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Record W2092859925 · doi:10.1117/12.702589

Improving the optical characteristics of bimetallic grayscale photomasks

2007· article· en· W2092859925 on OpenAlexaff
James M. Dykes, David K. Poon, Jun Wang, Jimmy T. K. Tsui, Glenn H. Chapman

Bibliographic record

VenueProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsSimon Fraser University
Fundersnot available
KeywordsPhotomaskGrayscaleMaterials scienceOpticsLaserThin filmBimetallic stripMaskless lithographyOptoelectronicsElectron-beam lithographyPixelNanotechnologyLayer (electronics)Resist

Abstract

fetched live from OpenAlex

Bimetallic thin-films offer the ability of producing analog grayscale photomasks with OD ranging from ~3.0OD (unexposed) to <0.22OD (fully exposed). Recent developments have yielded the ability to deposit and pattern bimetallic thin-films on pre-patterned binary Chrome masks. Care is taken to ensure that when writing the grayscale pattern that the underlying Chrome layer is not affected. Through this technique, the advantages of analog grayscale can be added to the high resolution capabilities currently available with Chrome masks. Currently the optical characteristics of bimetallic thin-films limit their effectiveness in high resolution applications. Techniques designed to minimize defects in the uniformity of thin-films after laser exposure are investigated along with different methods of performing the raster-scanning of the photomask patterns. Also discussed is a new application of bimetallic thin-films as a beam-shaping mask. Characterizing the laser beam profile for our writing system, a grayscale mask is designed and tested in an attempt to modify the Gaussian beam profile of the laser into a more uniform flat-top profile. Obtaining a flatter laser power distribution for the writing laser would assist in improving the optical characteristics of the bimetallic thin-films since the primary cause for the photomask's gray level non-uniformities is the Gaussian nature of the laser beam's power distribution causing lines on the photomasks. A flatter profile is shown to eliminate these lines and allow for more uniform gray levels on the laser-exposed bimetallic thin-films.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.001
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Methods · Consensus signal: none
Teacher disagreement score0.002
Threshold uncertainty score0.008

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0000.001
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0020.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.009
GPT teacher head0.230
Teacher spread0.222 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreMethods

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations3
Published2007
Admission routes1
Has abstractyes

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Same venueProceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIESame topicAdvancements in Photolithography TechniquesFrench-language works237,207