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Record W4400079415 · doi:10.1016/j.nimb.2024.165439

In Plasma ion beam analysis of polymer layer and adsorbed H monolayer etching

2024· article· en· W4400079415 on OpenAlex
Louis‐Charles Fortier, M. Chicoine, Simon Chouteau, Mathilde Clausse, É. Lalande, A. W. Lussier, S. Roorda, Luc Stafford, G. Terwagne, F. Schiettekatte

Why this work is in the frame

A frame that forgets how it found something cannot be audited. These are the routes that admitted this work.

affAt least one author lists a Canadian institution in the pinned OpenAlex snapshot.
fundA Canadian funder is recorded on the work.

Bibliographic record

VenueNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 2024
Typearticle
Languageen
FieldEngineering
TopicIon-surface interactions and analysis
Canadian institutionsUniversité de Montréal
FundersNatural Sciences and Engineering Research Council of CanadaCanada Foundation for InnovationFonds de recherche du Québec – Nature et technologiesMinistère des relations internationales et de la Francophonie
KeywordsElastic recoil detectionSputteringAnalytical Chemistry (journal)PlasmaEtching (microfabrication)Plasma etchingIon beamNuclear reaction analysisDesorptionMaterials scienceIonChemistryLayer (electronics)AdsorptionThin filmNanotechnology

Abstract

fetched live from OpenAlex

We present two experiments where a layer is plasma-etched while monitoring its evolution by in plasma ion beam analysis. First, we etch a photoresist with a diffuse O 2 plasma at low pressure. Using a 4.335 MeV He beam, Rutherford Backscattering Spectrometry and Elastic Recoil Detection spectra are acquired every minute during 8 h. Etching of most elements follows a linear trend, but H desorbs faster at the beginning of the plasma process, which we ascribe to the ion beam-induced desorption. In addition, we observe a thin Mo layer building up at the surface, likely due to the sputtering of an electrode in the plasma source. Secondly, we etch in HF a crystalline Si (c-Si) sample with < 100 > surface orientation, which should leave 14 H/nm 2 bonded to the c-Si surface. The sample is then introduced in the chamber and exposed to a diffuse Ar plasma at low pressure. During plasma processing, the H surface concentration is monitored using a resonant nuclear reaction with a 15 N beam at 6.385 MeV. The initial H concentration is 11 . 7 ± 1 . 1 H/nm 2 , and it decreases over a 3-minute timescale to an equilibrium concentration of 6 . 0 ± 0 . 8 H/nm 2 . Over the range of experimental conditions investigated, the diffuse Ar plasma is therefore not able to entirely sputter the H from the c-Si surface.

Fetched live from OpenAlex and de-inverted. Abstracts are not stored in this database: the inverted indexes are 8.6 GB of the frame’s 9.3 GB of text, and the host has 13 GB free.

Full frame distilled prediction

Teacher imitation

Not calibrated prevalence, not ground truth. Human validation pending. Learned from the 10,348 direct Codex labels and 10,348 direct Gemma labels. Candidate is the union of thresholded teacher heads; consensus is their intersection. These outputs are machine_predicted_unvalidated and are not human labels or direct frontier model labels.

metaresearch head score (Codex)0.001
metaresearch head score (Gemma)0.000
Version: codex-gemma-dda1882f352aValidation status: machine_predicted_unvalidated
Candidate categoriesnone
Consensus categoriesnone
DomainCandidate signal: none · Consensus signal: none
Study designCandidate signal: Bench or experimental · Consensus signal: Bench or experimental
GenreCandidate signal: Empirical · Consensus signal: Empirical
Teacher disagreement score0.251
Threshold uncertainty score0.559

Codex and Gemma teacher scores by category

CategoryCodexGemma
Metaresearch0.0010.000
Meta-epidemiology (narrow)0.0000.000
Meta-epidemiology (broad)0.0000.000
Bibliometrics0.0010.001
Science and technology studies0.0000.000
Scholarly communication0.0000.001
Open science0.0000.000
Research integrity0.0000.000
Insufficient payload (model declined to judge)0.0000.000

Machine scores (provisional)

The two teacher heads of the student model, read on this work. A score orders the frame for review; it never asserts a category, and the validation status ships verbatim with every row.

Baseline scores from an immature model (maturity gate not passed, 7 training rounds). Scores rank; they never assert a category.

Opus teacher head0.034
GPT teacher head0.385
Teacher spread0.352 · how far apart the two teachers sit on this one work
Validation statusscore_only:v0-immature-baseline · verbatim from the scoring run: score_only means the number may rank works, and no category label ships from it