{"id":"W2010394845","doi":"10.2494/photopolymer.19.525","title":"Evaluation of High and Low Activation Resists for EUV Lithography","year":2006,"lang":"en","type":"article","venue":"Journal of Photopolymer Science and Technology","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":12,"is_retracted":false,"has_abstract":true,"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Resist; Extreme ultraviolet lithography; Outgassing; Materials science; Lithography; Photoresist; Extreme ultraviolet; Process window; Nanotechnology; Optoelectronics; Optics; Chemistry; Physics","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0004497512,0.0003423205,0.0002263731,0.0003213412,0.0002029351,0.0004367668,0.0002783649,0.0002803636,0.001834448],"category_scores_gemma":[0.0009597231,0.0001246064,0.0001524207,0.000139336,0.000205604,0.0002924334,0.0002303668,0.0002542701,0.0003879599],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0002498561,"about_ca_system_score_gemma":0.00009649286,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0003355337,"about_ca_topic_score_gemma":0.0005931253,"domain_scores_codex":[0.9995068,0.0001138718,0.00003867992,0.00006908817,0.0001921451,0.00007929342],"domain_scores_gemma":[0.9994569,0.0002295015,0.00007898606,0.00005325009,0.0001190695,0.00006233212],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001008204,0.00002219525,0.0003310562,0.00005612773,0.000006442718,0.00004032113,0.00002593856,0.0001727312,0.9967784,0.00004989867,0.00003311764,0.002383047],"study_design_scores_gemma":[0.000008389769,0.000561574,0.001484589,0.000004725739,0.0000153875,0.0001236829,0.00001616984,0.0004860359,0.9962534,0.00001246791,0.00102735,0.000006114943],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9953417,0.0009486933,0.002207507,0.00004824894,0.0000153983,0.00001799297,0.00008008448,0.00005762716,0.001282758],"genre_scores_gemma":[0.9927879,0.0003789935,0.004734281,0.00001913687,0.00001178097,0.00001505949,0.0001828738,0.00005313726,0.001816837],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001834448,"threshold_uncertainty_score":0.006136835,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.007298530999874178,"score_gpt":0.2606867001918637,"score_spread":0.2533881691919896,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}