MétaCan
Menu
Back to cohort
Record W2792674356 · doi:10.1002/pssa.201700658

A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching

2018· article· en· W2792674356 on OpenAlexafffund
Meriem Bouchilaoun, A. Soltani, Ahmed Chakroun, Abdelatif Jaouad, Maxime Darnon, François Boone, Hassan Maher

Bibliographic record

Venuephysica status solidi (a) · 2018
Typearticle
Languageen
FieldEngineering
TopicSemiconductor materials and devices
Canadian institutionsInstitut interdisciplinaire d'innovation technologiqueUniversité de Sherbrooke
FundersNatural Sciences and Engineering Research Council of Canada
KeywordsEtching (microfabrication)Reactive-ion etchingOxidePlasma etchingMaterials scienceIsotropic etchingDry etchingHydrogenPlasmaBuffered oxide etchLayer (electronics)Etch pit densityNitrideSilicon nitrideAnalytical Chemistry (journal)Chemical engineeringOptoelectronicsNanotechnologyChemistryMetallurgyOrganic chemistry

Abstract

fetched live from OpenAlex

In this paper, the development of a soft and selective method to increase the etching rate and control accurately the etched thickness of Si3N4 material is reported. This technique combines the low damage characteristics of wet etching with the anisotropy of plasma etching which is compatible with the requirements of many surface sensitive electronic devices such as MOS transistors. This consists on a local modification of the Si3N4 layer using hydrogen‐based plasma followed by wet chemical etching in buffered oxide etch solution. The plasma conditions are optimized and a relatively high etch rate is demonstrated. FTIR analyses show clear evidence that the formation of N–H and Si–H species in the hydrogenated Si3N4 layer contributes effectively to the increase of the etching rate. Finally, a chemical etching model is proposed to explain the higher etch rate of hydrogenated Si3N4.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame machine prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. The Gemma side is a direct model label for every work in the frame, read from the title-only record. The Codex side is a classifier learned from the 10,348 direct Codex labels and calibrated to design-weighted sample rates; fields without enough sample support carry no Codex call. Candidate is the union of the two sides; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels.

metaresearch head score (Codex)0.000
metaresearch head score (Gemma)0.000
Version: metacan-v3-hybrid-931329e0061cValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.001
Threshold uncertainty score0.004

Distilled classifier scores by category (both heads)

CategoryCodexGemma
Metaresearch0.0000.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0000.000
Science and technology studies0.0000.000
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0010.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.018
GPT teacher head0.258
Teacher spread0.240 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one source (direct Gemma or distilled Codex), not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations11
Published2018
Admission routes2
Has abstractyes

Explore more

Same venuephysica status solidi (a)Same topicSemiconductor materials and devicesFrench-language works237,207