{"id":"W2092298237","doi":"10.1063/1.2740582","title":"Poly(ether sulfone) as a negative resist for electron beam lithography","year":2007,"lang":"en","type":"article","venue":"Applied Physics Letters","topic":"Advancements in Photolithography Techniques","field":"Engineering","cited_by":2,"is_retracted":false,"has_abstract":true,"ca_institutions":"Applied Nanotools (Canada); National Institute for Nanotechnology; University of Alberta","funders":"","keywords":"Sulfone; Resist; Materials science; Polymer; Ether; Polymer chemistry; Irradiation; Electron beam processing; Electron-beam lithography; Methyl methacrylate; Methacrylate; Copolymer; Chemistry; Nanotechnology; Organic chemistry; Composite material","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001829261,0.000316869,0.0002467376,0.0001519049,0.0001089176,0.00003029149,0.0002486465,0.00008345355,0.000007891889],"category_scores_gemma":[0.000004301074,0.0003537791,0.0001696318,0.0005516972,0.0001223742,0.0001132328,0.00002529986,0.0002575496,0.00001331535],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00007954007,"about_ca_system_score_gemma":0.000006820577,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00001543664,"about_ca_topic_score_gemma":0.000003009517,"domain_scores_codex":[0.9985287,0.000006739604,0.0002643483,0.0003284276,0.0002157184,0.0006561323],"domain_scores_gemma":[0.9992648,0.0001621928,0.0000702679,0.0003903258,0.00002911741,0.00008328639],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0001513484,0.00006925576,0.0001222803,0.0000719212,0.000266808,0.000003120523,0.000441429,0.0002556436,0.9283752,0.04358378,0.004719624,0.02193957],"study_design_scores_gemma":[0.0004880283,0.00005380026,0.0003200523,0.00001802346,0.00004338326,9.561653e-7,0.00005064516,0.00002297463,0.9590993,0.02185738,0.01756466,0.000480794],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"methods","genre_gemma":"empirical","genre_scores_codex":[0.2210584,0.0002189938,0.7562512,0.00007826569,0.000171659,0.001292971,0.00003430515,0.001263048,0.01963122],"genre_scores_gemma":[0.9270983,0.00002195579,0.06995275,0.001875362,0.0003509168,0.0004792883,0.00004116003,0.0001552167,0.00002509077],"genre_candidate":"empirical","genre_consensus":null,"teacher_disagreement_score":0.7060398,"threshold_uncertainty_score":0.9998914,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.006614511021230753,"score_gpt":0.2414228397358052,"score_spread":0.2348083287145744,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}