Growth of high-<i>k</i> silicon oxynitride thin films by means of a pulsed laser deposition-atomic nitrogen plasma source hybrid system for gate dielectric applications
Bibliographic record
Abstract
High-k silicon oxynitride (SiOxNy) thin films have been successfully grown by means of a hybrid deposition process based on the combination of the pulsed laser deposition (PLD) plume of silicon species in an oxygen background together with a remote plasma-based atomic nitrogen source (ANS). This pulsed laser deposition-atomic nitrogen source (PLD-ANS) hybrid method is found to be highly effective for further nitrogen incorporation into SiOxNy films. At a laser intensity of 2.5×108 W/cm2 and a deposition temperature (Td) of 300 °C, it was shown that the N content of the SiOxNy films could be controlled over a concentration range as wide as 0–35 at. %, by controlling the partial pressure ratio of N to O2 in the deposition chamber. The structural and dielectric properties of the PLD-ANS SiOxNy films were systematically investigated as a function of their N content. Microstructural analyses revealed that the increasing incorporation of N into the SiOxNy films occurs through the formation of Si–N bonds to the detriment of Si–O ones. Both the dielectric constant (k) and the breakdown field of the SiOxNy thin films are found to increase significantly with N content. At the highest N content (35 at. %), the PLD-ANS films exhibit a high k-value of about 9.5 and a breakdown field as high as 19 MV/cm. It appears that Poole–Frenkel emission with compensation is the most predominant conduction mechanism in the SiOxNy films. By enabling control of the N content during deposition, the PLD-ANS approach provides the means to achieve desirable N profile engineering in the SiOxNy dielectric thin films.
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How this classification was reachedexpand
Full frame machine prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.
Distilled classifier scores by category (both heads)
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".