{"id":"W2140710481","doi":"10.1149/1.2779380","title":"Single Wafer Tool Cleaning for Bi-layer Photoresist Rework - Stripper Development and Evaluation","year":2007,"lang":"en","type":"article","venue":"ECS Transactions","topic":"Advanced Surface Polishing Techniques","field":"Engineering","cited_by":3,"is_retracted":false,"has_abstract":true,"ca_institutions":"Advanced Micro Devices (Canada)","funders":"","keywords":"Photoresist; Wafer; Rework; Materials science; Layer (electronics); Die preparation; Process engineering; Wafer testing; Process (computing); Optoelectronics; Nanotechnology; Computer science; Embedded system; Engineering; Wafer dicing","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"metacan-v3-hybrid-931329e0061c","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.001431456,0.0004925698,0.000973406,0.0007587969,0.0004189009,0.0005623383,0.0007971154,0.0007647597,0.00138104],"category_scores_gemma":[0.001336078,0.0004067728,0.0006367174,0.0003758037,0.0002117763,0.0005839766,0.0004266957,0.0003673995,0.0004270442],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0004996925,"about_ca_system_score_gemma":0.0004338574,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0005191742,"about_ca_topic_score_gemma":0.001428985,"domain_scores_codex":[0.9983838,0.0001347277,0.0000941445,0.0002244249,0.001056347,0.0001065356],"domain_scores_gemma":[0.9987299,0.0002388045,0.0002125833,0.0001879291,0.0005730873,0.00005754376],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00005218548,0.00004415205,0.0002656328,0.0001764432,0.00001623737,0.00005055564,0.00003865854,0.0003396276,0.9877006,0.0000677689,0.00009798729,0.01115017],"study_design_scores_gemma":[0.000005546358,0.0002929246,0.001021834,0.000003465643,0.00001563158,0.0001362723,0.0000150113,0.001419818,0.9959478,0.00001123963,0.001122251,0.000008108235],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9220071,0.004136904,0.07027,0.000139322,0.0001152717,0.0003306133,0.0003273953,0.0006593721,0.002013994],"genre_scores_gemma":[0.8556902,0.002356582,0.1369058,0.00004241183,0.0000196619,0.0001964351,0.0005436291,0.000150958,0.004094201],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.001431456,"threshold_uncertainty_score":0.007570326,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.03864766782370514,"score_gpt":0.2852029408980908,"score_spread":0.2465552730743857,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}