High aspect ratio sapphire micromachining by ultraviolet laser‐induced plasma‐assisted ablation (LIPAA)
Why this work is in the frame
A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.
Bibliographic record
Abstract
Abstract The ultraviolet laser‐induced plasma‐assisted ablation performed in this article can attain deep and high‐quality engravings in sapphire without necessitating volatile solutions or expensive equipment such as high‐power ultrashort‐pulsed lasers. The dominant mechanism of ablation is discovered to be from the direct ablation of excited sapphire surfaces and not from the plasma generated from the target material. Only an initial deposition from the target is needed to initiate the direct ablation. Note that 20‐µm wide, 30‐µm deep channel and hole features with a surface roughness (Sa) of .65 µm are achieved at an etching rate of .3 µm per pulse without the need for extensive cleaning. Engravings can reach up to 150‐µm depths at a maximum tapering angle of 5° until the shrinking absorbent surface vanishes, and 500‐µm wide 430‐µm deep topside through‐cutting is achieved. This study characterizes the morphology of direct laser ablation of transient absorbent sapphire surfaces. This method demonstrates the potential for the low‐cost rapid engraving of high aspect ratio features in transparent sapphire substrates.
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Full frame distilled prediction
Teacher imitationNot calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.
Codex and Gemma teacher scores by category
| Category | Codex | Gemma |
|---|---|---|
| Metaresearch | 0.000 | 0.000 |
| Meta-epidemiology (narrow) | 0.000 | 0.000 |
| Meta-epidemiology (broad) | 0.000 | 0.000 |
| Bibliometrics | 0.001 | 0.000 |
| Science and technology studies | 0.000 | 0.000 |
| Scholarly communication | 0.000 | 0.000 |
| Open science | 0.001 | 0.000 |
| Research integrity | 0.000 | 0.001 |
| Insufficient payload (model declined to judge) | 0.000 | 0.000 |
Machine scores (provisional)
The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.
Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.
score_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it