{"id":"W4416508142","doi":"10.1016/j.mne.2025.100330","title":"Review of plasma etching processes for III-V semiconductors","year":2025,"lang":"en","type":"article","venue":"Micro and Nano Engineering","topic":"Plasma Diagnostics and Applications","field":"Engineering","cited_by":1,"is_retracted":false,"has_abstract":true,"ca_institutions":"University of Ottawa","funders":"Fonds de recherche du Québec – Nature et technologies; Natural Sciences and Engineering Research Council of Canada","keywords":"Etching (microfabrication); Plasma; Semiconductor; Process (computing); Semiconductor materials","routes":{"ca_aff":true,"ca_fund":true,"ca_venue":false,"about_ca":false,"invisible_to_affiliation_only":false},"retraction":null,"screen":null,"direct_labels":[],"prediction":{"model_version":"codex-gemma-dda1882f352a","candidate_categories":[],"consensus_categories":[],"category_scores_codex":[0.00005524051,0.00009185213,0.0001577153,0.00006493629,0.00002401974,0.000009448766,0.00006587697,0.00003430934,0.000001344739],"category_scores_gemma":[0.00008195488,0.00009433074,0.00002606754,0.0001843284,0.000006969771,0.00003677132,0.00001493111,0.00004648943,4.466733e-7],"about_ca_system_candidate":false,"about_ca_system_consensus":false,"about_ca_system_score_codex":0.00001121006,"about_ca_system_score_gemma":0.00001534676,"about_ca_topic_candidate":false,"about_ca_topic_consensus":false,"about_ca_topic_score_codex":0.00000153814,"about_ca_topic_score_gemma":0.000001060759,"domain_scores_codex":[0.9996116,9.637059e-7,0.0001681744,0.00008678863,0.00001905828,0.0001134325],"domain_scores_gemma":[0.9996929,0.0001535586,0.00001472046,0.00007979892,0.00003545974,0.0000236325],"domain_codex":null,"domain_gemma":null,"domain_candidate":null,"domain_consensus":null,"study_design_codex":"bench_or_experimental","study_design_gemma":"bench_or_experimental","study_design_scores_codex":[0.00000163878,0.00001518762,0.00006510048,0.04011875,0.00007493615,2.065883e-7,0.00007152082,0.01136043,0.9356956,0.0018981,0.005813129,0.004885353],"study_design_scores_gemma":[0.0002497171,0.000006603436,0.00003590449,0.006618601,0.00004900674,0.000003164649,0.000009501933,0.01045005,0.8817544,0.00005944507,0.1006017,0.00016187],"study_design_candidate":"bench_or_experimental","study_design_consensus":"bench_or_experimental","genre_codex":"empirical","genre_gemma":"empirical","genre_scores_codex":[0.925018,0.06422972,0.009304415,0.0001340129,0.0002042541,0.0004062924,0.00009233375,0.0001741957,0.0004367447],"genre_scores_gemma":[0.9528767,0.04055295,0.006215537,0.00008116867,0.00003115976,0.0001233795,0.00001977653,0.00002459292,0.00007470926],"genre_candidate":"empirical","genre_consensus":"empirical","teacher_disagreement_score":0.09478862,"threshold_uncertainty_score":0.3846696,"prediction_status":"machine_predicted_unvalidated"},"machine_scores":{"provisional":true,"baseline":true,"maturity_gate_passed":false,"score_opus":0.005509445266388871,"score_gpt":0.2126055653947284,"score_spread":0.2070961201283396,"validation_status":"score_only:v0-immature-baseline","note":"Baseline scores from an immature model (maturity gate not passed). Scores rank; they never assert a category."}}