Use of layout automation and design-based metrology for defect test mask design and verification
Bibliographic record
Abstract
This paper studies the impact of shape and local environment (pattern layout) on the ability to detect defects on the reticle and the extent to which they affect the dimension of the printed image on the wafer. The authors have made extensive use of design information to perform a thorough evaluation. OPC software was used to generate mask data that was comparable to product mask data. Defects were placed on the post-OPC layout and OPC software was also used to simulate the dimension of the defective features as printed on the wafer. "Design Based Metrology" was used to create accurate metrology recipes to support wafer and mask metrology. Ultimately the procedures described in this paper allow a direct correlation to be made between reticle inspectability and the impact of the same defects on wafer CD. Data is presented for the case of the Contact Hole layer of a "65nm" Logic technology, though the methods described in the paper are applicable to all layers.
Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.
How this classification was reachedexpand
Full frame machine prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.
Distilled classifier scores by category (both heads)
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.002 | 0.006 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.001 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.001 | 0.001 |
| Open science | 0.001 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.001 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".