{"id":"W1974952956","doi":"10.1116/1.3597837","title":"Cryogenic shallow reactive ion etch process for profile control on silicon on insulator platform","year":2011,"lang":"en","type":"article","venue":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","topic":"Silicon Nanostructures and Photoluminescence","field":"Materials Science","cited_by":3,"is_retracted":false,"has_abstract":true,"ca_institutions":"Western University","funders":"","keywords":"Silicon on insulator; Materials science; Silicon; Reactive-ion etching; Etch pit density; Etching (microfabrication); Optoelectronics; Buffered oxide etch; Layer (electronics); Insulator (electricity); Nanotechnology","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.002348737,0.0003880127,0.0006749802,0.001077945,0.0007028841,0.0001227548,0.0008173299,0.0004745052,0.0000278657],"category_scores_gemma":[0.0003250427,0.0003024382,0.0000530427,0.0007162393,0.001264555,0.0004790018,0.00008511038,0.000452909,0.000002937193],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002440905,"about_ca_system_score_gemma":0.0007328683,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00000421005,"about_ca_topic_score_gemma":0.000005397957,"domain_scores_codex":[0.9971811,0.00003687539,0.000745599,0.0006915687,0.0004934786,0.0008513465],"domain_scores_gemma":[0.9976779,0.00003956359,0.001026986,0.0003048486,0.0008319425,0.0001187502],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.001498523,0.0001716223,0.0001945801,0.0001037865,0.0000252412,0.000004478598,0.0003674492,9.830084e-7,0.9864364,0.004079832,0.000005658496,0.007111481],"study_design_scores_gemma":[0.001887977,0.003844599,0.0003743831,0.0002408896,0.00007608852,0.000227645,0.0002691025,0.00002439812,0.9740514,0.01855976,0.0001280914,0.0003157349],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9962742,0.001696648,0.0001888649,0.0005025102,0.0004386256,0.0007344622,0.00002119756,0.0001022602,0.00004123167],"genre_scores_gemma":[0.9991785,0.0001461143,0.000304119,0.0001804611,0.00007758752,0.00007672056,9.076516e-7,0.0000278367,0.000007771969],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.01447993,"threshold_uncertainty_score":0.9999428,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.02674383261735467,"score_gpt":0.249525638999187,"score_spread":0.2227818063818323,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}