(Invited) Plasma Immersion Ion Implantation: Technology, Modelling, and Applications for Nanofabrication and 2D Materials
Bibliographic record
Abstract
Plasma Immersion Ion Implantation (PIII) is an ion implantation technology in which the target to be implanted (i.e. a semiconductor wafer) is immersed in a plasma, and implanted with positive ions by the application of a high-voltage negative-bias pulse to the target. Because of the high plasma density achievable in modern plasma sources, large fluences can be implanted across large wafer areas, without beam scanning. PIII is well suited for a variety of nanofabrication applications. Because of its compatibility with ordinary silicon CMOS device processing, high fluence PIII is a versatile method for in situ fabrication of nanocrystals for integrated circuit applications. This talk will review the physics of energetic ions implanted into solid materials, and illustrate how post-implant thermal treatment can be used to form nanocrystals in the ion-implanted region. A number of potential applications of PIII as a materials synthesis technique will be discussed.
Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.
How this classification was reachedexpand
Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.000 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.000 | 0.000 |
| Research integrity | 0.000 | 0.000 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from itClassification
machine, unvalidatedMachine predicted; a candidate call from one teacher head, not a consensus.
How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".