{"meta":{"page":1,"per_page":50,"max_per_page":100,"total":14,"total_is_capped":false,"direct_labels_cover":0,"predictions_cover":14,"direct_label_status":"direct model label, unvalidated","prediction_status":"machine_predicted_unvalidated (Codex and Gemma teacher distillation)","score_status":"score_only:v0-immature-baseline (scores rank; they never assert a category)","snapshot":{"source":"OpenAlex, pinned release, all 482 partitions","release":"2026-06-24","frame_built":"2026-07-12"},"query_hash":"af92f15ec891","filters":{"venue":"IEEE Transactions on Semiconductor Manufacturing"}},"results":[{"id":"W2131433807","doi":"10.1109/tsm.2002.801379","title":"Optimal scheduling techniques for cluster tools with process-module and transport-module residency constraints","year":2002,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Scheduling and Optimization Algorithms","field":"Engineering","cited_by":59,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of British Columbia","funders":"","keywords":"Correctness; Heuristics; Computer science; Scheduling (production processes); Process (computing); Turnaround time; Mathematical optimization; Linear programming; Benchmark (surveying); Distributed computing; Algorithm; Mathematics; Programming language","retraction":null,"screen_n_in":null,"score":{"opus":0.02315621893148915,"gpt":0.2367710621200897,"spread":0.2136148431886005,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001159404,0.0003587225,0.000302898,0.0002324922,0.0002351915,0.00009942165,0.000143784,0.0001890313,0.0002339294],"category_scores_gemma":[0.000005200535,0.0003430385,0.00008655537,0.0001167724,0.0001212178,0.0005856027,7.467328e-7,0.0003958541,0.000008711151],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00006734136,"about_ca_system_score_gemma":0.00001873788,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.000003654924,"about_ca_topic_score_gemma":0.00001008534,"domain_scores_codex":[0.9985815,0.0000131904,0.0003529652,0.0004381253,0.0002023526,0.0004118474],"domain_scores_gemma":[0.9993487,0.0001245714,0.00005241417,0.0002541815,0.00006537479,0.0001547791],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00006607623,0.00006809641,0.00001588501,0.0002716106,0.0001207516,0.000005527724,0.0008501919,0.9616795,0.003397389,0.000007572932,0.00001882047,0.03349864],"study_design_scores_gemma":[0.001122597,0.0001364021,0.000031805,0.0002655197,0.00008776726,0.00007947045,0.0003263534,0.1937532,0.8034979,0.00004143137,0.00007989991,0.000577725],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.460635,0.00006730303,0.5378302,0.00004915015,0.0001923183,0.0004178486,0.00005800063,0.0005872471,0.0001629357],"genre_scores_gemma":[0.7969549,0.00009129785,0.2024311,0.0000602105,0.00007965191,0.0001644574,0.000006718755,0.00008688098,0.0001248033],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.8001004,"threshold_uncertainty_score":0.9999022,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2102704639","doi":"10.1109/tsm.2007.914388","title":"A Multiagent-Based Decision-Making System for Semiconductor Wafer Fabrication With Hard Temporal Constraints","year":2008,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Scheduling and Optimization Algorithms","field":"Engineering","cited_by":50,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"National Research Council Canada","funders":"","keywords":"Workcell; Wafer fabrication; Job shop scheduling; Computer science; Scheduling (production processes); Semiconductor device fabrication; Schedule; Distributed computing; Mathematical optimization; Engineering; Artificial intelligence; Wafer; Robot; Mathematics","retraction":null,"screen_n_in":null,"score":{"opus":0.02399545512018482,"gpt":0.2331846611622516,"spread":0.2091892060420668,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001350216,0.0004385175,0.0003867243,0.0003883522,0.0004249305,0.0000732815,0.0002321386,0.0002036396,0.0001518999],"category_scores_gemma":[0.00001262594,0.0004119739,0.0001845314,0.0001998511,0.0001206181,0.0003236465,0.000001177098,0.0003681052,0.00004871245],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003864429,"about_ca_system_score_gemma":0.00009317641,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00001073407,"about_ca_topic_score_gemma":0.000007680053,"domain_scores_codex":[0.9981292,0.00003297005,0.0005028048,0.000523107,0.000344861,0.0004670837],"domain_scores_gemma":[0.9987566,0.0003398168,0.0001101446,0.0004635242,0.0001516177,0.0001782687],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001386359,0.00007557605,0.00004617607,0.0001860526,0.0001524989,0.00001888744,0.0004315145,0.9734082,0.01477483,0.000002632305,0.0001158317,0.01064914],"study_design_scores_gemma":[0.001989833,0.00008404263,0.0001054,0.0004639048,0.00008742011,0.000127099,0.0005174509,0.2822178,0.7135956,0.000004214505,0.0001640139,0.0006431881],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4426768,0.00002577733,0.5550335,0.000009218968,0.0009863235,0.0004285317,0.00009681585,0.0007027079,0.00004025317],"genre_scores_gemma":[0.8558664,0.000009177699,0.1435509,0.00005843255,0.0001250178,0.0001840049,0.00002373133,0.0001193201,0.00006297778],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.6988208,"threshold_uncertainty_score":0.9998332,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1983334556","doi":"10.1109/tsm.2012.2192143","title":"NBTI and Process Variations Compensation Circuits Using Adaptive Body Bias","year":2012,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Semiconductor materials and devices","field":"Engineering","cited_by":48,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Negative-bias temperature instability; CMOS; Transistor; Reliability (semiconductor); Static random-access memory; Microprocessor; Electronic engineering; Circuit reliability; Threshold voltage; Process (computing); Process corners; Chip; Computer science; Electronic circuit; Engineering; Voltage; Electrical engineering; Embedded system; Power (physics)","retraction":null,"screen_n_in":null,"score":{"opus":0.06086920214315679,"gpt":0.2602360185162453,"spread":0.1993668163730886,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001769671,0.000326475,0.0002912205,0.000250088,0.0002657855,0.0001059126,0.0001129835,0.0001562129,0.0002414184],"category_scores_gemma":[0.000004077351,0.0003342937,0.00006592939,0.0001241876,0.00004939964,0.001068027,0.000001793456,0.0002677148,0.00003699861],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000144884,"about_ca_system_score_gemma":0.00002053589,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00006263748,"about_ca_topic_score_gemma":0.000008811749,"domain_scores_codex":[0.998659,0.0000523932,0.0003524587,0.0002681579,0.0002125709,0.0004553876],"domain_scores_gemma":[0.9993339,0.000119802,0.00008097923,0.0002320913,0.00004159566,0.0001916609],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001269649,0.00008061335,0.0001025497,0.0001556718,0.0001526883,0.000001483719,0.002164797,0.03782518,0.9576496,0.00005427787,0.00001296194,0.001787434],"study_design_scores_gemma":[0.0003586027,0.00002589681,0.0009447919,0.00007600732,0.0001013847,0.00005421251,0.0004604608,0.009874132,0.9874637,0.0001033268,0.0001140828,0.0004234129],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9638642,0.0001889689,0.03277879,0.000006882079,0.002064247,0.0002908809,0.00006550321,0.0004211136,0.0003194057],"genre_scores_gemma":[0.999097,0.00004319427,0.000408914,0.00004938569,0.0002616308,0.00003291924,0.000006997634,0.00007549627,0.00002448802],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.03523277,"threshold_uncertainty_score":0.9999109,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2109495827","doi":"10.1109/tsm.2007.907613","title":"A Fab-Wide APC Sampling Application","year":2007,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Integrated Circuits and Semiconductor Failure Analysis","field":"Engineering","cited_by":32,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Metrology; Reliability engineering; Sampling (signal processing); Event (particle physics); Process (computing); Computer science; Process variation; Duration (music); Fault detection and isolation; Engineering; Semiconductor device fabrication; Microprocessor; Manufacturing engineering; Real-time computing; Embedded system; Wafer; Artificial intelligence; Operating system; Detector; Mathematics; Telecommunications","retraction":null,"screen_n_in":null,"score":{"opus":0.01603917981644576,"gpt":0.2311549802360548,"spread":0.215115800419609,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0002810675,0.0004047376,0.0003391227,0.0005314191,0.000230681,0.00008671697,0.0002874233,0.0002545431,0.0003074849],"category_scores_gemma":[0.000004297566,0.0004051582,0.0002498025,0.0003127895,0.00004612669,0.0003470327,0.000001083697,0.000751075,0.0002418025],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003274467,"about_ca_system_score_gemma":0.00001861461,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0001112575,"about_ca_topic_score_gemma":0.0002050749,"domain_scores_codex":[0.9980731,0.00001820653,0.0005359097,0.0004480342,0.0002976431,0.000627125],"domain_scores_gemma":[0.998952,0.0001925852,0.00006563096,0.000524762,0.00005903917,0.000205934],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001735682,0.0000550842,0.00002017472,0.00005459404,0.0002662258,0.000008495263,0.0005262332,0.08626559,0.8701355,0.00005116149,0.0001925126,0.042407],"study_design_scores_gemma":[0.0002618635,0.00002284069,0.00009940781,0.00003821755,0.0001012703,0.00002048226,0.0004260114,0.002645598,0.9887403,0.0001650688,0.006995185,0.0004837112],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.5003232,0.00005630274,0.4965378,0.00001640364,0.0006138117,0.0001621088,0.00001791723,0.0005798231,0.001692642],"genre_scores_gemma":[0.9984398,0.00005693641,0.0006912908,0.0001782117,0.0001708036,0.00003591854,0.00001637488,0.0001010909,0.0003095249],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.4981167,"threshold_uncertainty_score":0.99984,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2119459533","doi":"10.1109/tsm.2003.822725","title":"An Optimal Residency-Aware Scheduling Technique for Cluster Tools With Buffer Module","year":2004,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Scheduling and Optimization Algorithms","field":"Engineering","cited_by":22,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of British Columbia","funders":"","keywords":"Scheduling (production processes); Semiconductor device fabrication; Computer science; Time constraint; Distributed computing; Resource constraints; Job shop scheduling; Cluster (spacecraft); Throughput; Resource (disambiguation); Buffer (optical fiber); Wafer; Real-time computing; Mathematical optimization; Computer network; Engineering; Operating system; Mathematics; Routing (electronic design automation)","retraction":null,"screen_n_in":null,"score":{"opus":0.0197078827702216,"gpt":0.2438777265884775,"spread":0.2241698438182559,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.000142016,0.0003689539,0.0002719791,0.0002635054,0.0002567299,0.0001605963,0.0002411117,0.0002254748,0.00008828054],"category_scores_gemma":[0.000003606784,0.0003519062,0.0001138048,0.0001323244,0.00004362899,0.0007855648,0.000001156423,0.0004641076,0.00001778298],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002309252,"about_ca_system_score_gemma":0.00006598815,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00001367844,"about_ca_topic_score_gemma":0.00002460729,"domain_scores_codex":[0.9985517,0.00001796528,0.0003210921,0.0004447638,0.0002180957,0.0004463477],"domain_scores_gemma":[0.9991537,0.00008835556,0.00004414408,0.0004612889,0.00007251672,0.0001799694],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00009133655,0.00005503764,9.533678e-7,0.00006672908,0.00005889051,0.000003198793,0.0002322484,0.9732743,0.02412398,0.00000553335,0.000004137945,0.002083659],"study_design_scores_gemma":[0.00120157,0.0001678121,0.00001096985,0.0001760925,0.00004874167,0.00004533009,0.0002124773,0.07731926,0.920232,0.00008476775,0.00002739033,0.0004736241],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.3581615,0.00001809701,0.6402109,0.00003564858,0.0003763582,0.0005110895,0.00004649318,0.0006134361,0.00002646773],"genre_scores_gemma":[0.6793488,0.00001529203,0.3200267,0.00006250395,0.000107997,0.0002826944,0.00001395423,0.0001067894,0.00003535932],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.896108,"threshold_uncertainty_score":0.9998933,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W3107850185","doi":"10.1109/tsm.2021.3062943","title":"A Graph-Theoretic Approach for Spatial Filtering and Its Impact on Mixed-Type Spatial Pattern Recognition in Wafer Bin Maps","year":2021,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Industrial Vision Systems and Defect Detection","field":"Engineering","cited_by":21,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Toronto","funders":"National Science Foundation","keywords":"Pattern recognition (psychology); Spatial filter; Bin; Metric (unit); Spatial analysis; Filter (signal processing); Common spatial pattern; Wafer; Pattern matching","retraction":null,"screen_n_in":null,"score":{"opus":0.02972761680253365,"gpt":0.2460046401212646,"spread":0.216277023318731,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0002015463,0.0003437589,0.0003582661,0.0004238536,0.0001306261,0.00009527941,0.00007051726,0.0002734373,0.0001295774],"category_scores_gemma":[0.00001042247,0.0003306268,0.0001777391,0.0001744542,0.00001649812,0.0001952033,0.000002220893,0.0004939829,0.0000195226],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001921604,"about_ca_system_score_gemma":0.00002284193,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0002630106,"about_ca_topic_score_gemma":0.0001276437,"domain_scores_codex":[0.9984865,0.00009220383,0.0004074525,0.0004466374,0.0001899443,0.0003772906],"domain_scores_gemma":[0.9994226,0.0001374209,0.00005546577,0.0002194237,0.0000516556,0.0001135126],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0007086402,0.000247258,0.0000288276,0.0007151428,0.0002893571,0.00004160951,0.0009101324,0.2547567,0.4493651,0.000001953943,0.0001006491,0.2928346],"study_design_scores_gemma":[0.001396543,0.000236736,0.0002416509,0.0001988102,0.0000426915,0.00005961063,0.0001487622,0.02686765,0.9702916,0.00006279763,0.00005597149,0.0003971396],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.827054,0.00004032346,0.1702412,0.000007490981,0.001784145,0.0004776603,0.0001699157,0.0001540811,0.00007114583],"genre_scores_gemma":[0.9992877,0.00005165306,0.0001220513,0.00002029152,0.0002486787,0.0001070623,0.00005386946,0.00007809841,0.00003063833],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.5209265,"threshold_uncertainty_score":0.9999146,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W1996722897","doi":"10.1109/tsm.2005.858518","title":"A Novel Approach for the Patterning and High-Volume Production of Sub-40-nm Gates","year":2005,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":20,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Resist; Logic gate; Materials science; Amorphous solid; Layer (electronics); Electronic engineering; Nanotechnology; Optoelectronics; Engineering; Chemistry; Crystallography","retraction":null,"screen_n_in":null,"score":{"opus":0.01657734140735994,"gpt":0.2252234259068178,"spread":0.2086460844994578,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001372489,0.0002307184,0.0002032461,0.0001786485,0.0001602217,0.00002628628,0.0001527069,0.00008225853,0.00001583237],"category_scores_gemma":[0.000003068732,0.0001969163,0.00008931948,0.00008769739,0.00008593863,0.0003235314,0.000002003663,0.0002678245,7.853379e-7],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00006768767,"about_ca_system_score_gemma":0.000005210823,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00002533064,"about_ca_topic_score_gemma":0.00000936303,"domain_scores_codex":[0.9990094,0.00001079907,0.0002899344,0.0002892226,0.0001444663,0.0002562022],"domain_scores_gemma":[0.9994656,0.00007937109,0.00006635302,0.0003155791,0.00003070505,0.0000423364],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0000355829,0.00008738683,0.00002174651,0.0002231623,0.0001614921,1.187818e-7,0.0003935699,0.2140025,0.7330351,0.000009640887,0.00007863245,0.05195104],"study_design_scores_gemma":[0.0002633574,0.00003544524,0.000270047,0.00004321898,0.00006446627,0.00001632084,0.0001235521,0.01276702,0.9852834,0.00003326647,0.0008938009,0.0002061019],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4589941,0.0001027458,0.5398247,0.00002870779,0.0003102455,0.0004469847,0.00003445556,0.0002374409,0.00002056483],"genre_scores_gemma":[0.9670308,0.0001886914,0.03220577,0.0000218701,0.0001166538,0.0002979885,0.000004882478,0.00005953314,0.00007386081],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.5080366,"threshold_uncertainty_score":0.8030013,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2169286256","doi":"10.1109/tsm.2010.2080693","title":"Statistical Design Framework of Submicron Flip-Flop Circuits Considering Process Variations","year":2010,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Low-power high-performance VLSI design","field":"Engineering","cited_by":18,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo; Carleton University","funders":"","keywords":"Flip-flop; Electronic engineering; Transistor; FLOPS; Electronic circuit; Circuit design; Process (computing); Leakage (economics); Engineering; Voltage; Transistor count; Integrated circuit design; Computer science; Electrical engineering; Parallel computing; CMOS","retraction":null,"screen_n_in":null,"score":{"opus":0.01769005813690477,"gpt":0.2398221444221017,"spread":0.2221320862851969,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0002502261,0.0004232879,0.0004244898,0.0003904788,0.0002103908,0.00007646278,0.0003323425,0.0003488259,0.0007636987],"category_scores_gemma":[0.00002799868,0.0004555454,0.00009955425,0.0002451468,0.0001318777,0.0005247296,0.000002162961,0.001350371,0.0001028912],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001132053,"about_ca_system_score_gemma":0.00009043412,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00001961735,"about_ca_topic_score_gemma":0.00001757835,"domain_scores_codex":[0.9979883,0.00004802602,0.0006033558,0.0004248564,0.0003606688,0.0005748238],"domain_scores_gemma":[0.9984499,0.0005966275,0.00009522508,0.0005721222,0.00008110196,0.0002050487],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002207332,0.0001135895,0.0000354635,0.0002508619,0.0001744587,0.00001198641,0.001604408,0.2349057,0.755298,0.0001473192,0.00009080845,0.007345311],"study_design_scores_gemma":[0.0003877272,0.00005557666,0.0003821251,0.000108267,0.00008134808,0.00004075313,0.00009015786,0.009182553,0.9884015,0.000662178,0.0001257533,0.0004820939],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4903603,0.0000140339,0.5071052,0.0000105082,0.001676651,0.0002837641,0.00006525326,0.0003683674,0.0001160128],"genre_scores_gemma":[0.979645,0.00002976482,0.01991294,0.00003121217,0.0001266078,0.00008799492,0.000006628186,0.0001249645,0.00003493515],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.4892847,"threshold_uncertainty_score":0.9997897,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W4392405845","doi":"10.1109/tsm.2024.3372521","title":"Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask","year":2024,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Anodic Oxide Films and Nanostructures","field":"Materials Science","cited_by":4,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Waterloo","funders":"","keywords":"Silicon; Materials science; Fabrication; Optoelectronics; Apex (geometry); Silicon oxide; Oxide; Hybrid silicon laser; Nanotechnology; Silicon nitride; Metallurgy","retraction":null,"screen_n_in":null,"score":{"opus":0.009341740011802609,"gpt":0.2104048772100544,"spread":0.2010631371982518,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001712529,0.0003901009,0.0003714903,0.0001655078,0.0002717371,0.0001431965,0.0004509245,0.0001927363,0.0005898392],"category_scores_gemma":[0.000008708408,0.0002597987,0.0001792255,0.0002657907,0.0002456634,0.0004369347,0.000005001573,0.0003924743,0.00007728639],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001409403,"about_ca_system_score_gemma":0.0001218536,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003815056,"about_ca_topic_score_gemma":0.00008323349,"domain_scores_codex":[0.9978165,0.0001062498,0.0004946471,0.0006813564,0.0004767005,0.0004245284],"domain_scores_gemma":[0.9987956,0.00017189,0.0001858096,0.0006652689,0.00006653916,0.0001148591],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00008706247,0.00005328951,0.00001120888,0.0001138955,0.00005297883,0.000002529528,0.0003545271,0.0007903622,0.9962801,0.00001425712,0.0006387848,0.001601043],"study_design_scores_gemma":[0.000412448,0.00009575872,0.0004269271,0.0001906527,0.00009750742,0.00003211542,0.0001950451,0.00005680294,0.9959047,0.00006730607,0.002192878,0.0003277916],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9914333,0.0003075172,0.005397513,0.0002610153,0.001387562,0.0005316531,0.0002898811,0.0002604693,0.0001311501],"genre_scores_gemma":[0.998233,0.00005732453,0.0002114659,0.0001425786,0.00007226301,0.00005866978,0.0000110063,0.00006821554,0.001145474],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.006799764,"threshold_uncertainty_score":0.9999854,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W3007295782","doi":"10.1109/tsm.2020.2976714","title":"Color Difference Detection of Polysilicon Wafers Using Optimized Support Vector Machine by Magnetic Bacteria Optimization Algorithm With Elitist Strategy","year":2020,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Industrial Vision Systems and Defect Detection","field":"Engineering","cited_by":3,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"University of Manitoba","funders":"Jiangsu Key Laboratory of Precision and Micro-Manufacturing Technology; Natural Science Foundation of Hebei Province; National Natural Science Foundation of China","keywords":"Support vector machine; Wafer; Artificial intelligence; Feature (linguistics); Algorithm; Computer science; Pattern recognition (psychology); Engineering","retraction":null,"screen_n_in":null,"score":{"opus":0.01826643047564976,"gpt":0.2089507984817426,"spread":0.1906843680060928,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.00008619717,0.0004002152,0.0005007372,0.0002079626,0.000157225,0.00008694369,0.0001361615,0.0002433166,0.0004242118],"category_scores_gemma":[0.000003281547,0.0003806208,0.0001276149,0.0002840734,0.0000533095,0.0003001846,0.000002038207,0.000433487,0.000008946668],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002008168,"about_ca_system_score_gemma":0.00003993513,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003229796,"about_ca_topic_score_gemma":0.000016045,"domain_scores_codex":[0.9982723,0.00008287051,0.0005784562,0.0004187748,0.0003036093,0.0003439694],"domain_scores_gemma":[0.9992843,0.00005818485,0.0001512956,0.0002390906,0.0000618745,0.0002052545],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001504746,0.00002112318,5.549823e-7,0.00005256332,0.00005515276,0.000002832768,0.00009996335,0.4394343,0.5488361,6.864293e-8,0.000004796058,0.01134206],"study_design_scores_gemma":[0.001100697,0.0005127013,0.00001553874,0.00004255402,0.00007939627,0.00002324524,0.0001079557,0.3159276,0.6818691,3.090161e-7,0.00004559315,0.000275215],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.5352508,0.00002680381,0.4633764,0.00000636757,0.0005563057,0.0003421264,0.0001908251,0.0002259466,0.00002438506],"genre_scores_gemma":[0.9972874,0.00004612336,0.002330621,0.00002295855,0.0001166953,0.00003511798,0.00002554717,0.00009111506,0.00004443475],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.4620365,"threshold_uncertainty_score":0.9998646,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W2163177753","doi":"10.1109/66.857943","title":"Focus characterization using end of line metrology","year":2000,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":1,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":false,"ca_fund":true,"ca_venue":false,"about_ca":false},"ca_institutions":"","funders":"Ontario Council on Graduate Studies, Council of Ontario Universities","keywords":"Metrology; Focus (optics); Optics; Offset (computer science); Line (geometry); Lens (geology); Coordinate-measuring machine; Physics; Repeatability; Mathematics; Computer science; Geometry","retraction":null,"screen_n_in":null,"score":{"opus":0.0172537696881463,"gpt":0.2441039842823952,"spread":0.2268502145942489,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow","insufficient_payload"],"consensus_categories":[],"category_scores_codex":[0.0000635095,0.0002308734,0.0002656805,0.000337141,0.00006783781,0.00001175741,0.0001522565,0.0001287135,0.001390339],"category_scores_gemma":[6.701109e-7,0.0002518752,0.0001103323,0.0001604651,0.00006745155,0.0003014838,7.436434e-7,0.0002648955,0.000008614483],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00009039114,"about_ca_system_score_gemma":0.000008104419,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00002619703,"about_ca_topic_score_gemma":0.000005326774,"domain_scores_codex":[0.9989545,0.00002659546,0.0003702838,0.0002255718,0.000151867,0.0002712241],"domain_scores_gemma":[0.9995208,0.00003487873,0.00005402385,0.0003120635,0.00001963669,0.00005853818],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00002563239,0.00004841029,0.000006027517,0.000038888,0.00008157243,0.000002366687,0.00009559876,0.0490438,0.8644353,0.000003611054,0.000001583701,0.08621721],"study_design_scores_gemma":[0.0002235697,0.00005892881,0.00008127393,0.00003782291,0.00004340464,0.00001634824,0.00001014067,0.004953149,0.9935903,0.0001168387,0.0006606018,0.0002076454],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.7030137,0.0000280951,0.2958046,0.000003760517,0.0002929668,0.0001628434,0.00007575618,0.0003606312,0.0002576695],"genre_scores_gemma":[0.9949664,0.0002183811,0.004580142,0.00002330226,0.00004659253,0.00002630733,0.000008193323,0.00006022721,0.00007040325],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.2919528,"threshold_uncertainty_score":0.9999933,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W4206400118","doi":"10.1109/tsm.2021.3053077","title":"IEEE Transactions on Semiconductor Manufacturing publication information","year":2021,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Manufacturing Process and Optimization","field":"Engineering","cited_by":0,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Canadian Standards Association","funders":"","keywords":"Semiconductor device fabrication; Manufacturing engineering; Computer science; Engineering; Semiconductor industry; Electrical engineering","retraction":null,"screen_n_in":null,"score":{"opus":0.01513047829741856,"gpt":0.2129287622320379,"spread":0.1977982839346193,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow","insufficient_payload"],"consensus_categories":[],"category_scores_codex":[0.0002070845,0.0008067376,0.0005526522,0.0008177047,0.0006055744,0.0005389174,0.0004300692,0.0004875845,0.002209037],"category_scores_gemma":[0.000008815641,0.0008837514,0.0003536959,0.0003503505,0.00006936014,0.002778993,0.000001983477,0.001288799,0.0005852246],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0006092752,"about_ca_system_score_gemma":0.0001104309,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00004167279,"about_ca_topic_score_gemma":0.00003888647,"domain_scores_codex":[0.9966282,0.00008353195,0.001004119,0.0007332457,0.0006902894,0.0008606436],"domain_scores_gemma":[0.9980954,0.0001695862,0.00020524,0.0009562328,0.0002047299,0.0003688324],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00005863078,0.0001757437,0.000001089081,0.0004255722,0.0002490325,0.00001192687,0.001010685,0.9075083,0.02669805,0.00001109857,0.0007251824,0.06312473],"study_design_scores_gemma":[0.0009260163,0.00006265444,0.0000561645,0.0001581552,0.000110139,0.00007127352,0.0002973405,0.01336821,0.9760394,0.00006310478,0.007949758,0.0008978393],"study_design_candidate":"bench_or_experimental","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.4607575,0.00006165501,0.5308952,0.0001973228,0.003777626,0.0005368628,0.0002438713,0.00156724,0.001962782],"genre_scores_gemma":[0.9954436,0.0003822093,0.001397958,0.0005660892,0.0001845372,0.0002100842,0.000121492,0.0001606633,0.001533319],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.9493413,"threshold_uncertainty_score":0.9993613,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W4253781335","doi":"10.1109/tsm.2020.2988317","title":"IEEE Transactions on Semiconductor Manufacturing publication information","year":2020,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Manufacturing Process and Optimization","field":"Engineering","cited_by":0,"is_retracted":false,"has_abstract":false,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Canadian Standards Association","funders":"","keywords":"Semiconductor device fabrication; Manufacturing engineering; Computer science; Engineering; Electrical engineering","retraction":null,"screen_n_in":null,"score":{"opus":0.01989564096123298,"gpt":0.2098756242527791,"spread":0.1899799832915461,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow","insufficient_payload"],"consensus_categories":["insufficient_payload"],"category_scores_codex":[0.0001642627,0.0008366099,0.0005588823,0.0006664037,0.0005257357,0.0004474684,0.0005568926,0.0004437986,0.001583992],"category_scores_gemma":[0.000008411726,0.0008883374,0.0003250421,0.000323301,0.00007180129,0.002903269,0.000001837052,0.00135102,0.0008191348],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.000430039,"about_ca_system_score_gemma":0.0000614005,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00003918708,"about_ca_topic_score_gemma":0.00001179621,"domain_scores_codex":[0.996734,0.00006390778,0.001001977,0.0007121606,0.000672258,0.0008156486],"domain_scores_gemma":[0.9983312,0.0001343365,0.0002234529,0.0006591624,0.0001154692,0.0005363383],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001049603,0.00008820227,8.742143e-7,0.0004424398,0.0001876013,0.000004091678,0.001862958,0.932398,0.01661571,0.000006095726,0.0009505987,0.04733852],"study_design_scores_gemma":[0.0009609109,0.0001336294,0.00003312392,0.00009919557,0.00009917313,0.00001880112,0.0002580711,0.03933366,0.9502902,0.00002693668,0.007854994,0.0008912674],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.3796214,0.00003154749,0.6133105,0.0004972928,0.002182554,0.0007787098,0.0002474137,0.002109509,0.001221122],"genre_scores_gemma":[0.9964378,0.0002094903,0.001007424,0.001331775,0.0002456473,0.0001999895,0.00007267074,0.000167879,0.0003273229],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.9336745,"threshold_uncertainty_score":0.9999588,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null},{"id":"W4415002953","doi":"10.1109/tsm.2025.3619539","title":"A Condition Monitoring Method via a New Signal Expansion Strategy for the Crystal Lifting and Rotating Mechanism","year":2025,"lang":"en","type":"article","venue":"IEEE Transactions on Semiconductor Manufacturing","topic":"Vibration and Dynamic Analysis","field":"Engineering","cited_by":0,"is_retracted":false,"has_abstract":true,"routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false},"ca_institutions":"Concordia University","funders":"China Postdoctoral Science Foundation; National Natural Science Foundation of China","keywords":"SIGNAL (programming language); Monocrystalline silicon; Vibration; Benchmark (surveying); Process (computing); Condition monitoring; Control theory (sociology); Mechanism (biology)","retraction":null,"screen_n_in":null,"score":{"opus":0.02030543493557713,"gpt":0.2744745500581074,"spread":0.2541691151225303,"validation_status":"score_only:v0-immature-baseline"},"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001873689,0.00023419,0.0002141626,0.0002229714,0.0004432159,0.0001345929,0.0001087325,0.0001135658,0.00006599451],"category_scores_gemma":[0.000004161657,0.0002068966,0.0001294668,0.0001406675,0.00001779146,0.0002951284,0.00000210347,0.0003100545,0.000002472703],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00008279889,"about_ca_system_score_gemma":0.00003336344,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00008149574,"about_ca_topic_score_gemma":0.0000311461,"domain_scores_codex":[0.9989711,0.00003748537,0.0003178043,0.0002800221,0.0001374334,0.0002561614],"domain_scores_gemma":[0.9992667,0.0003973915,0.00005338747,0.0001750487,0.00002755416,0.00007990063],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"simulation_or_modeling","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00001930639,0.000009123875,0.000002382725,0.00006770145,0.0001748048,7.470447e-7,0.0004097152,0.6384107,0.2929727,0.00002561993,0.00001987582,0.0678874],"study_design_scores_gemma":[0.0003117476,0.00001946785,0.00001930153,0.00006041765,0.0001127701,0.00000494519,0.0006473836,0.4790621,0.5191188,0.0004805406,0.00003363752,0.0001288186],"study_design_candidate":"simulation_or_modeling","study_design_consensus":null,"genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.187427,0.00008097757,0.8113928,0.00005290799,0.0004589689,0.0002942288,0.00001378805,0.0002318774,0.00004737682],"genre_scores_gemma":[0.9873495,0.00003817759,0.01202921,0.00004706917,0.0001116672,0.0000551111,0.000004493893,0.00003511373,0.0003297029],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.7999225,"threshold_uncertainty_score":0.8437,"prediction_status":"machine_predicted_unvalidated"},"labels":[],"label_agreement":null}]}