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Record W2550240960 · doi:10.1116/1.4967932

Mixture of ZEP and PMMA with varying ratios for tunable sensitivity as a lift-off resist with controllable undercut

2016· article· en· W2550240960 on OpenAlexaff
Shuo Zheng, Ripon Kumar Dey, Ferhat Aydinoglu, Bo Cui

Bibliographic record

VenueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2016
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsUniversity of Waterloo
Fundersnot available
KeywordsUndercutResistMaterials scienceComposite materialLayer (electronics)Lift (data mining)PhotoresistNanotechnology

Abstract

fetched live from OpenAlex

A lift-off process is a popular method to pattern metals, especially for the noble metals that are hard to dry-etch. For a “clean” lift-off process, an undercut profile is critical and is commonly achieved by using a bilayer resist stack. A resist with tunable sensitivity is apparently the most desirable, since it offers a controlled amount of undercut when used as the bottom layer, with the top layer being a less sensitive resist. In this study, the authors show that a simple mixture of poly (methyl methacrylate) (PMMA) and ZEP can offer tunable sensitivity by adjusting the ratio of the two resists dissolved in anisole. Higher sensitivity was attained by increasing the ZEP content in the mixture since ZEP is about 3× more sensitive than PMMA. However, the relationship is not a linear one, and the contrast curve for a mixture containing more PMMA (e.g., PMMA:ZEP ratio of 2:1) is closer to that of pure ZEP than to PMMA. For dense line array patterns with a periodicity of 200 and 500 nm, a moderate undercut obtained by using a low ZEP concentration (PMMA:ZEP = 2:1 as the bottom layer, PMMA as the top layer) gave the result for lift-off of 100 nm Cr. While using pure ZEP as the bottom layer, the undercut was often too large that the resist lines collapsed because of capillary force or even completely detached when the adjacent undercut merged together.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.002
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.060
Threshold uncertainty score0.699

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0020.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0010.000
Bibliometrics0.0010.001
Science and technology studies0.0000.001
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.006
GPT teacher head0.210
Teacher spread0.203 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations7
Published2016
Admission routes1
Has abstractyes

Explore more

Same venueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaSame topicAdvancements in Photolithography TechniquesFrench-language works237,207