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Record W2310937389

Bimetallic Thermal Resists for Photomask, Micromachining and Microfabrication

2004· dissertation· en· W2310937389 on OpenAlexfundno aff
Richard Tu

Bibliographic record

VenueSummit (Simon Fraser University) · 2004
Typedissertation
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsnot available
FundersSimon Fraser University
KeywordsMicrofabricationResistPhotomaskSurface micromachiningBimetallic stripMaterials scienceNanotechnologyMetallurgyFabricationMetal
DOInot available

Abstract

fetched live from OpenAlex

Photoresists and photomasks are two of the most critical materials in microfabrication and micromachining industries.As the shift towards shorter wavelength exposure continues, conventional organic photoresists and chromelquartz photomasks start to encounter problems.This thesis investigates and presents an alternative to organic photoresists and chromium photomasks which overcomes their intrinsic problems.A bimetallic thin film, such as BilIn and SnIIn, creates an inorganic thermal resist with many interesting properties.Both experiments and simulations demonstrate that this class of thermal resists can be converted by laser exposure with wavelengths from 213 nm to 830 nm, showing wavelength invariance.Simulations of the projected wavelength response show that BiIIn thermal resist works down to the 1 nm X-ray range.Exposed bimetallic thermal resists can be developed in two different acid solutions with excellent selectivity.A standard etch (RCA2) can strip the unexposed bimetallic film when photoresist rework is needed.Exposed bimetallic films are resistant to Si anisotropic wet etching and fluorine, O2 and chlorine plasma etching.The Bi/In thermal resist is the first reported resist that works for both wet chemical anisotropic Si etching and dry plasma etching.All these features make the bimetallic film a complete thermal resist.Another very important property of bimetallic thin films is the largest change in the optical absorption ever reported in the literature (3.0 OD before exposure and 0.22 OD after exposure, 365 nm), with the exposed areas becoming nearly transparent.The transmission of the exposed films depends on the laser writing power.Thus, BilIn resist and its class can be utilized as a direct-write photomask material for both binary and grayscale photomasks.Binary photomasks and grayscale photomasks were successfully created.2D and 3D structures were successfully generated in Shipley organic photoresists using a mercury lamp mask aligner with exposure conditions identical to those for conventional chrome masks.Material analyses show that the transformation after laser exposure of bimetallic thermal resists is an oxidation process.Laser-converted BilIn and S n h oxides have a structure similar to that of indium tin oxide films. To My Wife LijunMany men and women have done excellently, but you surpass them all.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Methods · Consensus signal: none
Teacher disagreement score0.004
Threshold uncertainty score0.013

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0040.002

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.007
GPT teacher head0.220
Teacher spread0.213 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreMethods

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations8
Published2004
Admission routes1
Has abstractyes

Explore more

Same venueSummit (Simon Fraser University)Same topicAdvancements in Photolithography TechniquesFrench-language works237,207