MétaCan
Menu
Back to cohort
Record W1997058171 · doi:10.1109/issm.2006.4493115

The ROI of Metrology

2006· article· en· W1997058171 on OpenAlexaff
B Bunday, John A. Allgair, Mark Caldwell, Chas Archie, Eric Solecky, Bryan J. Rice, Bhanwar Singh, Iraj Emami

Bibliographic record

VenueIEEE International Symposium on Semiconductor Manufacturing conference proceedings · 2006
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsAdvanced Micro Devices (Canada)
Fundersnot available
KeywordsMetrologyPremiseQuality (philosophy)Manufacturing engineeringValue (mathematics)Computer scienceLithographyEngineeringDimensional metrologySystems engineeringPhysicsOptics

Abstract

fetched live from OpenAlex

The conventional premise that metrology is a "non-value-added necessary evil" is a misleading one, which must he viewed as obsolete thinking. Much of the metrology requirements are now key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes. This paper will explore the present and future trends and challenges in CD metrology. However, equipment is only part of the battle. The quality application of these tools in a production environment is quite important; the ultimate value-added by metrology is a result of quality tools run by a quality metrology team using quality practices.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.035
Threshold uncertainty score0.799

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0010.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.013
GPT teacher head0.248
Teacher spread0.234 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations3
Published2006
Admission routes1
Has abstractyes

Explore more

Same venueIEEE International Symposium on Semiconductor Manufacturing conference proceedingsSame topicAdvancements in Photolithography TechniquesFrench-language works237,207