MétaCan
Menu
Back to cohort
Record W2012451070 · doi:10.1049/mnl.2011.0548

Very high sensitivity ZEP resist using MEK:MIBK developer

2011· article· en· W2012451070 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueMicro & Nano Letters · 2011
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsUniversity of Waterloo
Fundersnot available
KeywordsResistMethyl isobutyl ketoneElectron-beam lithographyLithographyMaterials scienceXyleneCoatingLayer (electronics)KetoneOptoelectronicsAnalytical Chemistry (journal)NanotechnologyChemistryOrganic chemistryToluene

Abstract

fetched live from OpenAlex

Low throughput is the major drawback for electron beam lithography. Chemically amplified resists that have high sensitivity are often used to keep the exposure time within practical limit. In this Letter the authors show that the popular non-chemically amplified electron beam resist ZEP-520A can achieve 2.6 µC/cm2 sensitivity when using methyl ethyl ketone:methyl isobutyl ketone developer and 5 keV exposure, though at the cost of reduced contrast compared to standard developers xylene, n-amyl acetate or hexyl acetate. The achievable resolution was found to depend strongly on the resist's adhesion to the substrate or under-layer and thus obtained 40 nm half-pitch resolution using ZEP resist spun on a layer of anti-reflection coating that was treated by oxygen plasma.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesMeta-epidemiology (narrow)
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.130
Threshold uncertainty score1.000

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.018
GPT teacher head0.208
Teacher spread0.189 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it