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Record W2010573847 · doi:10.1063/1.1483902

Effect of unintentionally introduced oxygen on the electron–cyclotron resonance chemical-vapor deposition of SiNX films

2002· article· en· W2010573847 on OpenAlex
P. Cova, R. A. Masut, O. Grenier, S. Poulin

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueJournal of Applied Physics · 2002
Typearticle
Languageen
FieldEngineering
TopicSemiconductor materials and devices
Canadian institutionsPolytechnique Montréal
Fundersnot available
KeywordsChemical vapor depositionDangling bondElectron cyclotron resonanceOxygenSiliconChemical bondNitrogenAnalytical Chemistry (journal)ChemistryLimiting oxygen concentrationMaterials scienceNanotechnologyOrganic chemistryIon

Abstract

fetched live from OpenAlex

We establish the role of oxygen atoms on the structural, chemical, and mechanical properties of SiOXNY films grown on Si and InP substrates by electron–cyclotron resonance chemical-vapor deposition (ECR CVD) using a diluted SiH4 and N2 mixture in Ar, under controlled conditions. The mechanical and chemical properties of ECR-CVD SiNX films depend on the oxygen contamination even when this element is present in low concentrations. The compressive stress of SiNX films deposited with a low (and constant) content of oxygen (less than 12%) is shown to be in qualitative agreement with a model of repulsive Coulomb forces related mainly to polar N–H+− units in the SiNX network. We observe a decrease of the film compressive stress when the N2/SiH4 flow ratio increases, which is due to the increase of Si–N bonds in detriment of N–H bonds. Films deposited with high oxygen content in the plasma show a decrease of nitrogen incorporation. Oxygen radicals species compete with those of nitrogen in their reaction with silicon dangling bonds, which has as a consequence a decrease in the incorporation of nitrogen. Additional creation of oxygen radicals, with no hydrogen dilution, is more effective in decreasing the number of N–H bonds, or the compressive stress in the SiNX films, than the corresponding creation of nitrogen radicals. The mechanical properties of SiNX films contaminated with oxygen are controlled, in general, by the total number of both nitrogen plus oxygen atoms relative to silicon. The buffered HF (BHF) film etch rate is enhanced and thus is mainly controlled by the oxygen content. Low values of the compressive stress do not necessarily imply low values of BHF etch rate or a high N/Si ratio. We also present a discussion of the origin of the unintentional incorporation of oxygen in a ECR-CVD system designed for industrial production.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.006
Threshold uncertainty score0.319

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.007
GPT teacher head0.199
Teacher spread0.192 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it