Nano patterning on optical fiber and laser diode facet with dry resist
Bibliographic record
Abstract
Semiconductor micro and nanofabrication lithography techniques for application in microelectronics as well as in micromechanics and optoelectronics can gain significantly from using a dry resist process, since it enables the deposition of a very uniform lithographically sensitive layer on a potentially very small area. This would otherwise be extremely difficult to achieve by using a traditional spin coated resist, such as poly(methylmethacrylate) (PMMA). We demonstrate the use of an electron sensitive sterol based evaporated electron beam resist to fabricate high-resolution features (down to 100 nm) on a small surface area. This electron beam resist has a sensitivity comparable to PMMA and is deposited using a simple thermal evaporation. Two practical applications are explored: first, this resist makes it possible to fabricate a Fresnel zone plate lens on the tip of an optical fiber in order to demonstrate the principle and the potential of highly efficient coupling of diode laser emission into the fiber; second, we use this evaporated electron beam resist in order to pattern an optical diffractive element on the facet of a semiconductor laser.
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How this classification was reachedexpand
Full frame machine prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.
Distilled classifier scores by category (both heads)
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.001 | 0.001 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".