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Record W2504943423 · doi:10.1117/3.322162.ch1

Introduction to the Use of Statistical Process Control in Lithography

2009· book-chapter· en· W2504943423 on OpenAlexaff
Harry Levinson

Bibliographic record

VenueSPIE eBooks · 2009
Typebook-chapter
Languageen
FieldDecision Sciences
TopicAdvanced Statistical Process Monitoring
Canadian institutionsAdvanced Micro Devices (Canada)
Fundersnot available
KeywordsReworkProcess variationLithographyScrapProcess (computing)Manufacturing engineeringStatistical process controlVariation (astronomy)Control (management)EngineeringComputer scienceProcess engineeringReliability engineeringMechanical engineeringMaterials scienceArtificial intelligenceEmbedded system

Abstract

fetched live from OpenAlex

Statistical methods need to be part of every lithographer's toolbox, because lithographic processes contain intrinsic levels of variation. This variation is a consequence of the nature of the world. For example, petroleum is typically the starting material from which photoresists are synthesized, and the composition of crude oil varies from well to well. Lithographic processes and tools are affected by environmental parameters such as barometric pressure and relative humidity, and these factors vary with the weather. Lithography is a manufacturing science implemented and ultimately exercised by human beings, each of whom is a unique individual, different from all others. When people are involved, there is a special element of variation interjected into the process. The analytical methods used by lithography engineers and managers must be capable of dealing with variation in equipment, materials, and people. The objective of any process control methodology is the reduction of variation, in order to maintain conformance to standards or to meet a higher standard. Variations in gate lengths can lead to degraded yield or slower parts, which usually sell for a lower price than faster devices. Higher manufacturing costs result from variation, in the form of scrap, reduced yield, rework, and low equipment utilization. Often there are costs associated with attempts to reduce variation. Since the objective of process control is to maximize profitability, the most effective methods are those which accomplish control in the most cost-effective manner. Indeed, Dr. Walter Shewhart, the inventor of statistical process control, titled his book, Economic Control of Quality of Manufactured Product, with the first word of the title identifying the monetary considerations motivating his methods. Generally, the most economical approaches require that particular levels of variation be tolerated, and the purpose of statistical process control is the identification of variation in excess of the norms of a controlled process. Statistics is the mathematical science for making inferences about quantities which are probabilistic (in contrast to deterministic) in nature. Many statistical methods are therefore applicable only to situations that are random, in which events are independent of each other. A large fraction of the first three chapters of this Tutorial Text will involve the examination of commonly occurring situations in microlithography in which measurements are not independent. The discussion will lead to methods for applying statistical control techniques correctly in such situations.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.004
metaresearch head score (Gemma)0.011
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Not applicable · Consensus signal: none
GenreCandidate signal: Methods · Consensus signal: Methods
Teacher disagreement score0.009
Threshold uncertainty score0.029

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0040.011
Meta-epidemiology (narrow)0.0010.001
Meta-epidemiology (broad)0.0010.001
Bibliometrics0.0020.004
Science and technology studies0.0010.006
Scholarly communication0.0030.003
Open science0.0020.002
Research integrity0.0030.006
Insufficient payload (model declined to judge)0.0090.004

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.103
GPT teacher head0.382
Teacher spread0.279 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designNot applicable
Domainnot available
GenreMethods

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations0
Published2009
Admission routes1
Has abstractyes

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