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Record W4385893389 · doi:10.1109/ectc51909.2023.00234

Development of a Plasma Etching Process of Copper for the Microfabrication of High-Density Interconnects in Advanced Packaging

2023· preprint· en· W4385893389 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

Venuenot available
Typepreprint
Languageen
FieldMaterials Science
TopicCopper Interconnects and Reliability
Canadian institutionsIBM (Canada)Institut interdisciplinaire d'innovation technologiqueUniversité de Sherbrooke
Fundersnot available
KeywordsMicrofabricationEtching (microfabrication)Plasma etchingMaterials scienceFabricationPlasmaNanotechnologyProcess (computing)CopperLayer (electronics)OptoelectronicsComputer scienceMetallurgyPhysics

Abstract

fetched live from OpenAlex

Current microfabrication approaches face many challenges when scaling down to form copper lines of less than 2 μm line/space width on organic substrates, resulting in issues such as lateral etching and undercut. In this work, a one-step Ar/H <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> /Cl <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> plasma etching process has been developed, allowing to replace wet etching of the seed layer in the semi-additive process (SAP) approach. By optimizing the etch process, we demonstrate the fabrication of high-density copper-based RDL with an L/S of ∼1.65 μm with a Cu etch rate of 150 nm/min on a packaging substrate.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.001
metaresearch head score (Gemma)0.001
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.016
Threshold uncertainty score0.552

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0010.001
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0010.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0010.001
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.033
GPT teacher head0.306
Teacher spread0.274 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Quick stats

Citations2
Published2023
Admission routes1
Has abstractyes

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