Study of the relaxation of strain in patterned Si/SiGe structures using an x-ray diffraction technique
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Bibliographic record
Abstract
We present an investigation of a series of samples with strained stripe-patterned SiGe layers grown on a Si substrate. The strain in the SiGe striped epilayers was calculated after measuring the lattice constants of the layers using an x-ray diffraction technique. It was found that the stripes showed an anisotropic strain in the two in-plane directions resulting from the lattice mismatch and the difference in the dimensions of the stripes. The idea is based on the concept of enhancing the hole mobility in subsequent Si cap layers due to anisotropy of the stain in the patterned SiGe layers.
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Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.001 |
| Science and technology studies | 0.000 | 0.001 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
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Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
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