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In-Line Phase and Texture Control in Microelectronics Industry

2005· article· en· W2052770281 on OpenAlexaff
K. J. Kozaczek

Bibliographic record

VenueMaterials science forum · 2005
Typearticle
Languageen
FieldEngineering
TopicAdvanced Surface Polishing Techniques
Canadian institutionsHyperion Technologies (Canada)
Fundersnot available
KeywordsCopper interconnectMaterials scienceElectromigrationWaferMicrostructureMetrologyTexture (cosmology)Reliability (semiconductor)MicroelectronicsProcess controlPhase (matter)OptoelectronicsProcess (computing)CopperComputer scienceComposite materialMetallurgyOpticsArtificial intelligence

Abstract

fetched live from OpenAlex

We present the principles of operation and a summary of results from in-fab automated X-ray diffraction (XRD) metrology in support of copper damascene roduction. The automated XRD tools (an example is shown in Figure 1) are capable of rapid mapping of 300 mm wafers (with a throughput rate of 40 wafers/hour) of quantitative information about the film crystallographic composition, texture and thickness with a spatial resolution down to 30 microns. Microstructure control plays an increasingly important role in improving the performance and reliability of ULSI devices that use the damascene copper technology at 130 nm node and below. The problems related to delamination, stress voiding, and electromigration failures could be mitigated by the selection of proper materials, processing methods, and manufacturing tools. The optimum process would result in a tailored microstructure of barrier/seed/electroplated copper aggregate. At the same time, the microstructure could be used as an internal sensor, sensitive to process excursions and providing guidance for corrective actions. The texture and crystallographic phase data can be used as a direct measure of the deposition process in terms of film quality, reproducibility, and stability over time. The spatial distribution of crystallographic texture and phase can be measured on a single wafer in order to check wafer uniformity. More importantly, the same measurements can be carried out at predetermined intervals on wafers from a single deposition tool, and the results used to create a database that can be applied to trend charting and tool qualification. Examples of microstructure control in damascene copper processing include: process development and qualification, process control and stability, process excursion and post maintenance stability, deposition tool qualification, and on-line R&D. The examples of texture control will refer to materials and processes typical of damascene copper technology for ULSI. A typical processing route includes the PVD deposition of a barrier layer and copper seed layer, followed by copper electroplate, anneal and chemical- mechanical planarization. All the processing steps affect the texture of annealed copper, and therefore affect directly the performance of interconnects. We will also present examples of application to processing of metal gates (NiSi films) and ferroelectric non-volatile memory (PZT films).

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.013
Threshold uncertainty score0.445

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.001
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.006
GPT teacher head0.272
Teacher spread0.267 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations1
Published2005
Admission routes1
Has abstractyes

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