00006762077,0.00003011421,0.0000200138,0.00004585891,0.0000948626,0.001898883],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0007273448,"threshold_uncertainty_score":0.002570152,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1996722897","doi":"10.1109/tsm.2005.858518","title":"A Novel Approach for the Patterning and High-Volume Production of Sub-40-nm Gates","year":2005,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":20,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Resist; Logic gate; Materials science; Amorphous solid; Layer (electronics); Electronic engineering; Nanotechnology; Optoelectronics; Engineering; Chemistry; Crystallography","authors":[{"name":"Karen Romero","is_ca":false},{"name":"Ralf Stephan","is_ca":false},{"name":"G. Graßhoff","is_ca":false},{"name":"M. Mazur","is_ca":true},{"name":"H. Ruelke","is_ca":true},{"name":"Kien Phan Huy","is_ca":true},{"name":"J. Klais","is_ca":true},{"name":"Sarah McGowan","is_ca":true},{"name":"S. Dakshina-Murthy","is_ca":true},{"name":"Suzanne O. Bell","is_ca":true},{"name":"Matthew Wright","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01657734140735994,"gpt":0.2252234259068178,"spread":0.2086460844994578,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001183214,0.0003486666,0.0003162617,0.0003197323,0.0003860492,0.0004283826,0.0006844361,0.0004253486,0.001562259],"category_scores_gemma":[0.00012487,0.0003142518,0.0002882981,0.0002140289,0.000293306,0.0004518347,0.0006328697,0.000699064,0.0007950788],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000283368,"about_ca_system_score_gemma":0.000378388,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002635359,"about_ca_topic_score_gemma":0.0007274335,"domain_scores_codex":[0.9997815,0.000007665702,0.000008479981,0.0000394438,0.0001401889,0.00002276872],"domain_scores_gemma":[0.9998997,0.0000141384,0.00002710154,0.00002371398,0.00001565268,0.00001969757],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001119137,0.00001905617,0.00004401713,0.00003836416,0.000004130303,0.00007655739,0.00002409289,0.0001895689,0.9907445,0.001400283,0.0003573758,0.007090775],"study_design_scores_gemma":[0.00002448633,0.000233884,0.0005251887,0.000006812507,0.00001510494,0.0008804781,0.00001691218,0.004030868,0.9519436,0.001055549,0.04124374,0.00002335999],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4454302,0.00464077,0.4880854,0.001048403,0.0009277716,0.0006237222,0.0009580769,0.003518753,0.05476702],"genre_scores_gemma":[0.5336032,0.002326733,0.4445322,0.0002342931,0.0001340316,0.0003416485,0.0006209569,0.0002305397,0.01797641],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.001562259,"threshold_uncertainty_score":0.005226314,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1785877937","doi":"10.1039/c5cc07117h","title":"Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography","year":2015,"lang":"en","type":"article","venue":"Chemical Communications","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":19,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Regional Municipality of Waterloo; National Institute for Nanotechnology; University of Waterloo","funders":"","keywords":"Resist; Electron-beam lithography; Lithography; Materials science; Etching (microfabrication); Polymer; Dry etching; Metal; Nanotechnology; Group 2 organometallic chemistry; Cathode ray; Optoelectronics; Chemistry; Electron; Composite material; Molecule; Organic chemistry; Metallurgy; Layer (electronics); Physics","authors":[{"name":"J. Zhang","is_ca":true},{"name":"Kai Cao","is_ca":true},{"name":"X. S. Wang","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01827965417055284,"gpt":0.2754747801077824,"spread":0.2571951259372296,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000289689,0.0004085476,0.0001810274,0.0003018818,0.0001560343,0.0002467557,0.0002893856,0.0003060134,0.0008208487],"category_scores_gemma":[0.0003289369,0.0002369077,0.0001137493,0.0001725025,0.0002382022,0.0003758837,0.0002399194,0.0003951764,0.0005610992],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001551008,"about_ca_system_score_gemma":0.0001048419,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0001303038,"about_ca_topic_score_gemma":0.0003504576,"domain_scores_codex":[0.9997603,0.00004307278,0.00001146956,0.00004085776,0.0001191964,0.00002517901],"domain_scores_gemma":[0.9998776,0.0000428068,0.00003617167,0.00001269617,0.00001571361,0.00001509416],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0000221363,0.000006097029,0.00006013571,0.00009007943,0.000002188027,0.00007783007,0.0000135143,0.00009880929,0.9946108,0.0004539448,0.0001576293,0.004406774],"study_design_scores_gemma":[0.00000657801,0.0000739473,0.0003366083,0.000005734045,0.000004289574,0.000351592,0.000007070425,0.0005881349,0.9943594,0.00007125393,0.004190405,0.000005037358],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8581527,0.0263971,0.09250388,0.0005798482,0.0003746405,0.000153516,0.0005249077,0.0008647096,0.02044866],"genre_scores_gemma":[0.9267026,0.007023895,0.05986965,0.0001226794,0.0000859625,0.00006158926,0.000217847,0.00007760675,0.00583819],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0008208487,"threshold_uncertainty_score":0.002745986,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2115366588","doi":"10.1186/1556-276x-8-139","title":"SML resist processing for high-aspect-ratio and high-sensitivity electron beam lithography","year":2013,"lang":"en","type":"article","venue":"Nanoscale Research Letters","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":19,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"National Institute for Nanotechnology; University of Alberta","funders":"Alberta Innovates; Natural Sciences and Engineering Research Council of Canada; University of Manchester; University of Alberta","keywords":"Resist; Materials science; Methyl isobutyl ketone; Electron-beam lithography; Lithography; Xylene; Nanolithography; Isopropyl alcohol; Nanotechnology; Optoelectronics; Toluene; Ketone; Fabrication; Organic chemistry; Chemistry","authors":[{"name":"Mohammad Mohammad","is_ca":true},{"name":"S. K. Dew","is_ca":true},{"name":"Maria Stepanova","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01409903777090454,"gpt":0.2883530831968311,"spread":0.2742540454259266,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002259732,0.0003287958,0.0001819229,0.0002004002,0.0001712096,0.0002060153,0.0002455967,0.0002434992,0.001237329],"category_scores_gemma":[0.0003413185,0.0002209676,0.0001627455,0.0001642663,0.0001702189,0.0002295069,0.0002237412,0.0003111837,0.0006210181],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002484581,"about_ca_system_score_gemma":0.0001735858,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003147292,"about_ca_topic_score_gemma":0.0009053236,"domain_scores_codex":[0.9998372,0.00001789661,0.00001124229,0.00002340841,0.00008392031,0.00002636282],"domain_scores_gemma":[0.9998621,0.00004647936,0.00002919267,0.00002300943,0.00003093115,0.000008266548],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000006048413,0.000002811548,0.00005663686,0.00002450467,8.08801e-7,0.00002839576,0.00001047186,0.00004880489,0.9984239,0.00008858756,0.00003794667,0.001271019],"study_design_scores_gemma":[0.000004373537,0.00006291989,0.001121005,0.000003414284,0.000002130545,0.0002108864,0.000009755549,0.001277445,0.9950083,0.00004914312,0.002246714,0.000003881407],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"methods","genre_scores_codex":[0.8781785,0.00105295,0.1125092,0.0002498502,0.00007684748,0.0001669861,0.0004897731,0.00054273,0.006733186],"genre_scores_gemma":[0.9085441,0.0006933389,0.0871956,0.00006245004,0.00001894821,0.0001402242,0.0003187892,0.00008108539,0.002945472],"genre_candidate":"methods","genre_consensus":null,"teacher_disagreement_score":0.001237329,"threshold_uncertainty_score":0.004139304,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1991238650","doi":"10.1016/j.mee.2008.01.008","title":"High resolution electron beam lithography of PMGI using solvent developers","year":2008,"lang":"en","type":"article","venue":"Microelectronic Engineering","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":19,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"National Research Council Canada","funders":"","keywords":"Methyl isobutyl ketone; Lithography; Solvent; Resist; Electron-beam lithography; Materials science; Ketone; Chemistry; Nanotechnology; Analytical Chemistry (journal); Chemical engineering; Optoelectronics; Layer (electronics); Organic chemistry","authors":[{"name":"Bo Cui","is_ca":true},{"name":"Teodor Veres","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.00735701065265801,"gpt":0.2055466768206544,"spread":0.1981896661679964,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002410689,0.0002765637,0.0002371672,0.0002722662,0.0002712715,0.0003820915,0.0003712893,0.0004107082,0.001663139],"category_scores_gemma":[0.0003779242,0.0003491283,0.0001576855,0.0002639171,0.0002829741,0.0004161435,0.0003544083,0.0006144919,0.0007035657],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002230071,"about_ca_system_score_gemma":0.0002363275,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.000429822,"about_ca_topic_score_gemma":0.001246076,"domain_scores_codex":[0.9998773,0.00001526967,0.000008072898,0.00002957684,0.00004077725,0.00002898348],"domain_scores_gemma":[0.9998277,0.0000548004,0.00002354876,0.00006383159,0.00002216868,0.000007866218],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00004617663,0.000007683404,0.0001989153,0.0000740672,0.000003539707,0.0001413953,0.00005241503,0.0002456888,0.9924975,0.0006099049,0.0002091313,0.005913541],"study_design_scores_gemma":[0.000009084092,0.000053121,0.001220769,0.000008660384,0.000003587461,0.0002301392,0.00002238322,0.001007409,0.9942518,0.0001194534,0.00306931,0.00000417639],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8886833,0.003352137,0.0910005,0.000411004,0.0001926703,0.0001237351,0.0005226497,0.001176206,0.01453773],"genre_scores_gemma":[0.9130081,0.001613179,0.07665683,0.0001086741,0.00001714189,0.0000690225,0.0003510768,0.0002152581,0.007960831],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001663139,"threshold_uncertainty_score":0.005563796,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2005351648","doi":"10.1116/1.4754809","title":"Tilted nanostructure fabrication by electron beam lithography","year":2012,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":19,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Resist; Electron-beam lithography; Lithography; Scanning electron microscope; Materials science; Optics; Substrate (aquarium); Nanostructure; Nanolithography; Fabrication; X-ray lithography; Stencil lithography; Resolution (logic); Electron beam-induced deposition; Optoelectronics; Nanotechnology; Scanning transmission electron microscopy; Physics; Layer (electronics); Computer science","authors":[{"name":"Jian Zhang","is_ca":true},{"name":"Babak Shokouhi","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.00568440787935997,"gpt":0.2179870884313413,"spread":0.2123026805519813,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001321497,0.0003253,0.0004042244,0.0002692003,0.0001888295,0.0003468799,0.0004511814,0.0003739705,0.001953719],"category_scores_gemma":[0.0002641729,0.0004057093,0.0002406729,0.0001919293,0.0002661719,0.0003452933,0.000438267,0.0006529251,0.001163282],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002515818,"about_ca_system_score_gemma":0.0002221696,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.000380974,"about_ca_topic_score_gemma":0.0009376075,"domain_scores_codex":[0.9997661,0.000009563175,0.00002297355,0.00006346044,0.0001081283,0.00002981184],"domain_scores_gemma":[0.9998612,0.00001823911,0.00002308842,0.00005060569,0.0000354211,0.00001131927],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0000143544,0.000006145348,0.0001108494,0.000062584,0.000005273592,0.00007958343,0.00001933062,0.0002265802,0.9939291,0.0005645921,0.0001775556,0.00480404],"study_design_scores_gemma":[0.00001101556,0.00007026159,0.00108553,0.000008443779,0.000008426789,0.000379399,0.00001300707,0.002179734,0.9896576,0.0002829286,0.006289853,0.0000138858],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.6104957,0.004947666,0.3546006,0.000404208,0.0009276887,0.0004938024,0.002013735,0.002832344,0.02328416],"genre_scores_gemma":[0.7073772,0.003211102,0.2773517,0.0002498122,0.00004431738,0.0002581952,0.001174012,0.0001803479,0.01015315],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001953719,"threshold_uncertainty_score":0.006535828,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1973792046","doi":"10.1021/jp072570s","title":"Chemically Selective Soft X-ray Direct-Write Patterning of Multilayer Polymer Films","year":2007,"lang":"en","type":"article","venue":"The Journal of Physical Chemistry C","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":19,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"McMaster University; Brockhouse Institute for Materials Research","funders":"","keywords":"Polyacrylonitrile; Materials science; Polymer; Propylene carbonate; Layer (electronics); Methyl methacrylate; Bilayer; Absorption (acoustics); Chemical engineering; Nanotechnology; Composite material; Electrode; Polymerization; Membrane; Chemistry; Electrolyte","authors":[{"name":"Jian Wang","is_ca":true},{"name":"Harald D. H. Stöver","is_ca":true},{"name":"Adam P. Hitchcock","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.004665792903000851,"gpt":0.2388391209991479,"spread":0.2341733280961471,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000108295,0.0003250207,0.0002372224,0.0001571054,0.0001755692,0.0003243725,0.0003299101,0.0001945269,0.001858486],"category_scores_gemma":[0.0002332804,0.0002626682,0.0001851834,0.0001619568,0.0002157156,0.0003007149,0.00029527,0.0004767953,0.0004041754],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002600032,"about_ca_system_score_gemma":0.0001784666,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003811791,"about_ca_topic_score_gemma":0.0007771716,"domain_scores_codex":[0.9998857,0.000007366547,0.000009259143,0.00002964712,0.00004794205,0.00002008076],"domain_scores_gemma":[0.9998339,0.00005580697,0.00004018024,0.00003694086,0.0000201328,0.00001297927],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000008728292,0.000004435128,0.00004810635,0.00003040532,0.000002122926,0.0000211111,0.000008740355,0.0001128434,0.9987881,0.00006035902,0.00001988706,0.0008953226],"study_design_scores_gemma":[0.000003193672,0.00002514213,0.0004236708,0.000001884035,0.000002116407,0.00003944575,0.000005975323,0.001191919,0.9979895,0.00001666866,0.0002985057,0.000002002733],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9770371,0.0004555634,0.01764858,0.00005616647,0.0000305398,0.00004629893,0.000311661,0.0002811622,0.004133028],"genre_scores_gemma":[0.9639092,0.0007593186,0.03067989,0.0000424358,0.000009291572,0.00006914073,0.0002346427,0.00007830869,0.004217616],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001858486,"threshold_uncertainty_score":0.006217182,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2045911217","doi":"10.1116/1.1645885","title":"Progress toward a raster multibeam lithography tool","year":2004,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":18,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Simon Fraser University","funders":"","keywords":"Photocathode; Optics; Electron-beam lithography; Full width at half maximum; Lithography; Cathode ray; Materials science; Laser; Beam (structure); Raster graphics; Raster scan; Extreme ultraviolet lithography; Resist; Optoelectronics; Physics; Electron; Computer science; Nanotechnology","authors":[{"name":"S. T. Coyle","is_ca":false},{"name":"Bassam Shamoun","is_ca":false},{"name":"Mingzhu Yu","is_ca":false},{"name":"José R. Maldonado","is_ca":false},{"name":"Timothy A. Thomas","is_ca":false},{"name":"Douglas E. Holmgren","is_ca":false},{"name":"X. Chen","is_ca":false},{"name":"M. R. Scheinfein","is_ca":true},{"name":"B. DeVore","is_ca":false},{"name":"Mark Gesley","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009752019396985561,"gpt":0.2294957615403976,"spread":0.219743742143412,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.001288309,0.0004249997,0.0003319296,0.0007545084,0.0001906295,0.0009325058,0.001451997,0.000473789,0.006733968],"category_scores_gemma":[0.00118269,0.0003867286,0.0004082797,0.0004992423,0.000395881,0.0009674983,0.0005229785,0.0006435261,0.001580115],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0005343668,"about_ca_system_score_gemma":0.0008359262,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0009770078,"about_ca_topic_score_gemma":0.001185558,"domain_scores_codex":[0.9991697,0.00007383394,0.00004353715,0.0001002057,0.0005595895,0.00005310321],"domain_scores_gemma":[0.9985602,0.0003403405,0.0002056684,0.0004472844,0.0003645103,0.00008195121],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001260084,0.00007746097,0.001583534,0.0003929586,0.00003529303,0.0001181655,0.00009853183,0.002904371,0.8348528,0.00564311,0.002671484,0.1514962],"study_design_scores_gemma":[0.00009345952,0.0008698498,0.006153913,0.00008463559,0.00007925455,0.002809463,0.00008426423,0.04703936,0.8630399,0.001503275,0.07816855,0.00007407774],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.09265441,0.002662481,0.88752,0.0006983733,0.0001608308,0.0002546887,0.0005528836,0.007543709,0.007952654],"genre_scores_gemma":[0.09421705,0.00116568,0.8990782,0.00008142037,0.00004256708,0.000103411,0.0004773904,0.0002427886,0.004591466],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.006733968,"threshold_uncertainty_score":0.02252734,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2086890161","doi":"10.1116/1.3268131","title":"Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate","year":2010,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":18,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Applied Nanotools (Canada); National Institute for Nanotechnology; University of Alberta","funders":"","keywords":"Nanolithography; Resist; Dissolution; Electron-beam lithography; Lithography; Materials science; Cathode ray; Nanotechnology; Kinetics; Nanostructure; Diffusion; Kinetic energy; Electron; Chemical engineering; Chemical physics; Optoelectronics; Chemistry; Fabrication; Thermodynamics; Physical chemistry; Physics","authors":[{"name":"Mohammad Mohammad","is_ca":true},{"name":"Taras Fito","is_ca":true},{"name":"Jiawei Chen","is_ca":true},{"name":"Mirwais Aktary","is_ca":true},{"name":"Maria Stepanova","is_ca":true},{"name":"S. K. Dew","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.006208226722484741,"gpt":0.2328754827838092,"spread":0.2266672560613245,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004259581,0.0002875392,0.0002913781,0.0002069165,0.0001710397,0.0003342094,0.0002221506,0.0002630253,0.0007317021],"category_scores_gemma":[0.001236135,0.000300433,0.0001660106,0.0001545187,0.0003632506,0.0004762221,0.0002704663,0.000377065,0.0001869716],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002341881,"about_ca_system_score_gemma":0.0001359663,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0001513774,"about_ca_topic_score_gemma":0.0002932459,"domain_scores_codex":[0.9996578,0.00005483923,0.00003966856,0.00009952856,0.0001018694,0.00004634046],"domain_scores_gemma":[0.9988869,0.0005997594,0.0002830555,0.0001073007,0.00009152236,0.00003140194],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00007129862,0.00001420777,0.0003731926,0.00004302915,0.000003523519,0.00002522492,0.00003234027,0.0001378358,0.9977301,0.00003724836,0.000006379752,0.001525714],"study_design_scores_gemma":[0.000002935727,0.00006544028,0.001532348,0.000001874171,0.000003649263,0.00003074768,0.000008562974,0.000306717,0.9978759,0.00001460936,0.0001549169,0.000002143117],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9902029,0.001059093,0.00788847,0.00004297753,0.000007800165,0.00004536566,0.0001087555,0.00005665762,0.00058802],"genre_scores_gemma":[0.9928135,0.0005353485,0.006142664,0.00001862369,0.000005086184,0.00004613533,0.00006835705,0.00003560197,0.0003346898],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0007317021,"threshold_uncertainty_score":0.002447784,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2108353309","doi":"10.1117/12.436888","title":"BiIn: a sensitive bimetallic thermal resist","year":2001,"lang":"de","type":"article","venue":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":16,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Simon Fraser University","funders":"","keywords":"Resist; Materials science; Bimetallic strip; Analytical Chemistry (journal); Bismuth; Nanotechnology; Layer (electronics); Metallurgy; Metal; Chemistry","authors":[{"name":"Glenn H. Chapman","is_ca":true},{"name":"Richard Tu","is_ca":true},{"name":"Marinko V. Šarunic","is_ca":true},{"name":"Jagjot Dhaliwal","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.0109658517180491,"gpt":0.2377907305103726,"spread":0.2268248787923235,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001518218,0.0003846907,0.0001874455,0.0002663103,0.0001976946,0.0003032271,0.0003829565,0.0003200681,0.001591229],"category_scores_gemma":[0.0001588336,0.0002282367,0.00008557273,0.0001881984,0.0001262963,0.0002692832,0.0001966034,0.0002000232,0.0004833296],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003166599,"about_ca_system_score_gemma":0.0001148481,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.000396655,"about_ca_topic_score_gemma":0.00104016,"domain_scores_codex":[0.9996841,0.00003507133,0.00001277766,0.00008168689,0.0001454224,0.00004106147],"domain_scores_gemma":[0.9998804,0.00001351606,0.00004055755,0.00001397163,0.00003346801,0.00001801588],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003941429,0.000004343267,0.0001298555,0.00002195186,0.000001409226,0.00001823826,0.000008629713,0.00002131105,0.9987249,0.00002888907,0.00003170157,0.0009694259],"study_design_scores_gemma":[0.000002672064,0.00008906127,0.001603292,0.000001746599,0.000005483837,0.0001777395,0.00001089523,0.0002878777,0.9958196,0.000005619722,0.001993237,0.000002838419],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9821835,0.001940213,0.00994272,0.00007524314,0.00004861515,0.00004934947,0.0002720912,0.000339981,0.005148391],"genre_scores_gemma":[0.9770886,0.0006604244,0.01365732,0.00004261116,0.00001314936,0.00003734821,0.0003267028,0.00005632639,0.008117503],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001591229,"threshold_uncertainty_score":0.005323231,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2555866191","doi":"10.1109/tcad.2016.2626437","title":"Process-Variation-Aware Rule-Based Optical Proximity Correction for Analog Layout Migration","year":2016,"lang":"en","type":"article","venue":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":15,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"Memorial University of Newfoundland","funders":"Natural Sciences and Engineering Research Council of Canada; Memorial University of Newfoundland; Research and Development Corporation of Newfoundland and Labrador; Canada Foundation for Innovation","keywords":"Process (computing); Process variation; Analogue electronics; Computer science; Optical proximity correction; Enhanced Data Rates for GSM Evolution; Transistor; Electronic engineering; Integrated circuit layout; Integrated circuit; Electronic circuit; Electrical engineering; Engineering; Artificial intelligence; Voltage","authors":[{"name":"Xuan Dong","is_ca":true},{"name":"Lihong Zhang","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02252663778367075,"gpt":0.2444068137724041,"spread":0.2218801759887333,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001952971,0.0003387202,0.0002246853,0.0003770217,0.0002585975,0.0004502111,0.001124608,0.0002968034,0.0008504028],"category_scores_gemma":[0.001026662,0.0001530242,0.0002158786,0.0003747686,0.0003178477,0.0005055623,0.0005113985,0.0003920795,0.0002432957],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002814812,"about_ca_system_score_gemma":0.0004977408,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0006258335,"about_ca_topic_score_gemma":0.001356786,"domain_scores_codex":[0.9995881,0.0000366005,0.00002254225,0.00009402732,0.000223229,0.0000355895],"domain_scores_gemma":[0.9992892,0.0001094489,0.0001495625,0.0003114105,0.0001219582,0.00001834848],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.0001295056,0.0001244641,0.002246564,0.0001750646,0.00004641126,0.0003334853,0.0001563647,0.05099418,0.5335103,0.005758453,0.001620343,0.4049049],"study_design_scores_gemma":[0.00003285379,0.000305901,0.002512133,0.00001753031,0.00006241728,0.001025716,0.00005746931,0.4316566,0.5494686,0.002622412,0.01219492,0.00004336518],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.1126819,0.000489457,0.8793746,0.00011358,0.0001342134,0.00009819678,0.00005870048,0.002859742,0.004189667],"genre_scores_gemma":[0.7448301,0.0001627352,0.2526647,0.000103677,0.00003353141,0.00004460461,0.00008446889,0.0001265677,0.001949697],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.001124608,"threshold_uncertainty_score":0.00284493,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2076761776","doi":"10.1116/1.4766318","title":"Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol","year":2012,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":15,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"National Institute for Nanotechnology; University of Alberta","funders":"","keywords":"Methyl isobutyl ketone; Isopropyl alcohol; Resist; Polymer; Solvent; Monomer; Dissolution; Radius of gyration; Materials science; Isopropyl; Polymer chemistry; Solubility; Chemical engineering; Chemistry; Organic chemistry","authors":[{"name":"Mohammad Mohammad","is_ca":true},{"name":"Kolattukudy P. Santo","is_ca":true},{"name":"S. K. Dew","is_ca":true},{"name":"Maria Stepanova","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01546475467408814,"gpt":0.2542164476918637,"spread":0.2387516930177756,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001275209,0.0002850977,0.0002143581,0.0001408269,0.0002294649,0.0002099742,0.0002389546,0.0003394959,0.001193964],"category_scores_gemma":[0.0002697411,0.0001430086,0.0003354467,0.0001513913,0.0001422736,0.0003234084,0.0001699884,0.0003971489,0.0002421506],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002777109,"about_ca_system_score_gemma":0.0001885956,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001636671,"about_ca_topic_score_gemma":0.001120197,"domain_scores_codex":[0.9998655,0.00001389874,0.000003312642,0.00002209514,0.00005449529,0.00004065752],"domain_scores_gemma":[0.9998719,0.00006739646,0.00002457229,0.000006036735,0.00001646703,0.00001367128],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000229696,0.0001736817,0.002103779,0.0001966633,0.00004647567,0.0002567435,0.0001137154,0.01542187,0.9748156,0.0006451908,0.0001852526,0.005811288],"study_design_scores_gemma":[0.00002273466,0.0006699284,0.005581539,0.000009302351,0.00003668161,0.0001172574,0.00006887168,0.1066941,0.8848565,0.0001112696,0.001810375,0.00002132866],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9971456,0.0004164396,0.001219516,0.00003499645,0.000008282719,0.00000971795,0.00003239258,0.00001105815,0.001121936],"genre_scores_gemma":[0.9961472,0.0003749487,0.001755523,0.00001973139,0.000004145719,0.00001169864,0.00005898566,0.000008485015,0.001619239],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001636671,"threshold_uncertainty_score":0.003994226,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1973654887","doi":"10.1137/110830356","title":"A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography","year":2012,"lang":"en","type":"article","venue":"SIAM Journal on Imaging Sciences","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":15,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Toronto Metropolitan University","funders":"","keywords":"Photomask; Inverse; Algorithm; Minification; Inverse problem; Regularization (linguistics); Projection (relational algebra); Lithography; Benchmark (surveying); Computer science; Duality (order theory); Computational complexity theory; Mathematics; Mathematical optimization; Optics; Artificial intelligence; Materials science; Physics; Resist; Mathematical analysis; Discrete mathematics","authors":[{"name":"Siu Kai Choy","is_ca":false},{"name":"Ningning Jia","is_ca":false},{"name":"Chong Sze Tong","is_ca":true},{"name":"Man‐Lai Tang","is_ca":true},{"name":"Edmund Y. Lam","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.0260492085027447,"gpt":0.2866093876952974,"spread":0.2605601791925527,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0008443623,0.0006686039,0.0008615304,0.0004415885,0.0004988548,0.0007109148,0.001017035,0.001190369,0.001824391],"category_scores_gemma":[0.001574665,0.0005575622,0.0006880541,0.00048291,0.001071517,0.0009758617,0.001323803,0.001557612,0.0005304923],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0006874861,"about_ca_system_score_gemma":0.001162727,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001495054,"about_ca_topic_score_gemma":0.001564364,"domain_scores_codex":[0.9996147,0.0001045359,0.00001527422,0.00007779447,0.0001614955,0.00002625592],"domain_scores_gemma":[0.9995793,0.0002593868,0.00003841472,0.00004492061,0.00006203337,0.00001601989],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.00006067569,0.00003690964,0.0001441645,0.0001124628,0.00003070153,0.00005104029,0.00007328174,0.797091,0.0164654,0.07579613,0.001225842,0.1089124],"study_design_scores_gemma":[0.000005650892,0.00001367288,0.00002081594,0.00000266224,0.000001883024,0.00001418162,0.000002414252,0.9922437,0.00156081,0.005406756,0.0007221386,0.000005229332],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","genre_codex":"methods","genre_gemma":"methods","genre_scores_codex":[0.0009790447,0.00002284103,0.9985338,0.00003360678,0.000006640142,0.000009151126,0.00000506794,0.00006208616,0.0003476481],"genre_scores_gemma":[0.05468409,0.00007424207,0.9435947,0.00003688367,0.00001848465,0.0001497122,0.00003933967,0.0001054022,0.001297113],"genre_candidate":"methods","genre_consensus":"methods","teacher_disagreement_score":0.001824391,"threshold_uncertainty_score":0.006103158,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W3172476422","doi":"10.1088/2399-1984/abfd98","title":"Helium ion beam lithography and liftoff","year":2021,"lang":"en","type":"article","venue":"Nano Futures","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":14,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Ottawa","funders":"Natural Sciences and Engineering Research Council of Canada; Deutsche Forschungsgemeinschaft","keywords":"Materials science; Lithography; Electron-beam lithography; Focused ion beam; Microscale chemistry; Ion beam; Ion beam lithography; Resist; Optoelectronics; Substrate (aquarium); Optics; Wafer; Nanotechnology; Beam (structure); Ion; Layer (electronics); Chemistry","authors":[{"name":"Sabaa Rashid","is_ca":true},{"name":"Jaspreet Walia","is_ca":true},{"name":"Howard Northfield","is_ca":true},{"name":"Choloong Hahn","is_ca":true},{"name":"Anthony Olivieri","is_ca":true},{"name":"Antonio Calà Lesina","is_ca":false},{"name":"Fabio Variola","is_ca":true},{"name":"Arnaud Weck","is_ca":true},{"name":"Lora Ramunno","is_ca":true},{"name":"Pierre Berini","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.003763207778381762,"gpt":0.2107719358588783,"spread":0.2070087280804966,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001625503,0.0003575945,0.000213839,0.0003395555,0.0003400946,0.0002430676,0.0003552879,0.00030969,0.003486534],"category_scores_gemma":[0.0001665699,0.0002437838,0.0002229427,0.0001593152,0.0004277701,0.0001943011,0.0006051109,0.0005305565,0.001477018],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002104996,"about_ca_system_score_gemma":0.0002231837,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0005738271,"about_ca_topic_score_gemma":0.0007950845,"domain_scores_codex":[0.9997427,0.00002130723,0.00001474567,0.00004194981,0.0001287352,0.00005055694],"domain_scores_gemma":[0.9998925,0.00002875754,0.0000184448,0.00003414697,0.00001681134,0.000009296634],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003946334,0.00000992261,0.0001412564,0.00005695313,0.000003546545,0.000190432,0.0000648528,0.0001965343,0.986048,0.001355488,0.0003726848,0.01152092],"study_design_scores_gemma":[0.00001234691,0.00006524616,0.0006771177,0.00000758061,0.000002951925,0.0003535574,0.00001385694,0.001074772,0.9862878,0.0001772454,0.01131935,0.000008124343],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.5502646,0.002723394,0.4073987,0.0006971605,0.0005738795,0.0005434268,0.0007375246,0.004206415,0.03285495],"genre_scores_gemma":[0.7458876,0.001384348,0.2257892,0.0002401244,0.00004613378,0.0002907656,0.0005676136,0.0002571394,0.02553708],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.003486534,"threshold_uncertainty_score":0.01166368,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2899985657","doi":"10.1145/3236624","title":"PV-Aware Analog Sizing for Robust Analog Layout Retargeting with Optical Proximity Correction","year":2018,"lang":"en","type":"article","venue":"ACM Transactions on Design Automation of Electronic Systems","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":14,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Memorial University of Newfoundland","funders":"","keywords":"Retargeting; Computer science; Sizing; Distortion (music); Wafer; Optical proximity correction; Electronic engineering; Lithography; Process (computing); Analogue electronics; Electronic circuit; Artificial intelligence; Electrical engineering; Materials science; Engineering; Telecommunications","authors":[{"name":"Xuan Dong","is_ca":true},{"name":"Lihong Zhang","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02188672287728989,"gpt":0.2495763181611718,"spread":0.2276895952838819,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002270763,0.000419285,0.0003647342,0.0003003826,0.0002070852,0.0004531861,0.0008512455,0.0003214559,0.001115912],"category_scores_gemma":[0.0008109745,0.0002127467,0.0003332101,0.0002497921,0.0003612422,0.0005159911,0.0005919035,0.0005000517,0.0002150782],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0004840659,"about_ca_system_score_gemma":0.0005712582,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001702237,"about_ca_topic_score_gemma":0.002736631,"domain_scores_codex":[0.9997656,0.00002540932,0.000009736536,0.00005215473,0.0001224905,0.00002462934],"domain_scores_gemma":[0.9996618,0.0001059005,0.00005249016,0.0001218801,0.00004629683,0.0000117029],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.00006794152,0.00005217819,0.0005278437,0.0001060052,0.00002465548,0.0001211881,0.00009334727,0.5413193,0.1830645,0.00733871,0.001137447,0.2661469],"study_design_scores_gemma":[0.000005980282,0.00002848737,0.0001140206,0.00000213975,0.000007151511,0.00004391653,0.000005179789,0.974332,0.02322636,0.001227839,0.001001216,0.000005632],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","genre_codex":"methods","genre_gemma":"methods","genre_scores_codex":[0.02080928,0.0001062495,0.9762857,0.00003381548,0.00001531714,0.00003103867,0.00001891771,0.001077209,0.001622379],"genre_scores_gemma":[0.6554694,0.00009925089,0.3425164,0.00007140481,0.0000205739,0.0000537554,0.00006337317,0.000222612,0.001483179],"genre_candidate":"methods","genre_consensus":"methods","teacher_disagreement_score":0.001702237,"threshold_uncertainty_score":0.003733099,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2246439441","doi":"10.1109/tcad.2015.2459041","title":"Lithography-Aware Analog Layout Retargeting","year":2015,"lang":"en","type":"article","venue":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":14,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"Memorial University of Newfoundland","funders":"Natural Sciences and Engineering Research Council of Canada; Memorial University of Newfoundland; Research and Development Corporation of Newfoundland and Labrador; Canada Foundation for Innovation","keywords":"Retargeting; Computer science; IC layout editor; Integrated circuit layout; Page layout; Graph; Lithography; Representation (politics); Computer engineering; Integrated circuit; Theoretical computer science; Circuit extraction; Artificial intelligence; Engineering; Electrical engineering","authors":[{"name":"Xuan Dong","is_ca":true},{"name":"Lihong Zhang","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.04198971181543722,"gpt":0.2413779869203095,"spread":0.1993882751048723,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001176454,0.0005484084,0.0003403675,0.000473339,0.0002142519,0.0003118594,0.0007052873,0.0002677441,0.001789778],"category_scores_gemma":[0.000526446,0.0001839052,0.0003762887,0.0003222343,0.0002668783,0.0004590037,0.0005115784,0.0002425215,0.0002830307],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0004088197,"about_ca_system_score_gemma":0.0003487816,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001438908,"about_ca_topic_score_gemma":0.00242003,"domain_scores_codex":[0.9998502,0.00002387088,0.00000765365,0.00003970883,0.00005383297,0.00002477513],"domain_scores_gemma":[0.9996932,0.0001060585,0.00006111304,0.00008878642,0.00004084445,0.00001004272],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"design_other","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001939447,0.00007167979,0.001309047,0.0001620237,0.00005176524,0.0003094163,0.0001807657,0.3993316,0.1903622,0.005394486,0.001657094,0.400976],"study_design_scores_gemma":[0.00003039074,0.0001522836,0.0009018697,0.000007121244,0.00004175122,0.0002276203,0.00004257477,0.9070959,0.08455596,0.003648766,0.003280172,0.00001559998],"study_design_candidate":"bench_or_experimental","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.1051857,0.0001646501,0.8892093,0.00007026312,0.0000248672,0.00005544521,0.00006175924,0.002983126,0.002244789],"genre_scores_gemma":[0.7510118,0.00011808,0.2450332,0.00008070152,0.00001201349,0.00005306575,0.0001749251,0.0002611345,0.003255036],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.001789778,"threshold_uncertainty_score":0.005987406,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2105963575","doi":"10.1117/12.479415","title":"Single step direct-write photomask made from bimetallic Bi/In thermal resist","year":2003,"lang":"en","type":"article","venue":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":13,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Simon Fraser University","funders":"","keywords":"Photomask; Resist; Materials science; Optics; Laser; Optoelectronics; Opacity; Photoresist; Lithography; Wavelength; Layer (electronics); Nanotechnology","authors":[{"name":"Glenn H. Chapman","is_ca":true},{"name":"Richard Tu","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01020284275907439,"gpt":0.2219554178964968,"spread":0.2117525751374225,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00008423917,0.0002364221,0.0003111897,0.0001886271,0.000210011,0.0003070371,0.0006300071,0.0002836085,0.001750621],"category_scores_gemma":[0.0001793812,0.0003146407,0.0001731625,0.0001114547,0.0001695803,0.0003262258,0.0002501278,0.0003671418,0.0006700928],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001981776,"about_ca_system_score_gemma":0.0001618375,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002120042,"about_ca_topic_score_gemma":0.0007444691,"domain_scores_codex":[0.9998285,0.000007116096,0.000009569756,0.00004728316,0.00009146704,0.00001621695],"domain_scores_gemma":[0.9998356,0.00002623904,0.00003933631,0.00004638267,0.00003318599,0.00001926361],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002422738,0.00001375765,0.000112904,0.00005440307,0.000004819667,0.00004709913,0.00001173252,0.00006873953,0.9939814,0.0001159513,0.0001453399,0.005419651],"study_design_scores_gemma":[0.000008240908,0.0001205592,0.001248887,0.000002126374,0.000009239128,0.0004947243,0.000007815823,0.001924658,0.9933494,0.00003707474,0.002786904,0.00001044304],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8642631,0.001470564,0.1215748,0.0001845437,0.0003834884,0.0002384725,0.0008136931,0.002311195,0.008760215],"genre_scores_gemma":[0.8628086,0.0004968104,0.1256752,0.00004591562,0.00004263703,0.0001080756,0.0003428537,0.00009011207,0.01038982],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001750621,"threshold_uncertainty_score":0.005856395,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2010394845","doi":"10.2494/photopolymer.19.525","title":"Evaluation of High and Low Activation Resists for EUV Lithography","year":2006,"lang":"en","type":"article","venue":"Journal of Photopolymer Science and Technology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":12,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Resist; Extreme ultraviolet lithography; Outgassing; Materials science; Lithography; Photoresist; Extreme ultraviolet; Process window; Nanotechnology; Optoelectronics; Optics; Chemistry; Physics","authors":[{"name":"James W. Thackeray","is_ca":false},{"name":"Roger A. Nassar","is_ca":false},{"name":"Kathleen Spear-Alfonso","is_ca":false},{"name":"Tom Wallow","is_ca":true},{"name":"Bruno LaFontaine","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.007298530999874178,"gpt":0.2606867001918637,"spread":0.2533881691919896,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004497512,0.0003423205,0.0002263731,0.0003213412,0.0002029351,0.0004367668,0.0002783649,0.0002803636,0.001834448],"category_scores_gemma":[0.0009597231,0.0001246064,0.0001524207,0.000139336,0.000205604,0.0002924334,0.0002303668,0.0002542701,0.0003879599],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002498561,"about_ca_system_score_gemma":0.00009649286,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003355337,"about_ca_topic_score_gemma":0.0005931253,"domain_scores_codex":[0.9995068,0.0001138718,0.00003867992,0.00006908817,0.0001921451,0.00007929342],"domain_scores_gemma":[0.9994569,0.0002295015,0.00007898606,0.00005325009,0.0001190695,0.00006233212],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001008204,0.00002219525,0.0003310562,0.00005612773,0.000006442718,0.00004032113,0.00002593856,0.0001727312,0.9967784,0.00004989867,0.00003311764,0.002383047],"study_design_scores_gemma":[0.000008389769,0.000561574,0.001484589,0.000004725739,0.0000153875,0.0001236829,0.00001616984,0.0004860359,0.9962534,0.00001246791,0.00102735,0.000006114943],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9953417,0.0009486933,0.002207507,0.00004824894,0.0000153983,0.00001799297,0.00008008448,0.00005762716,0.001282758],"genre_scores_gemma":[0.9927879,0.0003789935,0.004734281,0.00001913687,0.00001178097,0.00001505949,0.0001828738,0.00005313726,0.001816837],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001834448,"threshold_uncertainty_score":0.006136835,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1963663690","doi":"10.1007/s00542-007-0510-2","title":"Microlens array fabrication by backside exposure using Fraunhofer diffraction","year":2008,"lang":"en","type":"article","venue":"Microsystem Technologies","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":12,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Polytechnique Montréal","funders":"","keywords":"Microlens; Photoresist; Materials science; Resist; Optics; Diffraction; Wafer; Fresnel diffraction; Lithography; Optoelectronics; Fabrication; Aperture (computer memory); Nanotechnology; Lens (geology); Layer (electronics)","authors":[{"name":"In‐Hyouk Song","is_ca":true},{"name":"Kyungnam Kang","is_ca":false},{"name":"Yoonyoung Jin","is_ca":false},{"name":"Daniel S. Park","is_ca":false},{"name":"Pratul K. Ajmera","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01242096585084646,"gpt":0.2236079190923068,"spread":0.2111869532414604,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0005719959,0.00094641,0.001021389,0.0007769716,0.001156921,0.001161883,0.0006844851,0.000972592,0.004898656],"category_scores_gemma":[0.0006793105,0.001147876,0.0003329368,0.0005720603,0.0007469556,0.000925761,0.0008057089,0.001468458,0.001746245],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00128136,"about_ca_system_score_gemma":0.0009196526,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001407842,"about_ca_topic_score_gemma":0.004471387,"domain_scores_codex":[0.9991302,0.00005639849,0.00004872213,0.0002234389,0.0003995222,0.0001417869],"domain_scores_gemma":[0.9994716,0.0001776267,0.00008092909,0.0001566261,0.0000839258,0.0000293384],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00006174156,0.00004187495,0.0001747517,0.0001404207,0.0000106134,0.00008420211,0.0001605546,0.0003260498,0.9810411,0.002389173,0.001274745,0.01429467],"study_design_scores_gemma":[0.00001315374,0.00004323015,0.0006701293,0.000008238369,0.000004596227,0.0001286409,0.00002116738,0.001472649,0.9888765,0.0001698181,0.008574359,0.0000174585],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.5860351,0.007086504,0.333447,0.001262983,0.001270131,0.0005985297,0.001964147,0.006719117,0.06161645],"genre_scores_gemma":[0.6194634,0.002414705,0.3467535,0.0002526534,0.000108188,0.0003141009,0.0008743447,0.0006305418,0.02918852],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.004898656,"threshold_uncertainty_score":0.0163877,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1980347354","doi":"10.1117/12.655725","title":"Selection and evaluation of developer-soluble topcoat for 193nm immersion lithography","year":2006,"lang":"en","type":"article","venue":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":12,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Immersion lithography; Selection (genetic algorithm); Lithography; Immersion (mathematics); Computer science; Resist; Materials science; Mathematics; Artificial intelligence; Nanotechnology; Optoelectronics; Geometry","authors":[{"name":"Yayi Wei","is_ca":false},{"name":"Karen Petrillo","is_ca":false},{"name":"Stefan Brandl","is_ca":false},{"name":"Frank Goodwin","is_ca":false},{"name":"Philip Benson","is_ca":false},{"name":"Richard Housley","is_ca":false},{"name":"Uzodinma Okoroanyanwu","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01219018647901677,"gpt":0.2482474998480954,"spread":0.2360573133690786,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004052242,0.0005050729,0.0003539762,0.0002989367,0.0002303993,0.0004428645,0.0004033892,0.000287266,0.0007511313],"category_scores_gemma":[0.0008448158,0.0002137538,0.0001897026,0.0003374215,0.0001514107,0.0002102741,0.0001923309,0.0001905523,0.0002744063],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003543651,"about_ca_system_score_gemma":0.0002633626,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.001467176,"about_ca_topic_score_gemma":0.004025467,"domain_scores_codex":[0.9996239,0.00004503148,0.00003289977,0.00007755436,0.0001723756,0.00004814078],"domain_scores_gemma":[0.9996081,0.00008000005,0.00008724508,0.00003988904,0.0001350817,0.00004967691],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003340866,0.00002183615,0.0001790062,0.0000600664,0.000006018782,0.00004478373,0.00001350768,0.0001483637,0.9976839,0.00002280946,0.00001946713,0.001766769],"study_design_scores_gemma":[0.000006464665,0.0002917454,0.0008748439,0.000002878769,0.00001424401,0.00005421518,0.000008969693,0.0004087532,0.9977407,0.000004337151,0.0005893508,0.000003499192],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9903026,0.001762696,0.005834674,0.00004543653,0.00002889107,0.0001151303,0.0001955024,0.00009619178,0.001618901],"genre_scores_gemma":[0.9725217,0.002255146,0.02255743,0.00002732949,0.00001416819,0.00006460091,0.0005096355,0.00009872045,0.001951225],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001467176,"threshold_uncertainty_score":0.00291723,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2059594213","doi":"10.1116/1.2731330","title":"Nanoscale resist morphologies of dense gratings using electron-beam lithography","year":2007,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":11,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"National Institute for Nanotechnology; Applied Nanotools (Canada); University of Alberta","funders":"","keywords":"Resist; Electron-beam lithography; Materials science; Lithography; Nanoscopic scale; Cathode ray; Nanolithography; Nanotechnology; Nanostructure; Optics; Resolution (logic); Optoelectronics; Electron; Fabrication; Physics","authors":[{"name":"Mohammad Mohammad","is_ca":true},{"name":"S. K. Dew","is_ca":true},{"name":"K. L. Westra","is_ca":true},{"name":"P. Li","is_ca":true},{"name":"Mirwais Aktary","is_ca":true},{"name":"Y. Lauw","is_ca":true},{"name":"Andriy Kovalenko","is_ca":true},{"name":"Maria Stepanova","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01183601016507548,"gpt":0.2479941810426743,"spread":0.2361581708775988,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000207962,0.0001884581,0.0001891699,0.00018716,0.0001247191,0.0002682114,0.0002096723,0.0002073583,0.0003669179],"category_scores_gemma":[0.0006044199,0.0002780031,0.0001294928,0.0001223377,0.0002662173,0.0003027869,0.0001994309,0.0001999978,0.00006768991],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002393799,"about_ca_system_score_gemma":0.000098807,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0005075188,"about_ca_topic_score_gemma":0.001033883,"domain_scores_codex":[0.9998813,0.000009627805,0.000009931047,0.00002870193,0.00005472337,0.00001578741],"domain_scores_gemma":[0.9994753,0.000240466,0.0001271257,0.0000929822,0.00004599929,0.00001810823],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003558222,0.00001869067,0.001558189,0.00006789513,0.000007571384,0.0001023987,0.00006118658,0.002968531,0.9900867,0.0002895589,0.00002463663,0.00477911],"study_design_scores_gemma":[0.00001996502,0.000177473,0.01760534,0.00001388642,0.0000164001,0.0004740391,0.00004507309,0.02793928,0.9520641,0.0003031415,0.001322448,0.00001889625],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9726762,0.0003733092,0.02567361,0.00002504164,0.000007058032,0.00002610791,0.00009672138,0.0001529572,0.0009689947],"genre_scores_gemma":[0.9745566,0.0001780158,0.02475135,0.0000111606,0.000002614595,0.00001040812,0.00008587497,0.00002018204,0.0003837398],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0005075188,"threshold_uncertainty_score":0.001736879,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2914942246","doi":"10.1116/1.5079657","title":"E-beam lithography using dry powder resist of hydrogen silsesquioxane having long shelf life","year":2019,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":11,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Hydrogen silsesquioxane; Resist; Materials science; Lithography; Silsesquioxane; Electron-beam lithography; Shelf life; Nanotechnology; Chemical engineering; Composite material; Optoelectronics; Chemistry; Polymer","authors":[{"name":"Jiashi Shen","is_ca":true},{"name":"Ferhat Aydinoglu","is_ca":true},{"name":"Mohammad Soltani","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009149802665862274,"gpt":0.2253779390788752,"spread":0.2162281364130129,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001534665,0.0004114702,0.0002345814,0.0001986856,0.0001081524,0.0002638255,0.0004060446,0.0004044959,0.00188991],"category_scores_gemma":[0.0001826788,0.0003199262,0.0002135346,0.0001515157,0.0002946356,0.0003219245,0.0002945606,0.0004119977,0.001059079],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001450739,"about_ca_system_score_gemma":0.0001135988,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002039467,"about_ca_topic_score_gemma":0.0004441375,"domain_scores_codex":[0.999843,0.00001500457,0.00001227381,0.00005898234,0.0000447386,0.00002601657],"domain_scores_gemma":[0.9998605,0.0000342192,0.00003999649,0.00003657712,0.00001855739,0.000009963731],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001095042,0.000004205589,0.00003360273,0.0000287135,0.000001542309,0.00004703472,0.000006357983,0.00002524117,0.9985496,0.000105695,0.00005195467,0.001135087],"study_design_scores_gemma":[0.00001082109,0.00007415481,0.0006713076,0.000003661347,0.000002843628,0.000218035,0.000008989464,0.0007980822,0.9964605,0.00003111457,0.001715178,0.000005338922],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8965759,0.001278644,0.09045488,0.0003022325,0.0001524829,0.0001519882,0.0006377589,0.0009027434,0.009543367],"genre_scores_gemma":[0.8661485,0.0009786198,0.1235538,0.0001115792,0.00002928386,0.0001162475,0.0003553137,0.0001279053,0.008578702],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.00188991,"threshold_uncertainty_score":0.006322384,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1418321434","doi":"10.7567/jjap.54.086502","title":"Relationship between information and energy carried by photons in extreme ultraviolet lithography: Consideration from the viewpoint of sensitivity enhancement","year":2015,"lang":"en","type":"article","venue":"Japanese Journal of Applied Physics","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":11,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":false,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"","funders":"National Research Council Canada","keywords":"Resist; Lithography; Photon; Limiting; Extreme ultraviolet; Extreme ultraviolet lithography; Ultraviolet; Sensitivity (control systems); Optics; Energy (signal processing); Materials science; Nanotechnology; Optoelectronics; Physics; Electronic engineering; Engineering","authors":[{"name":"Shinya Fujii","is_ca":false},{"name":"Takahiro Kozawa","is_ca":false},{"name":"Kazumasa Okamoto","is_ca":false},{"name":"Julius Joseph Santillan","is_ca":false},{"name":"Toshiro Itani","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.03483309690889892,"gpt":0.23818378258627,"spread":0.2033506856773711,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000475038,0.0003262404,0.0002147503,0.0004638216,0.0001823917,0.0006485377,0.000430226,0.0004971085,0.0008606784],"category_scores_gemma":[0.002228059,0.0002998141,0.0001736585,0.0003194874,0.0005759101,0.001170433,0.0003555086,0.000602747,0.0001609262],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0004371008,"about_ca_system_score_gemma":0.0001735183,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002994944,"about_ca_topic_score_gemma":0.0001748082,"domain_scores_codex":[0.9996341,0.00007242253,0.00001452526,0.00006814961,0.0001586492,0.0000521092],"domain_scores_gemma":[0.9983512,0.001220454,0.0001842367,0.00004066394,0.0001717963,0.00003157261],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.0002859956,0.00006869662,0.003343708,0.0002098123,0.00002262656,0.00132658,0.0001765367,0.005352814,0.9647111,0.01197419,0.000112548,0.01241525],"study_design_scores_gemma":[0.00002075352,0.0003291947,0.01138937,0.00004380572,0.00006136892,0.001749935,0.0001527282,0.03833568,0.9403808,0.0057619,0.001719804,0.00005476191],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8834532,0.005649901,0.09594289,0.0004132042,0.00006564652,0.00006109622,0.00005981357,0.0001064588,0.01424778],"genre_scores_gemma":[0.9922621,0.001300588,0.005327203,0.00004343702,0.00001531046,0.00001206272,0.00001524975,0.00001581868,0.001008284],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0008606784,"threshold_uncertainty_score":0.003171384,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2494179991","doi":"10.1142/9789812778178_0005","title":"Measurability of dumb hole radiation?","year":2002,"lang":"en","type":"book-chapter","venue":"WORLD SCIENTIFIC eBooks","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":11,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of British Columbia","funders":"","keywords":"Radiation; Physics; Optics","authors":[{"name":"W. G. Unruh","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02176761762824296,"gpt":0.2250438317044968,"spread":0.2032762140762539,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.002654974,0.0008688694,0.0009079899,0.001084944,0.0008880804,0.002934878,0.001854939,0.001995268,0.008465304],"category_scores_gemma":[0.01911916,0.000685203,0.0004542198,0.0007595754,0.005336934,0.006998952,0.002208705,0.002211157,0.001942071],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.001220196,"about_ca_system_score_gemma":0.0003855327,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0005340921,"about_ca_topic_score_gemma":0.0003140389,"domain_scores_codex":[0.9970879,0.0009385098,0.00007759057,0.0006975197,0.001030439,0.0001680354],"domain_scores_gemma":[0.9918557,0.00328687,0.0006071623,0.003331673,0.0006772135,0.0002413117],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"theoretical_or_conceptual","study_design_gemma":"not_applicable","study_design_scores_codex":[0.0006014778,0.0001124448,0.005463487,0.0007178961,0.000135851,0.0003941001,0.0008160412,0.005859868,0.1113157,0.7518449,0.006159585,0.1165785],"study_design_scores_gemma":[0.00004545537,0.0003358553,0.009142211,0.0003817837,0.0001051563,0.001540394,0.0008041106,0.03171641,0.2647535,0.6484023,0.04257943,0.0001933701],"study_design_candidate":"not_applicable","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"other","genre_scores_codex":[0.1407197,0.01908247,0.5892998,0.009705444,0.002519951,0.0001399207,0.0008451997,0.002523594,0.235164],"genre_scores_gemma":[0.9544765,0.003917373,0.02337572,0.0009547395,0.0004273607,0.00009845211,0.0001930191,0.0003429955,0.01621374],"genre_candidate":"other","genre_consensus":null,"teacher_disagreement_score":0.008465304,"threshold_uncertainty_score":0.02831924,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2056928395","doi":"10.1016/j.mee.2013.08.006","title":"Polycarbonate electron beam resist using solvent developer","year":2013,"lang":"en","type":"article","venue":"Microelectronic Engineering","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":10,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"Saudi Arabian Cultural Bureau","keywords":"Resist; Methyl isobutyl ketone; Electron-beam lithography; Polycarbonate; Materials science; Reactive-ion etching; Lithography; Etching (microfabrication); Solvent; Optics; Nanotechnology; Composite material; Optoelectronics; Chemistry; Organic chemistry","authors":[{"name":"Arwa Saud Abbas","is_ca":true},{"name":"Mustafa Yavuz","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.004293690918155246,"gpt":0.1983490796068336,"spread":0.1940553886886784,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002938551,0.0005620294,0.0003424331,0.0004200894,0.0004017887,0.0003658852,0.0005729306,0.0004012304,0.005343793],"category_scores_gemma":[0.0004086531,0.0004562122,0.0001750943,0.0003754782,0.0002055024,0.0004145459,0.0002866594,0.000574197,0.002272666],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002643767,"about_ca_system_score_gemma":0.0004745719,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0005003757,"about_ca_topic_score_gemma":0.001960187,"domain_scores_codex":[0.9996797,0.0000176708,0.00003070572,0.00009775953,0.0001283073,0.00004585517],"domain_scores_gemma":[0.9996825,0.00007645309,0.00006327331,0.0000607732,0.00009205966,0.00002496735],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003331267,0.00001686558,0.0001446264,0.0001357946,0.000003780226,0.0002189221,0.0000427578,0.00004128008,0.9948526,0.000248002,0.0003074932,0.003954509],"study_design_scores_gemma":[0.00001581897,0.00007034673,0.0008185246,0.00000973758,0.000009283337,0.0003086316,0.00002174868,0.0003042332,0.9873421,0.00003736118,0.01105515,0.000007152601],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.8372951,0.006101826,0.1049805,0.000912117,0.0009450846,0.0008554159,0.001620311,0.003066076,0.04422351],"genre_scores_gemma":[0.7506322,0.006370707,0.1470774,0.0004105224,0.0001190878,0.0005244138,0.001904535,0.0007045667,0.09225662],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.005343793,"threshold_uncertainty_score":0.0178768,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2069169611","doi":"10.2494/photopolymer.21.697","title":"A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure","year":2008,"lang":"en","type":"article","venue":"Journal of Photopolymer Science and Technology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":10,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Photoresist; Resist; Materials science; Shrinkage; Nanotechnology; Composite material; Optoelectronics; Layer (electronics)","authors":[{"name":"Masanori Yamaguchi","is_ca":false},{"name":"Thomas I. Wallow","is_ca":true},{"name":"Yohei Yamada","is_ca":false},{"name":"Ryoung-Han Kim","is_ca":true},{"name":"Jongwook Kye","is_ca":true},{"name":"Harry Levinson","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01898966913259423,"gpt":0.275454749074626,"spread":0.2564650799420318,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001384879,0.0002977781,0.0001583023,0.0001213522,0.0002047157,0.0002577977,0.0002851077,0.0002562328,0.001453823],"category_scores_gemma":[0.0002447069,0.0001627974,0.0002077549,0.0001599816,0.0001945583,0.0002217806,0.0002142613,0.0004107123,0.000177335],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003025653,"about_ca_system_score_gemma":0.0001849822,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0007344608,"about_ca_topic_score_gemma":0.0007773674,"domain_scores_codex":[0.999878,0.000008344892,0.000004320627,0.00003187893,0.00004754715,0.00002987959],"domain_scores_gemma":[0.9998515,0.00005179271,0.00003582454,0.00002089289,0.00002807506,0.00001179201],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001707102,0.000006985539,0.00009539385,0.00002912655,0.000001871476,0.00003088322,0.00003401295,0.00005282034,0.997956,0.0000524727,0.00002481544,0.001698578],"study_design_scores_gemma":[0.000003219571,0.0002118637,0.002258182,0.000004189384,0.000005721024,0.0001525059,0.00003122195,0.0005312844,0.995819,0.00002507812,0.0009528059,0.000004989804],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9901496,0.0007412956,0.007074076,0.0000641078,0.00002689605,0.0000464187,0.0001185516,0.00007946838,0.001699641],"genre_scores_gemma":[0.9891121,0.0007528941,0.007027609,0.00004615692,0.00001025013,0.00004120928,0.000211416,0.00006451637,0.002733883],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001453823,"threshold_uncertainty_score":0.004863501,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2096691511","doi":"10.1117/12.601545","title":"Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks","year":2005,"lang":"en","type":"article","venue":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":10,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Simon Fraser University","funders":"","keywords":"Photomask; Resist; Materials science; Photoresist; Lithography; Optics; Laser; Optoelectronics; Grayscale; Photolithography; Nanotechnology; Pixel","authors":[{"name":"Glenn H. Chapman","is_ca":true},{"name":"James M. Dykes","is_ca":true},{"name":"David K. Poon","is_ca":true},{"name":"Chinheng Choo","is_ca":true},{"name":"Jun Wang","is_ca":true},{"name":"Jun Peng","is_ca":true},{"name":"Yuqiang Tu","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.009025869301347524,"gpt":0.2368429548438775,"spread":0.22781708554253,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00009298841,0.0002172812,0.0001372201,0.0002242196,0.0001386796,0.0003621453,0.0002778246,0.0002068193,0.0008889849],"category_scores_gemma":[0.0002447211,0.0003292503,0.0001943532,0.0001284534,0.0002259472,0.0002167829,0.0002885258,0.0003501955,0.0002513509],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003444934,"about_ca_system_score_gemma":0.0002003976,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0006483189,"about_ca_topic_score_gemma":0.001778628,"domain_scores_codex":[0.9998846,0.000006077827,0.000007902705,0.00002601103,0.0000553112,0.00002014352],"domain_scores_gemma":[0.9998234,0.00003742778,0.00004992405,0.00004732695,0.00002208367,0.00001991429],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.000009611732,0.00001024626,0.0001366987,0.00002767563,0.000003702728,0.00006895111,0.00002968966,0.0005641352,0.9960885,0.0002696653,0.00004752667,0.002743723],"study_design_scores_gemma":[0.00001073835,0.00008124425,0.002476908,0.000003249098,0.000007062787,0.0001753061,0.00001795132,0.004213084,0.9908972,0.00009152465,0.00201617,0.000009453993],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9648263,0.000328123,0.02980916,0.00005788788,0.00005429088,0.00006505847,0.000226562,0.0005716912,0.004060954],"genre_scores_gemma":[0.9379076,0.0002801917,0.05932067,0.00004257598,0.00001265609,0.00005800209,0.0001392556,0.00007871278,0.002160381],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0008889849,"threshold_uncertainty_score":0.002973914,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2133161253","doi":"10.1186/1556-276x-9-184","title":"Electron beam lithography with feedback using in situ self-developed resist","year":2014,"lang":"en","type":"article","venue":"Nanoscale Research Letters","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":9,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Resist; Electron-beam lithography; Materials science; Lithography; Optics; Beam (structure); Nitrocellulose; Distortion (music); In situ; Cathode ray; Nanotechnology; Optoelectronics; Electron; Physics; Chemistry","authors":[{"name":"Ripon Kumar Dey","is_ca":true},{"name":"Bo Cui","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02003924764304505,"gpt":0.3020674056165523,"spread":0.2820281579735073,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0002495095,0.0004079762,0.0002101831,0.0001749204,0.000147113,0.0002289542,0.0005296778,0.0003466381,0.001437547],"category_scores_gemma":[0.0005286073,0.0003455784,0.0001622836,0.000150597,0.0003350683,0.0003946839,0.0005179674,0.000473358,0.000406008],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002808422,"about_ca_system_score_gemma":0.0001359269,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003019273,"about_ca_topic_score_gemma":0.000676749,"domain_scores_codex":[0.9997081,0.00003360932,0.00002027771,0.00008949846,0.0001070611,0.00004151357],"domain_scores_gemma":[0.9995334,0.000163779,0.0001179218,0.0001013327,0.00005739551,0.00002610399],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001355495,0.000009096823,0.00008760823,0.00002474729,0.000002229702,0.00003828317,0.00002121796,0.00007794156,0.9987883,0.00005475382,0.00003520752,0.0008469671],"study_design_scores_gemma":[0.000005498113,0.00002842563,0.0004299243,0.000001720899,0.000002165158,0.00006323092,0.000007187611,0.0006018753,0.9982386,0.00001676044,0.0006016801,0.000003091067],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9576606,0.0005450367,0.03711081,0.0001718017,0.0001084568,0.00005822769,0.0001798345,0.0006695447,0.003495671],"genre_scores_gemma":[0.9508268,0.0004493,0.04329259,0.00008481518,0.00002743075,0.00006154931,0.0001422921,0.0001135218,0.005001641],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001437547,"threshold_uncertainty_score":0.004809082,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W3012527148","doi":"10.1109/access.2020.2980039","title":"Learning Localized Spatial Material Properties of Substrates in Ultra-Thin Packages Using Markov Chain Monte Carlo and Finite Element Analysis","year":2020,"lang":"en","type":"article","venue":"IEEE Access","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":9,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"Economic Development Board - Singapore; Advanced Micro Devices","keywords":"Finite element method; Materials science; Monte Carlo method; Substrate (aquarium); Material properties; Stack (abstract data type); Markov chain Monte Carlo; Mechanical engineering; Silicon; Integrated circuit packaging; Electronic packaging; Electronic engineering; Computer science; Composite material; Structural engineering; Optoelectronics; Integrated circuit; Engineering","authors":[{"name":"Cheryl Selvanayagam","is_ca":true},{"name":"Pham Luu Trung Duong","is_ca":false},{"name":"Nagarajan Raghavan","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.02511308416044058,"gpt":0.2642110596264444,"spread":0.2390979754660038,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.000829008,0.0004038873,0.0004287582,0.0004773879,0.0003033789,0.0006216653,0.0006677579,0.0009516109,0.0006275373],"category_scores_gemma":[0.001880068,0.0006181647,0.0005552211,0.0002849661,0.0008476813,0.00047719,0.0003967762,0.0007939958,0.0001033447],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.001082179,"about_ca_system_score_gemma":0.001088275,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.01273728,"about_ca_topic_score_gemma":0.01671844,"domain_scores_codex":[0.9998565,0.00005387075,0.000006073808,0.00002595358,0.00003772804,0.00001979101],"domain_scores_gemma":[0.9982069,0.001465796,0.0001273437,0.00004535557,0.0001103572,0.00004432545],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"simulation_or_modeling","study_design_scores_codex":[0.00001166379,0.0000112028,0.0004824036,0.000006115803,0.00000608686,0.00001060749,0.000008521989,0.9965674,0.0005225393,0.0007388279,0.0000302246,0.001604281],"study_design_scores_gemma":[6.789406e-7,0.000001832287,0.00004347898,6.048917e-7,5.441724e-7,8.886204e-7,8.78395e-7,0.9996301,0.0001177138,0.0001917749,0.00001068569,7.787122e-7],"study_design_candidate":"simulation_or_modeling","study_design_consensus":"simulation_or_modeling","genre_codex":"methods","genre_gemma":"methods","genre_scores_codex":[0.3570237,0.000270194,0.6402639,0.0003014942,0.00002264836,0.00007366468,0.00009192282,0.0003820658,0.001570464],"genre_scores_gemma":[0.9135645,0.0001414381,0.08467443,0.00007937442,0.00001184258,0.0001165666,0.0001673237,0.0000481444,0.001196334],"genre_candidate":"methods","genre_consensus":"methods","teacher_disagreement_score":0.01273728,"threshold_uncertainty_score":0.02532625,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2126169079","doi":"10.1017/s1431927608084225","title":"Microstructural Analysis of Lead-Induced Transgranular SCC of Alloy 690 in PbO + 10% NaOH Solution","year":2008,"lang":"en","type":"article","venue":"Microscopy and Microanalysis","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":9,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Fibics (Canada)","funders":"","keywords":"Materials science; Alloy; Transgranular fracture; Metallurgy; Lead (geology); Geology; Intergranular corrosion","authors":[{"name":"M.G. Burke","is_ca":false},{"name":"R.E. Hermer","is_ca":false},{"name":"MW Phaneuf","is_ca":true}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01184816947557835,"gpt":0.2586093313768001,"spread":0.2467611619012217,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0000808186,0.0001206953,0.000169773,0.0002102168,0.0002773722,0.0002224231,0.0001952451,0.0002081979,0.002302774],"category_scores_gemma":[0.000131075,0.0001501677,0.00009954721,0.0002289705,0.0002356671,0.0001367157,0.000104076,0.0002414054,0.0002168722],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003936198,"about_ca_system_score_gemma":0.0003135824,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.006402881,"about_ca_topic_score_gemma":0.01195033,"domain_scores_codex":[0.9998982,0.000003846172,0.00000430683,0.00001738411,0.00005500895,0.00002133129],"domain_scores_gemma":[0.9998838,0.00001671571,0.00001747061,0.000008293053,0.00005984538,0.00001382487],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001692269,0.000006002769,0.0004614787,0.00003109725,0.000003989671,0.00006490724,0.00005189688,0.0001727644,0.9978805,0.00006387164,0.00007476858,0.001019505],"study_design_scores_gemma":[0.000005714166,0.00009037779,0.01129326,0.000002848631,0.000008884505,0.00004443228,0.00009490345,0.0009794912,0.9864711,0.00001750806,0.0009886597,0.00000274613],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9960561,0.0003361078,0.000757509,0.00003405744,0.00001959458,0.00001271161,0.0002952305,0.00006604033,0.002422588],"genre_scores_gemma":[0.9972573,0.00009122268,0.0005600412,0.00001386321,0.000002568299,0.000006169978,0.0001487585,0.00001199755,0.001908071],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.006402881,"threshold_uncertainty_score":0.01273119,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1963575407","doi":"10.1139/v05-090","title":"Use of fluorescent probes to determine catalytic chain length in chemically amplified resists","year":2005,"lang":"en","type":"article","venue":"Canadian Journal of Chemistry","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":9,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":false,"ca_fund":true,"ca_venue":true,"about_ca":false},"ca_institutions":"","funders":"Natural Sciences and Engineering Research Council of Canada","keywords":"Chemistry; Protonation; Catalysis; Fluorescence; Polymer; Titration; Trifluoromethanesulfonate; Coumarin; Photoresist; Photochemistry; Molecule; Polymer chemistry; Organic chemistry","authors":[{"name":"Mathieu Frenette","is_ca":false},{"name":"Marius G. Ivan","is_ca":false},{"name":"J. C. Scaiano","is_ca":false}],"retraction":null,"screen_n_in":null,"score":{"opus":0.01563686901731213,"gpt":0.2204072848977262,"spread":0.2047704158804141,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0003866566,0.0005370578,0.0001553326,0.0004577021,0.0001532796,0.0003008945,0.000404404,0.0005545605,0.0008155886],"category_scores_gemma":[0.0008614562,0.0002440568,0.0001642749,0.0002838441,0.0003917603,0.0004874074,0.0002184392,0.0005922838,0.0003104847],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0004820029,"about_ca_system_score_gemma":0.0001602198,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003339413,"about_ca_topic_score_gemma":0.0006519116,"domain_scores_codex":[0.9995962,0.00006338676,0.00002591962,0.0001176599,0.0001595045,0.00003720921],"domain_scores_gemma":[0.999268,0.0003066175,0.0002467557,0.00005877351,0.00009009072,0.00002986922],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001279286,0.000005479451,0.00007850834,0.00002012995,0.000001477903,0.000007572033,0.0000151527,0.00005057267,0.9986364,0.00003748173,0.000005926671,0.001128541],"study_design_scores_gemma":[0.000001528632,0.00003467384,0.000306165,0.000002223251,0.000003354493,0.00001548814,0.000004751415,0.0003230245,0.9990854,0.00001481878,0.0002064083,0.000002084603],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9265547,0.003883227,0.06665228,0.0001261669,0.00004492141,0.00009646024,0.000253399,0.0003552449,0.002033527],"genre_scores_gemma":[0.9086531,0.002361092,0.08533504,0.00009341855,0.00001764339,0.0001961386,0.0003217905,0.00005399571,0.002967739],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.0008155886,"threshold_uncertainty_score":0.003497243,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null}]}