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Record W2044586127 · doi:10.1116/1.2167974

Formation of nanoscale columnar structures in silicon by a maskless reactive ion etching process

2006· article· en· W2044586127 on OpenAlex

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.

Bibliographic record

VenueJournal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2006
Typearticle
Languageen
FieldEngineering
TopicNanowire Synthesis and Applications
Canadian institutionsUniversity of Waterloo
Fundersnot available
KeywordsReactive-ion etchingWaferMaterials scienceNanoscopic scaleSiliconControllabilityPlasma etchingEtching (microfabrication)OptoelectronicsNanotechnologyPlasmaVoltageDeep reactive-ion etchingDry etchingElectrical engineering

Abstract

fetched live from OpenAlex

We describe a maskless reactive ion etching process that employs CF4 gas plasma to create nanoscale structures in silicon. Process conditions are controlled to produce pillars of up to 2μm tall and less than 50nm wide. The contributing mechanisms are discussed based on the trends observed for varying plasma conditions. Higher pressures or lower self-bias voltages result in pyramidal structures. Lower pressure and higher voltage result in needlelike structures that resemble silicon wires. By carefully controlling the automasking process mechanism, columnar silicon structures were reproducibly formed with good uniformity all over the wafer. The regularity of the fabricated structures, process controllability, and process compatibility of dry etching are promising for potential photonic and optoelectronic applications.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.022
Threshold uncertainty score0.431

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0010.001
Science and technology studies0.0000.000
Scholarly communication0.0000.001
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.004
GPT teacher head0.217
Teacher spread0.213 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it