{"id":"W2585968548","doi":"10.1016/b978-1-78548-096-6.50004-3","title":"Plasma Etch Challenges for Gate Patterning","year":2017,"lang":"en","type":"book-chapter","venue":"Elsevier eBooks","topic":"Semiconductor materials and devices","field":"Engineering","cited_by":2,"is_retracted":false,"has_abstract":false,"ca_institutions":"Institut interdisciplinaire d'innovation technologique; Université de Sherbrooke","funders":"","keywords":"Materials science; Metal gate; Gate dielectric; Gate oxide; Optoelectronics; Transistor; Etching (microfabrication); Dielectric; Fabrication; CMOS; High-κ dielectric; Nanotechnology; Electrical engineering; Layer (electronics); Voltage","routes":{"ca_aff":true,"ca_fund":false,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":["metaepi_narrow"],"consensus_categories":[],"category_scores_codex":[0.0001585876,0.0004754243,0.0006079897,0.00008638075,0.0001157176,0.0001342151,0.000374933,0.0004042931,0.0001969135],"category_scores_gemma":[0.000009515306,0.0004594975,0.0001970333,8.898447e-7,0.0000470022,0.00006391419,0.0000695051,0.0002313333,0.0001974199],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00004251761,"about_ca_system_score_gemma":0.00001990486,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":3.436946e-7,"about_ca_topic_score_gemma":0.00002898393,"domain_scores_codex":[0.9988086,0.00000584285,0.0003415077,0.0003578786,0.0001541416,0.0003320725],"domain_scores_gemma":[0.9990037,0.00006208733,0.0001686416,0.0006202472,0.00005162737,0.0000936946],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"design_other","study_design_gemma":"not_applicable","study_design_scores_codex":[0.000007352415,0.000001157024,6.678679e-7,0.0009938898,0.0001680303,0.0000123884,0.000289857,0.00001088564,0.001233321,0.001066251,0.0001614237,0.9960548],"study_design_scores_gemma":[0.0002763838,0.00002968514,0.000006933885,0.000784694,0.00008399285,0.00001105701,0.000007604521,0.0001074844,0.00157974,0.004112295,0.9924457,0.0005544375],"study_design_candidate":"design_other","study_design_consensus":null,"genre_codex":"other","genre_gemma":"other","genre_scores_codex":[0.00157611,0.006733405,0.00000269977,0.00002390938,0.002280193,0.0004479887,0.0001245019,0.0003032508,0.9885079],"genre_scores_gemma":[0.01541768,0.002164218,0.0002364974,0.00005768163,0.001731514,0.0001313218,0.00005324845,0.0003305126,0.9798774],"genre_candidate":"other","genre_consensus":"other","teacher_disagreement_score":0.9955003,"threshold_uncertainty_score":0.9997857,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.03977866530488271,"score_gpt":0.2425028971023815,"score_spread":0.2027242317974988,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}