{"id":"W2792674356","doi":"10.1002/pssa.201700658","title":"A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching","year":2018,"lang":"en","type":"article","venue":"physica status solidi (a)","topic":"Semiconductor materials and devices","field":"Engineering","cited_by":11,"is_retracted":false,"has_abstract":true,"ca_institutions":"Institut interdisciplinaire d'innovation technologique; Université de Sherbrooke","funders":"Natural Sciences and Engineering Research Council of Canada","keywords":"Etching (microfabrication); Reactive-ion etching; Oxide; Plasma etching; Materials science; Isotropic etching; Dry etching; Hydrogen; Plasma; Buffered oxide etch; Layer (electronics); Etch pit density; Nitride; Silicon nitride; Analytical Chemistry (journal); Chemical engineering; Optoelectronics; Nanotechnology; Chemistry; Metallurgy; Organic chemistry","routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00002977782,0.0001799123,0.0002252853,0.00003516744,0.000103584,0.00005452237,0.00004629287,0.00003907074,0.000009144536],"category_scores_gemma":[0.0000120776,0.0001606575,0.00004784105,0.0000617845,0.00003738936,0.0001359045,0.00001562785,0.00003410349,0.00002293231],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.0000759641,"about_ca_system_score_gemma":0.00002130921,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.0001164236,"about_ca_topic_score_gemma":0.00004697094,"domain_scores_codex":[0.9992453,0.00001101093,0.0001194732,0.0002031077,0.00006112472,0.0003599625],"domain_scores_gemma":[0.9996219,0.00009750806,0.00002968923,0.0001230622,0.00003772452,0.00009016194],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00005977395,0.0000413147,0.0002016656,0.00005919489,0.0001636262,8.079477e-7,0.002974117,0.0002127745,0.9910384,0.0002044503,0.0004415802,0.004602255],"study_design_scores_gemma":[0.0007805823,0.0003067885,0.0002293777,0.00001739138,0.00005358029,0.000002984773,0.0001535957,0.02103393,0.9668168,0.001552653,0.008816563,0.000235759],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.9980828,0.000197629,0.0000820271,0.0000147781,0.0001897857,0.0002732136,0.00008910093,0.0002066433,0.0008640942],"genre_scores_gemma":[0.9989145,0.00006233804,0.0002796082,0.00002530903,0.0005451582,0.00008683769,0.00001719358,0.00004343527,0.00002566799],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.02422164,"threshold_uncertainty_score":0.6551424,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.01821143340623348,"score_gpt":0.2581088717470432,"score_spread":0.2398974383408097,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}