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Record W2075026512 · doi:10.1116/1.3269800

Fully automated hot embossing processes utilizing high resolution working stamps

2010· article· en· W2075026512 on OpenAlexaff
T. Glinsner, Teodor Veres, Gerald Kreindl, Emmanuel Roy, K. Morton, T. Wieser, C. Thanner, D. Treiblmayr, R. Miller, Paul Lindner

Bibliographic record

VenueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010
Typearticle
Languageen
FieldEngineering
TopicNanofabrication and Lithography Techniques
Canadian institutionsNational Research Council Canada
Fundersnot available
KeywordsEmbossingNanoimprint lithographySoft lithographyNanotechnologyMaterials scienceReplication (statistics)MicrofluidicsFabricationMicrofabricationLithographyTemplateMicrometerOptoelectronicsOptics

Abstract

fetched live from OpenAlex

Nanoimprint lithography is a fast replication technology for structures with sizes ranging from micrometer down to few nanometer range. This article describes the technology for imprinting of polymer substrates as well as spin-on polymers by using soft working stamp materials on a fully automated hot embossing system, the EVG®750, built to use this rapid replication processes. By utilizing soft working stamps, the authors demonstrate the possibility to replicate, in fully automated mode, both high-aspect ratio features in thermoplastic materials as needed for microfluidic lab-on-chip applications as well as high resolution features down to 50nm in polymer that can be used as templates for pattern transfer in the fabrication of plasmonic substrates for biosensing applications.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.002
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesMeta-epidemiology (narrow)
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.038
Threshold uncertainty score1.000

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0020.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0020.002
Science and technology studies0.0010.001
Scholarly communication0.0000.001
Open science0.0010.000
Research integrity0.0000.001
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.011
GPT teacher head0.225
Teacher spread0.214 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations9
Published2010
Admission routes1
Has abstractyes

Explore more

Same venueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaSame topicNanofabrication and Lithography TechniquesFrench-language works237,207