{"id":"W2105684681","doi":"10.1557/proc-1070-e01-12","title":"USJ Dopant Bleaching and Device Effects in Advanced Microelectronic Plasma Enhanced Resist Strip Processing","year":2008,"lang":"en","type":"article","venue":"MRS Proceedings","topic":"Semiconductor materials and devices","field":"Engineering","cited_by":2,"is_retracted":false,"has_abstract":false,"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Materials science; Microelectronics; Resist; Dopant; Wafer; Plasma processing; Silicon on insulator; Plasma; Silicon; Secondary ion mass spectrometry; Optoelectronics; Doping; Oxide; Ion; Analytical Chemistry (journal); Nanotechnology; Layer (electronics); Metallurgy; Chemistry","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.0001376017,0.0002465519,0.0003111353,0.000139996,0.0001320208,0.00009263237,0.0001305603,0.00009665472,0.000004812679],"category_scores_gemma":[0.00005047996,0.000244095,0.00002359667,0.0002862534,0.00003914506,0.0005182715,0.00002823035,0.0002285666,0.000006585251],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0001099036,"about_ca_system_score_gemma":0.00003075604,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00002949114,"about_ca_topic_score_gemma":0.00003279823,"domain_scores_codex":[0.9987859,0.000005977528,0.0002780389,0.000321668,0.000133041,0.0004753955],"domain_scores_gemma":[0.9997185,0.00003660761,0.00006461176,0.00006085782,0.00004226638,0.00007708959],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00003317561,0.00001278451,0.002217849,0.0007391796,0.000008851644,0.00000675781,0.001471921,0.00006793176,0.9918473,0.0000270245,0.00003946069,0.003527741],"study_design_scores_gemma":[0.001004935,0.00007685053,0.01095664,0.0005273695,0.0000125219,0.00006620945,0.0003427599,0.002239443,0.9835646,0.00009653396,0.0007074928,0.0004046925],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9952028,0.002853923,0.00002377676,0.00001698528,0.0001406081,0.0002539617,9.406168e-7,0.0002927764,0.001214232],"genre_scores_gemma":[0.998557,0.0002821186,0.0008866956,0.000043344,0.00009101161,0.00005048163,0.000002584726,0.00005372243,0.00003298371],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.008738793,"threshold_uncertainty_score":0.9953905,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.007260553970813312,"score_gpt":0.2039082308417966,"score_spread":0.1966476768709833,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}