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Record W2010394845 · doi:10.2494/photopolymer.19.525

Evaluation of High and Low Activation Resists for EUV Lithography

2006· article· en· W2010394845 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueJournal of Photopolymer Science and Technology · 2006
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsAdvanced Micro Devices (Canada)
Fundersnot available
KeywordsResistExtreme ultraviolet lithographyOutgassingMaterials scienceLithographyPhotoresistExtreme ultravioletProcess windowNanotechnologyOptoelectronicsOpticsChemistryPhysics

Abstract

fetched live from OpenAlex

This paper reports our latest findings on the performance of high and low activation resists for EUV lithography. Both low and high activation resists show good capability down to 35 nm resolution, with acceptable LER and photospeed. These resists also show minimal outgassing of 3.4 x 1012 molecules/cm2 outgassed at EUV exposure, well below the maximum outgassing threshold. The best resist material found so far is a blend of high and low activation resist polymers. This material showed resolution to 32nm, photospeed of 18mJ/cm2, with an acceptable process window at 35nm. The PEB sensitivity was extremely low, 0.25nm/°C. This resist also had minimal LER, 3σ, of 3nm for 40nm 1:1 lines and spaces.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.001
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.088
Threshold uncertainty score0.273

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0010.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0010.001
Science and technology studies0.0000.001
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.007
GPT teacher head0.261
Teacher spread0.253 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it