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Record W2048814813 · doi:10.1063/1.2031936

Energy dependence of ion-assisted chemical etch rates in reactive plasmas

2005· article· en· W2048814813 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueApplied Physics Letters · 2005
Typearticle
Languageen
FieldEngineering
TopicPlasma Diagnostics and Applications
Canadian institutionsInstitut National de la Recherche ScientifiqueUniversité de Montréal
Fundersnot available
KeywordsIonYield (engineering)Etch pit densityPlasmaEtching (microfabrication)Reactive-ion etchingPlasma etchingChemistryActivation energyWork (physics)Isotropic etchingAnalytical Chemistry (journal)Materials sciencePhysical chemistryThermodynamicsPhysicsNuclear physicsOrganic chemistry

Abstract

fetched live from OpenAlex

In a highly cited paper, Steinbrüchel [C. Steinbrüchel, Appl. Phys. Lett. 55, 1960 (1989)] has demonstrated that in the sub-keV region the etch yield scales like the square root of the ion energy. Based on this result, many authors have subsequently applied this specific energy dependence to ion-assisted chemical etch rates of various materials in different etch tools. In this work, it is demonstrated that in contrast to the etch yield, the etch rate cannot universally be modeled by a simple square-root energy dependence. A novel model accounting for the correct energy dependence of ion-assisted chemical etch rates is therefore proposed. Application of this model to the etching of SiO2 and ZnO in halogenated plasma chemistries provides a quantitative description of the simultaneous dependence of the etch rate on ion energy and on ion and reactive neutral fluxes.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.052
Threshold uncertainty score0.556

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.008
GPT teacher head0.203
Teacher spread0.195 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it