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Record W2153364814 · doi:10.1116/1.4935506

Enhanced adhesion of electron beam resist by grafted monolayer poly(methylmethacrylate-<i>co</i>-methacrylic acid) brush

2015· article· en· W2153364814 on OpenAlexaff
Francesco Narda Viscomi, Ripon Kumar Dey, Roberto Caputo, Bo Cui

Bibliographic record

VenueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2015
Typearticle
Languageen
FieldEngineering
TopicAdvancements in Photolithography Techniques
Canadian institutionsNational Institute for NanotechnologyUniversity of Waterloo
Fundersnot available
KeywordsResistMaterials scienceMonolayerCopolymerPhotoresistPolystyreneSiliconElectron-beam lithographyMethacrylic acidAdhesionSubstrate (aquarium)NanotechnologyChemical engineeringPolymer chemistryLayer (electronics)Composite materialPolymerOptoelectronics

Abstract

fetched live from OpenAlex

In electron beam lithography, poor resist adhesion to a substrate may lead to resist structure detachment upon development. One popular method to promote resist adhesion is to modify the substrate surface. In this study, the authors will show that a poly(methylmethacrylate-co-methacrylic acid) [P(MMA-co-MAA)] monolayer “brush” can be grafted onto a silicon substrate using thermal annealing that leads to chemical bonding of the P(MMA-co-MAA) copolymer to the hydroxyl group-terminated substrate, followed by acetic acid wash to remove the bulk, unbonded copolymer. The monolayer brush has a thickness of 12 nm. The authors will show that it can greatly improve the adhesion of positive resist, the ZEP-520A, and negative resist polystyrene to bare silicon surfaces, which led to high resolution patterning without resist detachment upon development. The improvement was more dramatic when patterning dense sub-100 nm period grating structures. But the improvement was negligible for an aluminum substrate, because, even without the brush layer, resist adhesion to aluminum is found already to be strong enough to prevent resist structure peeling off. The current simple and low cost method could be very useful when resist adhesion to the substrate for a given developer is weak.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

How this classification was reachedexpand

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.003
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesMeta-epidemiology (narrow)
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.064
Threshold uncertainty score1.000

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0030.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0010.000
Bibliometrics0.0020.002
Science and technology studies0.0000.001
Scholarly communication0.0000.001
Open science0.0010.000
Research integrity0.0010.001
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.012
GPT teacher head0.246
Teacher spread0.235 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it

Classification

machine, unvalidated

Machine predicted; a candidate call from one teacher head, not a consensus.

Study designBench or experimental
Domainnot available
GenreEmpirical

How this classification was reached, model by model and score by score, is at the end of the page under "How this classification was reached".

Quick stats

Citations4
Published2015
Admission routes1
Has abstractyes

Explore more

Same venueJournal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and PhenomenaSame topicAdvancements in Photolithography TechniquesFrench-language works237,207