Single Wafer Tool Cleaning for Bi-layer Photoresist Rework - Stripper Development and Evaluation
Bibliographic record
Abstract
A wet-cleaning solution for bi-layer photoresist rework using single-wafer tool process has been developed and proved to be successful. The chemical design of stripper related to cleaning mechanism was investigated. The cleaning performance of two types of strippers were evaluated and compared between beaker and single-wafer tool process. The results indicated that chemical design of stripper is the key to determine cleaning mechanism for bi-layer photoresist. It is demonstrated that removal of bi-layer photoresist through lift-off is not acceptable in single-wafer tool process; dissolution proved to be the key mechanism for successful removal of bi-layer photoresist in a single wafer tool. For single-wafer tool evaluation, the influence of process parameters such as wafer spin speed, process time, medium temperature and chemical dispense characteristics were evaluated and are discussed.
Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.
How this classification was reachedexpand
Full frame machine prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.
Distilled classifier scores by category (both heads)
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.001 | 0.001 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.001 | 0.001 |
| Bibliometrics | 0.001 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.001 | 0.001 |
| Open science | 0.001 | 0.000 |
| Research integrity | 0.001 | 0.000 |
| Insufficient payload (model declined to judge) | 0.001 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".