Modeling of silicon etching using Bosch process: Effects of oxygen addition on the plasma and surface properties
Bibliographic record
Abstract
The authors developed a tool using a multiscale approach to simulate the silicon etching using Bosch process. Their study is focused on the analysis of the effect of the oxygen addition to C4F8 plasma during the deposition pulse. This is the complementary study that the authors have recently published which was dedicated to the Bosch process under pure SF6 plasma used in etching pulse and pure C4F8 plasma used in polymer deposition pulse. Parametric study about the effect of the oxygen percentage on the reactive species flux evolution and their impact on the deposition kinetic during the deposition pulse has been performed. The simulation results reveal that for a low %O2 in a C4F8/O2 plasma mixture, the atomic fluorine density increases because of the volume reactions, especially recombinations between CFx and O which favor the production of fluorine. This leads to the decrease of CFx to F flux ratio. Ion energy distribution functions (IEDF) plotting reveals the impact of both %O2 and mass of the positive ions on the IEDF shape. Finally, both the experimental and simulation results show that in their pressure range, the addition of O2 to C4F8 plasma has a weak impact on the silicon etch profile and the etching rate, except for a high %O2 which the etch anisotropy begins to be degraded.
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How this classification was reachedexpand
Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.001 |
| Science and technology studies | 0.000 | 0.001 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one teacher head, not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".