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Record W4200339154 · doi:10.1116/6.0001278

Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing

2021· article· en· W4200339154 on OpenAlexafffund
Raphaël Dawant, Robyn Seils, Serge Ecoffey, Rainer Schmid, Dominique Drouin

Bibliographic record

VenueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2021
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsInstitut interdisciplinaire d'innovation technologiqueUniversité de Sherbrooke
FundersNatural Sciences and Engineering Research Council of CanadaMitacs
KeywordsCMOSOffset (computer science)LithographyElectron-beam lithographyAutocorrelationMaskless lithographyMaterials scienceCross-correlationBack end of lineOpticsOptoelectronicsComputer sciencePhysicsResistNanotechnologyMathematics

Abstract

fetched live from OpenAlex

In this paper, we show an alignment strategy based on a hybrid strategy using cross correlation and line-scan alignment to address the challenge for CMOS integrated circuit postprocessing using electron-beam lithography. Due to design rules imposed by the foundries at the 130 nm node and below, classical line-scan alignment is not possible, and marker shapes are limited. The shape of the marker is essential for cross-correlation alignment. By measuring accurately the alignment offset between two lithography steps with different marker shapes compatible with the design rules, we tested the influence of the marker shape in the performance of the cross-correlation alignment. We present a method based on a white noise generated array to design high-performance markers for cross correlation, compatible with CMOS technology, by increasing the sharpness of their autocorrelation peak. We show that the alignment performances can even be improved using a hybrid strategy with cross-correlation and line-scan alignment and reaches a mean offset of 5.2 nm on a CMOS substrate.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.002
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesMeta-epidemiology (narrow)
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.093
Threshold uncertainty score1.000

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0020.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0010.000
Bibliometrics0.0010.001
Science and technology studies0.0010.001
Scholarly communication0.0000.001
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.014
GPT teacher head0.260
Teacher spread0.246 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations0
Published2021
Admission routes2
Has abstractyes

Explore more

Same venueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaSame topicAdvancements in Photolithography TechniquesFrench-language works237,207