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Record W2043862383 · doi:10.1116/1.4900730

Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV

2014· article· en· W2043862383 on OpenAlexaff
F. Delachat, C. Constancias, Jérôme Rêche, B. Dal’zotto, Laurent Pain, Boris Le Drogoff, Mohamed Chaker, J. Margot

Bibliographic record

VenueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2014
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsUniversité de MontréalInstitut National de la Recherche Scientifique
Fundersnot available
KeywordsResistElectron-beam lithographyLithographyMaterials scienceDiffusionCathode rayOpticsGratingAnalytical Chemistry (journal)ChemistryElectronNanotechnologyOptoelectronicsPhysicsChromatography

Abstract

fetched live from OpenAlex

An experimental method to determine the beam spot size and the acid diffusion length of a positive chemically amplified electron-beam resist (p-CAR) is proposed. This method is applied to a reference p-CAR with a Vistec VB6 electron beam at 100 kV and with a MAPPER tool at 5 kV. Beam spot size characterization is based on the width measurement of a single line exposure. This procedure is applied to two specific dose ranges. In the first one, the chemical mechanism occurring in the exposed resist is dominated by acid catalytic deprotection of a partially protected polymer (standard process). In the second dose range, the chemistry is governed by the cross-linking mechanism due to the intentional overdose of the p-CAR, leading to a polarity inversion. The authors assume that comparing the results obtained with the standard and the cross-linked p-CAR enables the determination of the acid diffusion length of the p-CAR process. This hypothesis was verified with measurements performed with a nonchemically amplified process. A relationship between the best exposure latitudes achieved at 5 and 100 kV and the minimum spot sizes determined with the present method is observed with very high resolution grating exposures. In this work, a suitable method is proposed for fine resist process characterization.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.002
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.046
Threshold uncertainty score0.824

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0020.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0010.001
Science and technology studies0.0000.001
Scholarly communication0.0000.000
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.007
GPT teacher head0.224
Teacher spread0.218 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

The models applied no category: nothing in the taxonomy fit this work.
Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations7
Published2014
Admission routes1
Has abstractyes

Explore more

Same venueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaSame topicAdvancements in Photolithography TechniquesFrench-language works237,207