New EUV mask blank for N3 technology node and beyond
Bibliographic record
Abstract
EUV Mask for High Volume Manufacturing of semiconductor device have already became accomplished facts. Therefore, developing a flexible and controllable process capability for various film stack EUV blank structure and production is crucial. The requirements of high compatible process window need to sustain 1-nm critical dimensions (CD) control and etch stop on capping layer with zero damage. For conventional EUV blank, dual layer TaN substrate is proposed as state-of-the-art EUV photomask blank absorber material being comprehensively evaluated. Film stack material needs to be co-optimized with developing and etching process to keep pattern profile/fidelity, capping layer quality and durability, and defect density. Hence first of all, the novel etching strategy for mitigating capping layer damage to have better Ru durability improvement will be reported. Secondly, the developing process optimization to lower the defect counts caused by wettability change due to various absorber material will show. Finally, the pattern fidelity change caused by various etching selectivity between hard mask and absorber will be discussed in this paper.
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How this classification was reachedexpand
Full frame machine prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.
Distilled classifier scores by category (both heads)
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.001 | 0.001 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.001 | 0.000 |
| Insufficient payload (model declined to judge) | 0.002 | 0.001 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".