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4,299,418 works, Canadian by any of four routes.

Every filter state is a URL; the URL is the query; the query is citable via /q/⟨hash⟩. The page, the API and the export parse the same parameters.

The current cohort, streamed from the database: every work column, the machine labels, the provisional scores, and the per-row validation status. Exports are capped at 100,000 rows. Mints a permanent /q/ link for this exact query. The same filters always produce the same link, whoever asks.

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Integrated Circuits and Semiconductor Failure Analysis
Retraction
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Direct Codex and Gemma labels are unvalidated and sparse. Distilled predictions cover the full frame and are also unvalidated. Choose the evidence source explicitly; absence of a direct label is never a negative label.

affaffiliation
fundfunder
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The four routes compose: require the funder route and exclude affiliation to get the funder-only stratum no affiliation-based frame ever sees.

352 results · 1 filter active ·
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20002025
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Machine labels · sparse coverage
Evidence
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An unlabeled work is unknown, not a negative. Label coverage is reported on every query.
352 works in the cohort · of 4,299,418page 1 of 8

Labels cover 0 of 352 works in this cohort. The rest are unlabeled, which is not a negative label: the label table is sparse today and grows as labeling rounds land.

Distilled predictions cover 352 of 352 works in this cohort. Predictions are machine_predicted_unvalidated. The Gemma side is a direct model label for every work (title-only); the Codex side is a distilled, calibrated classifier. Candidate is the union; consensus is the intersection.

affunlabeled
Resistive Interconnection Localization
Edward I. Cole, Paiboon Tangyunyong, C.F. Hawkins, Michael R. Bruce, Victoria J. Bruce, Wan-Loong Chong +1 more
2001· article· en· Proceedings - International Symposium for Testing and Failure Analysis· Engineering
machine prediction:candidate · noneconsensus · none
35
citations
affunlabeled
Contactless testing: possibility or pipe-dream?
Erik Jan Marinissen, Dae‐Young Lee, John P. Hayes, C. Sellathamby, Brian Moore, S. Slupsky +1 more
2009· article· en· Design, Automation, and Test in Europe· Engineering
machine prediction:candidate · noneconsensus · none
33
citations
affunlabeled
A Fab-Wide APC Sampling Application
Andre Holfeld, Robert Barlović, Richard Good
2007· article· en· IEEE Transactions on Semiconductor Manufacturing· Engineering
machine prediction:candidate · noneconsensus · none
32
citations
affunlabeled
Copper device editing: Strategy for focused ion beam milling of copper
J. Casey, Michael W. Phaneuf, Clive Chandler, Michael Megorden, Kathryn E. Noll, Richard F. Schuman +8 more
2002· article· en· Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena· Engineering
machine prediction:candidate · noneconsensus · none
30
citations
affunlabeled
Steps Toward Automated Deprocessing of Integrated Circuits
E.L. Principe, Navid Asadizanjani, Domenic Forte, Mark Tehranipoor, Robert Chivas, Michael DiBattista +4 more
2017· article· en· Proceedings - International Symposium for Testing and Failure Analysis· Engineering
machine prediction:candidate · noneconsensus · none
25
citations
affunlabeled
ABCs of Photon Emission Microscopy
Michael R. Bruce, Victoria J. Bruce
2003· article· en· EDFA Technical Articles· Engineering
machine prediction:candidate · noneconsensus · none
25
citations
afffundunlabeled
Jitter-free subpicosecond streak cameras (invited)
Claude Belzile, J. C. Kieffer, C. Y. Côté, T. Oksenhendler, D. Kaplan
2002· article· en· Review of Scientific Instruments· Engineering
machine prediction:candidate · noneconsensus · none
18
citations
affunlabeled
Blistering of GaAs by low keV H, D, and He ions
Alexandre Giguère, Nicholas Desrosiers, B. Terreault
2005· article· en· Applied Physics Letters· Engineering
machine prediction:candidate · noneconsensus · none
14
citations
afffundunlabeled
Camera for transmission He+ ion microscopy
K. L. Kavanagh, Christoph Herrmann, John Notte
2017· article· en· Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena· Engineering
machine prediction:candidate · noneconsensus · none
14
citations

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