Effects of Process of the Al_2O_3 Film Deposited by Magnetron Sputtering on PET Substrate Temperature
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Bibliographic record
Abstract
Al2O3 films were deposited by magnetron sputtering on PET flexible substrate,and the effects of ion etching,bias voltage,and sputtering power on substrate temperature were studied.Results showed that all three parameters have impacts on substrate temperature.In order to prevent from thermal deformation of PET,ion etching power,bias voltage,and sputtering power should be controlled respectively under 500W,200V,and 1000W.
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Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
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Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
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