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Record W1969154456 · doi:10.1117/12.801560

Effects of heated substrates on bimetallic thermal resist for lithography and grayscale photomask applications

2008· article· en· W1969154456 on OpenAlexaff
James M. Dykes, Polly Tsui, Jenny Leung, Glenn H. Chapman

Bibliographic record

VenueProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsSimon Fraser University
Fundersnot available
KeywordsResistPhotomaskMaterials scienceLithographyBimetallic stripGrayscaleMaskless lithographyNanotechnologyNanolithographyNext-generation lithographyStencil lithographyOptoelectronicsThermalX-ray lithographyElectron-beam lithographyOpticsFabricationPhysicsPixel

Abstract

fetched live from OpenAlex

Bimetallic thin-films of Bi/In act as negative thermal resists when laser exposure pulse (7mJ/sq. cm for 4 nsec) converts the film into a transparent eutectic metallic oxide alloy. Resist transparency varies with exposed laser power, changing from &lt;0.1% (3.0 OD) unexposed to &gt;60% (0.22 OD) exposed. This generates direct-write gray scale photomasks, and adding a feedback system where the transparency is measured and adjusts the writing process to account for local variations in the film, achieves &gt;64 gray level control. These resists are also wavelength invariant, operating from visible to EUV with a resolution &gt;42nm after development using a diluted RCA-2 solution (HCl:H<sub>2</sub>O<sub>2</sub>:H<sub>2</sub>0 @ 1:1:48) with a gamma of 2-18. Longer duration exposures with lower instantaneous intensities result in lower gammas, while shorter exposures with higher energies give higher gammas. One limitation on these resists is that the exposure energy must be delivered in a single pulse. This limitation puts pulse energy requirements into the mJ per pulse range: greater than desired for EUV exposure systems. Bimetallic thermal resists remain almost unaffected during a sub-threshold exposure that does not reach the activation energy. It has been shown that the resist and substrate can be heated below the threshold energy, to temperatures of at least 90&deg;C, without creating any exposure of the resist. In this research, Bi/In resists are heated through a range of substrate temperatures, measured for their optical exposure requirements and gammas under these conditions, and used to determine if substrate heating can improve the film's sensitivity.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesMeta-epidemiology (narrow)
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.158
Threshold uncertainty score1.000

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.001
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0010.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.008
GPT teacher head0.220
Teacher spread0.213 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations0
Published2008
Admission routes1
Has abstractyes

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Same venueProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIESame topicAdvancements in Photolithography TechniquesFrench-language works237,207