{"id":"W2105684681","doi":"10.1557/proc-1070-e01-12","title":"USJ Dopant Bleaching and Device Effects in Advanced Microelectronic Plasma Enhanced Resist Strip Processing","year":2008,"lang":"en","type":"article","venue":"MRS Proceedings","topic":"Semiconductor materials and devices","field":"Engineering","cited_by":2,"is_retracted":false,"has_abstract":false,"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Materials science; Microelectronics; Resist; Dopant; Wafer; Plasma processing; Silicon on insulator; Plasma; Silicon; Secondary ion mass spectrometry; Optoelectronics; Doping; Oxide; Ion; Analytical Chemistry (journal); Nanotechnology; Layer (electronics); Metallurgy; Chemistry","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0003069119,0.0001878413,0.000277904,0.0002117749,0.0002994205,0.0005065167,0.0003748571,0.0004007839,0.001757505],"category_scores_gemma":[0.0005413322,0.0002561407,0.0001410815,0.0001718851,0.0004260943,0.0006257357,0.0003282583,0.000317579,0.0002178728],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0003117714,"about_ca_system_score_gemma":0.0001549787,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0007836661,"about_ca_topic_score_gemma":0.00142693,"domain_scores_codex":[0.9998844,0.00002085688,0.000006179015,0.00002152899,0.00004123586,0.00002579965],"domain_scores_gemma":[0.9997284,0.0001431444,0.00004214723,0.00003143727,0.00003894046,0.00001589336],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.0006398533,0.00007076151,0.0009010466,0.00006690989,0.00001033626,0.000128243,0.0001250275,0.0007701745,0.9921516,0.0006523426,0.0001477171,0.00433607],"study_design_scores_gemma":[0.00002697771,0.000308521,0.005518978,0.000006574064,0.00003267317,0.0001734314,0.0001063639,0.008494796,0.9844294,0.0001394528,0.0007522919,0.00001060494],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.997162,0.0008579344,0.0007934831,0.00004655436,0.00001204073,0.000006211191,0.00002174512,0.0000480982,0.001051957],"genre_scores_gemma":[0.9966959,0.0003031972,0.0007054321,0.00002082401,0.000007407615,0.000005669739,0.00002630331,0.00003218154,0.002203067],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001757505,"threshold_uncertainty_score":0.005879402,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.007260553970813312,"score_gpt":0.2039082308417966,"score_spread":0.1966476768709833,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}