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Record W2014941889 · doi:10.2494/photopolymer.17.621

Recent Advances in the Design of Resist Materials for 157 nm Lithography

2004· article· en· W2014941889 on OpenAlexaff
Francis M. Houlihan, Raj Sakamuri, Andrew R. Romano, David Rentkiewicz, Ralph R. Dammel, Nickolay Stephanko, M. Market, U. Mierau Inge. Vermeir, Christoph Hohle, Sill Conley, Daniel A. Miller, Toshiro Itani, Masato Shigematus, Etsuo Kawaguchi

Bibliographic record

VenueJournal of Photopolymer Science and Technology · 2004
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsInfineon Technologies (Canada)
Fundersnot available
KeywordsResistMaterials scienceStepperLithographyPhotoresistImmersion lithographyPhotolithographyNanotechnologyOptoelectronics

Abstract

fetched live from OpenAlex

Further work is described on a new generation of more transparent, 157 nm resist platforms, which are based upon capping of fluoroalcohol-substituted, transparent perfluorinated resins (TFR) with a tert-butoxycarbonylmethyl (BOCME) moiety. By optimizing both resin structure and loading of photoacid generator and base additive a good compromise can achieved between resolution power, dark erosion resistance, sensitivity and transparency at 157 nm. In this manner, resist systems with a transparency as low as 0.87 AU/micron were designed capable of resolving 55 nm 1:1 features, at a dose of 92 mJ/cm2 using a phase shift mask on a Exitech 157 nm small field mini-stepper. Also, these have been imaged with a larger field tool (DUV30 Micrascan VII) to give 80 nm 1.1.5 L/S features at a dose of 135 mJ/cm2 employing using a Binary mask. A description is also given of our work on 193 nm/immersion lithography. Specifically, the effects of changing resist compoents such as PAG and Base content will be discussed. Also, a description of the utility of a protective base soluble barrier coat will be given.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.001
metaresearch head score (Gemma)0.001
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: none
Teacher disagreement score0.002
Threshold uncertainty score0.008

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0010.001
Meta-epidemiology (narrow)0.0010.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.001
Open science0.0010.000
Research integrity0.0000.001
Insufficient payload (model declined to judge)0.0020.002

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.010
GPT teacher head0.272
Teacher spread0.261 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations1
Published2004
Admission routes1
Has abstractyes

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Same venueJournal of Photopolymer Science and TechnologySame topicAdvancements in Photolithography TechniquesFrench-language works237,207