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Record W2515899755 · doi:10.1063/1.4962091

Plasma etching applications in concentrated photovoltaic cell fabrication

2016· article· en· W2515899755 on OpenAlexafffund
Mathieu de Lafontaine, Maxime Darnon, Abdelatif Jaouad, Pierre Albert, Boussairi Bouzazi, Clément Colin, Maïté Volatier, S. Fafard, Richard Arès, Vincent Aimez

Bibliographic record

VenueAIP conference proceedings · 2016
Typearticle
Languageen
FieldEngineering
Topicsolar cell performance optimization
Canadian institutionsInstitut interdisciplinaire d'innovation technologiqueUniversité de Sherbrooke
FundersCentre National de la Recherche ScientifiqueUniversité de Sherbrooke
KeywordsWafer dicingWaferOptoelectronicsMaterials scienceEtching (microfabrication)Plasma etchingFabricationPassivationSolar cellPhotovoltaic systemPlasmaDry etchingNanotechnologyElectrical engineeringLayer (electronics)Engineering

Abstract

fetched live from OpenAlex

Photovoltaic cells are conventionally electrically isolated (isolation) and then separated from the wafer (singulation) by saw dicing at the end of the fabrication process. However, saw dicing presents limitations in terms of cell shapes and causes excessive material losses. We propose isolation and singulation by plasma etching as an alternative to saw dicing. The etching process proposed also allows via hole etching for through cell via contacts (TCVC) [1]. This technology uses isolated metallized vias to carry front-side generated carriers to the backside. This new architecture could increase the efficiency and increase the energy production per wafer for concentrated photovoltaic (CPV) cells. In this paper, those two plasma etching applications for CPV cell fabrication are discussed. More precisely, triple junction solar cells have been fabricated with either a plasma singulation or with via holes and compared with reference cells (without via hole and saw dicing singulation). One sun IV measurements, external quantum efficiency (EQE) and 100 suns IV characteristics show that no performance losses can be observed on cells with plasma singulation. Via hole etching induces open circuit voltage (VOC) and fill factor (FF) losses below 3 % that can be recovered with a surface passivation.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.001
Threshold uncertainty score0.004

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0010.000
Insufficient payload (model declined to judge)0.0010.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.010
GPT teacher head0.202
Teacher spread0.191 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations9
Published2016
Admission routes2
Has abstractyes

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