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Record W2504943423 · doi:10.1117/3.322162.ch1

Introduction to the Use of Statistical Process Control in Lithography

2009· book-chapter· en· W2504943423 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueSPIE eBooks · 2009
Typebook-chapter
Languageen
FieldDecision Sciences
TopicAdvanced Statistical Process Monitoring
Canadian institutionsAdvanced Micro Devices (Canada)
Fundersnot available
KeywordsReworkProcess variationLithographyScrapProcess (computing)Manufacturing engineeringStatistical process controlVariation (astronomy)Control (management)EngineeringComputer scienceProcess engineeringReliability engineeringMechanical engineeringMaterials scienceArtificial intelligenceEmbedded system

Abstract

fetched live from OpenAlex

Statistical methods need to be part of every lithographer's toolbox, because lithographic processes contain intrinsic levels of variation. This variation is a consequence of the nature of the world. For example, petroleum is typically the starting material from which photoresists are synthesized, and the composition of crude oil varies from well to well. Lithographic processes and tools are affected by environmental parameters such as barometric pressure and relative humidity, and these factors vary with the weather. Lithography is a manufacturing science implemented and ultimately exercised by human beings, each of whom is a unique individual, different from all others. When people are involved, there is a special element of variation interjected into the process. The analytical methods used by lithography engineers and managers must be capable of dealing with variation in equipment, materials, and people. The objective of any process control methodology is the reduction of variation, in order to maintain conformance to standards or to meet a higher standard. Variations in gate lengths can lead to degraded yield or slower parts, which usually sell for a lower price than faster devices. Higher manufacturing costs result from variation, in the form of scrap, reduced yield, rework, and low equipment utilization. Often there are costs associated with attempts to reduce variation. Since the objective of process control is to maximize profitability, the most effective methods are those which accomplish control in the most cost-effective manner. Indeed, Dr. Walter Shewhart, the inventor of statistical process control, titled his book, Economic Control of Quality of Manufactured Product, with the first word of the title identifying the monetary considerations motivating his methods. Generally, the most economical approaches require that particular levels of variation be tolerated, and the purpose of statistical process control is the identification of variation in excess of the norms of a controlled process. Statistics is the mathematical science for making inferences about quantities which are probabilistic (in contrast to deterministic) in nature. Many statistical methods are therefore applicable only to situations that are random, in which events are independent of each other. A large fraction of the first three chapters of this Tutorial Text will involve the examination of commonly occurring situations in microlithography in which measurements are not independent. The discussion will lead to methods for applying statistical control techniques correctly in such situations.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.001
metaresearch head score (Gemma)0.004
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Theoretical or conceptual · Consensus signal: none
GenreCandidate signal: Methods · Consensus signal: none
Teacher disagreement score0.745
Threshold uncertainty score0.883

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0010.004
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0010.000
Bibliometrics0.0010.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0010.000
Research integrity0.0000.001
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.103
GPT teacher head0.382
Teacher spread0.279 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it