MétaCan
Menu
Back to cohort
Record W1994958822 · doi:10.1109/icicdt.2010.5510275

Overlay-aware interconnect yield modeling in double patterning lithography

2010· article· en· W1994958822 on OpenAlexaff
Minoo Mirsaeedi, Mohab Anis

Bibliographic record

Venuenot available
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsUniversity of Waterloo
Fundersnot available
KeywordsOverlayInterconnectionDesign for manufacturabilityParametric statisticsMultiple patterningComputer scienceLithographyElectronic engineeringYield (engineering)Layer (electronics)Materials scienceResistOptoelectronicsEngineeringComputer networkNanotechnologyElectrical engineeringMathematics

Abstract

fetched live from OpenAlex

In double patterning lithography, overlay error between two patterning steps at the same layer results in critical dimensions variability. In order to optimize the yield loss due to overlay error, statistical design techniques should be applied since overlay error is segueing from a systematic error into a random one for technology nodes smaller than 45-nm. In this paper, the effects of overlay error on interconnect layers are studied and the interconnect yield in presence of overlay error is modeled. Next, a yield optimization method is proposed to improve the parametric and functional yields of interconnect layers. Experimental results show that parametric yield loss is more problematic in negative-tone DPL. Moreover, we show that different DFM techniques such as wire spreading are necessary to reach design constraints.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.001
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Simulation or modeling · Consensus signal: Simulation or modeling
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.003
Threshold uncertainty score0.006

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0000.001
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.001
Open science0.0000.000
Research integrity0.0010.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.021
GPT teacher head0.247
Teacher spread0.226 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designSimulation or modeling
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations1
Published2010
Admission routes1
Has abstractyes

Explore more

Same topicAdvancements in Photolithography TechniquesFrench-language works237,207