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4,299,418 works, Canadian by any of four routes.

Every filter state is a URL; the URL is the query; the query is citable via /q/⟨hash⟩. The page, the API and the export parse the same parameters.

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The current cohort, streamed from the database: every work column, the machine labels, the provisional scores, and the per-row validation status. Exports are capped at 100,000 rows. Mints a permanent /q/ link for this exact query. The same filters always produce the same link, whoever asks.

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Advancements in Photolithography Techniques
Retraction
Abstract
Evidence source
Study design
Label agreement
Label status

Direct Codex and Gemma labels are unvalidated and sparse. Distilled predictions cover the full frame and are also unvalidated. Choose the evidence source explicitly; absence of a direct label is never a negative label.

affaffiliation
fundfunder
venuejournal
aboutaboutness

The four routes compose: require the funder route and exclude affiliation to get the funder-only stratum no affiliation-based frame ever sees.

180 results · 1 filter active ·
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20002025
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Machine labels · sparse coverage
Evidence
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An unlabeled work is unknown, not a negative. Label coverage is reported on every query.
180 works in the cohort · of 4,299,418page 1 of 4

Labels cover 0 of 180 works in this cohort. The rest are unlabeled, which is not a negative label: the label table is sparse today and grows as labeling rounds land.

Distilled predictions cover 180 of 180 works in this cohort. Predictions are machine_predicted_unvalidated teacher distillation outputs. Candidate is the union; consensus is the intersection.

affunlabeled
Simulation of electron beam lithography of nanostructures
2010· article· en· Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena· Engineering
distilled prediction:candidate · noneconsensus · none
39
citations
affunlabeled
Tilted nanostructure fabrication by electron beam lithography
2012· article· en· Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena· Engineering
distilled prediction:candidate · metaepi_narrowconsensus · none
19
citations
affunlabeled
Progress toward a raster multibeam lithography tool
2004· article· en· Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena· Engineering
distilled prediction:candidate · metaepi_narrowconsensus · none
18
citations
affunlabeled
BiIn: a sensitive bimetallic thermal resist
2001· article· de· Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE· Engineering
distilled prediction:candidate · metaepi_narrowconsensus · none
16
citations
afffundunlabeled
Lithography-Aware Analog Layout Retargeting
2015· article· en· IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems· Engineering
distilled prediction:candidate · metaepi_narrowconsensus · none
14
citations
affno abstractunlabeled
Measurability of dumb hole radiation?
2002· book-chapter· en· WORLD SCIENTIFIC eBooks· Engineering
distilled prediction:candidate · metaepi_narrowconsensus · none
11
citations
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How this was built: Screen · Findings · About