Investigation and simulation of XeF2 isotropic etching of silicon
Bibliographic record
Abstract
Trenching and loading phenomena observed on XeF2-etched (100) silicon wafers are explained in this article. Trenching refers to deeper etching at the side of an etch feature with respect to the middle of the feature. Loading is the reduction in etch depth that adjacent etched regions impose on their respective etch profiles. These two phenomena are especially recognized at locations where the substrate is etched through large mask openings. Both phenomena were reported by other groups, but no explanation was given for them. A novel model explaining these phenomena is developed in this article, and the etching process is simulated in software. The results are compared to several etched samples with varying mask aperture size and etch depth. Good agreement is found between simulated profiles and actual measured etch profiles at given mean-free paths. Furthermore, our simulator predicts that the reaction probability between etchant and substrate molecules influences surface roughness of the etched regions.
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How this classification was reachedexpand
Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.001 | 0.001 |
| Science and technology studies | 0.000 | 0.001 |
| Scholarly communication | 0.000 | 0.001 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one teacher head, not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".